The present invention relates to an apparatus for cleaning a surface, in particular at solar collectors or photovoltaic installations. The apparatus has at least one cleaning head that comprises at least one cleaning member. The cleaning member is in particular a brush that can be set into rotation. The apparatus furthermore has a movement device for moving the cleaning head over at least a part of the surface to be cleaned. The movement device has a first movement unit movable in a first direction and a second movement unit. The cleaning head is movable transversely or obliquely to the first movement direction by means of the second movement unit along a guide means that is connected to the first movement unit. A control means that is arranged at the first and/or second movement units makes it possible to automatically move the first movement unit in dependence on a position of the second movement unit.

A cleaning system and method can include a leading carriage assembly attached to a brush assembly and can be configured to drive the brush assembly. A trailing carriage assembly can be configured to move along a track. The trailing carriage assembly can be attached to an arm. A vertical support rod can be partially disposed within the arm and can be attached to the brush assembly. A height of the vertical support rod can be positioned by one or more clamps located around the vertical support rod.

A cleaning system and method can include a leading carriage assembly attached to a brush assembly and can be configured to drive the brush assembly. A trailing carriage assembly can be configured to move along a track. The trailing carriage assembly can be attached to an arm. A vertical support rod can be partially disposed within the arm and can be attached to the brush assembly. A height of the vertical support rod can be positioned by one or more clamps located around the vertical support rod.

A substrate cleaning method and a substrate cleaning apparatus are provided. The substrate cleaning method includes a first step of applying a chemical solution to a lower surface of a substrate, and a second step of subsequently applying a bubble-containing liquid to the lower surface of the substrate.

A substrate cleaning method and a substrate cleaning apparatus are provided. The substrate cleaning method includes a first step of applying a chemical solution to a lower surface of a substrate, and a second step of subsequently applying a bubble-containing liquid to the lower surface of the substrate.

This invention relates to a system and process for cleaning a jet engine component and, more particularly, a system and process for cleaning the inside surfaces of a jet engine component.

This invention relates to a system and process for cleaning a jet engine component and, more particularly, a system and process for cleaning the inside surfaces of a jet engine component.

A cleaning apparatus for an endless conveyor belt is provided. The cleaning apparatus is operable for a rotary cleaning head to perform a cleaning action on a first section of the endless conveyor belt. In an embodiment of the present invention, the rotary cleaning head comprises a rotating disc assembly. The rotary cleaning assembly is operable for a mobile mount to position the rotary cleaning head into a first cleaning contact position with the endless conveyor belt. To affix the rotary cleaning head assembly to a mount, a connecting portion having a proximal end and a distal end, wherein the proximal end includes a first coupling is provided. Said coupling is capable of making a connection to and disconnecting from the mobile mount, and said distal end capable of making a connection and disconnecting from the rotary cleaning head and adapted for use with the rotary cleaning head.

The present invention relates to a substrate cleaning system and a substrate cleaning method for cleaning a substrate. The substrate cleaning system (50) includes a heater (51), a chemical-liquid diluting module (52), and a cleaning module. A temperature of the diluted-chemical-liquid mixed by the chemical-liquid diluting module (52) is determined to be higher than normal a temperature and lower than a glass transition point of a cleaning member. The cleaning member scrubs the substrate (W) with the diluted chemical liquid having the determined temperature supplied to the substrate (W).

According to one embodiment, a cleaner head includes a first rotor, a second rotor, and a contact surface. The first rotor can be rotationally driven in a state where an outer peripheral surface of the first rotor is in contact with a sheet that includes organic fiber and is formed on a base, and can remove a part of the sheet from the base. The second rotor is arranged next to the first rotor in a direction along a rotation axis of the first rotor, and is rotated together with the first rotor in a state where the second rotor is not in contact with the sheet. The contact surface is in contact with an outer peripheral surface of the second rotor at a position away from the sheet around the rotation axis.