Automatic emitter point cleaners are disclosed. An automatic emitter point cleaning system includes: a fan configured to direct a stream of air through an air path; a point emitter configured to produce at least one of positive ions or negative ions within or proximate to the air path; a brush; a first gear coupled to the brush and configured to move the brush into contact with the point emitter; a second gear to engage the first gear; and a motor to actuate the second gear such that the second gear actuates the first gear to move the brush past the point emitter.

A self-cleaning assembly for cleaning at least one electrode of an electronic air cleaner includes a mounting bracket removably connectable to the electronic air cleaner and a connecting member having at least one arm. The connecting member is rotatable about an axis. At least one cleaning body is arranged at a portion of the at least one arm.

The present disclosure provides a roller for cleaning a backside of a wafer. The backside of the wafer has a central region and a periphery region surrounding the central region. The roller includes an upper element, a bottom element, and an axis element for connecting the upper element and the bottom element. The upper element of the roller is configured to contact with a frontside of the wafer. The bottom element is configured to contact with the backside of the wafer and remove particles from the periphery region of the backside of the wafer. The bottom element is made of materials selected from a group comprising abrasive pads, sand papers, and asbestos.

The present disclosure provides a roller for cleaning a backside of a wafer. The backside of the wafer has a central region and a periphery region surrounding the central region. The roller includes an upper element, a bottom element, and an axis element for connecting the upper element and the bottom element. The upper element of the roller is configured to contact with a frontside of the wafer. The bottom element is configured to contact with the backside of the wafer and remove particles from the periphery region of the backside of the wafer. The bottom element is made of materials selected from a group comprising abrasive pads, sand papers, and asbestos.

A cleaning tool for cleaning a glass surface of an accelerator column is disclosed. The cleaning tool includes a shaft including a first end and a second end; a foam body located at the first end of the shaft; and a mounting bracket coupled to the first end of the shaft, the mounting bracket receiving the foam body. An outer circumference of the foam body includes a textured cleaning surface for contacting the glass surface of the accelerator column.

The invention relates to a method and a system for treatment of an underwater surface (S) and material removed from it at a cleaning site. The underwater surface is cleaned by a brush device (1), by which effluent containing solid matter removed from the underwater surface in connection with cleaning is conveyed to a treatment unit (5) where the effluent is subjected to separation and filtering. In a first step, the solid matter contained in the effluent is separated from the effluent in a form as unbroken as possible, immediately followed by a second step in which the effluent is precipitated. Said second step is immediately followed by a third step in which the effluent is filtered. The filtered effluent is discharged directly back to a body of water or to another clean water connection at the cleaning site. The effluent may be subjected to additional filtering and/or disinfection, if necessary.

A coating method of a board for producing a concrete product and a board coated by the same are proposed. The coating method is advantageous in that the whole surface of a board can be rapidly coated and dried to prevent surface corrosion of the board and to prevent further corrosion on a damaged surface of the board, thus improving the durability of the board and the quality of the produced concrete products. The coating method includes: removing residues existing on an outer surface of the board by blowing high-pressure air to an upper surface and a lower surface of the board for producing a concrete product; coating by spraying coating liquid to the outer surface of the board from which the residues have been removed; and drying the coating liquid by blowing high-pressure air to the outer surface of the board.

In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.

In a chemical mechanical polishing system, a platen shield cleaning assembly is installed on a rotatable platen in a gap between the rotatable platen and a platen shield. The assembly includes a sponge holder attached to the platen and a sponge. The sponge is held by the sponge holder such that an outer surface of the sponge is pressed against an inner surface of the platen shield.

A smoke and dust treatment apparatus for welding, said apparatus comprising a polishing and dust extraction module and a smoke and dust purification module. The polishing and dust extraction module comprises a double-layer dust extraction cover (3), a protective cover (2), an industrial brush (4), a first air guide portion, a second air guide portion (24) and a drive motor (22), the drive motor (22) driving the industrial brush (4) to rotate at high speed to perform polishing. During welding and polishing, a mechanical arm (6) drives the double-layer dust extraction cover (3), and a suction hole (20) of the double-layer dust extraction cover (3) and a suction guide hole (19) on the industrial brush (4) simultaneously take in toxic gas and debris such as iron filings.