Disclosed is an optical window cleaning device, including: a cleaning brush; and a wiper arm. The wiper arm includes a first link, a torsion mechanism, a second link and a wiper arm drive system. A second end of the first link is hinged to a first end of the second link. The cleaning brush is hinged to a first end of the first link, a rotation trajectory of the cleaning brush and a rotation trajectory of a hinge joint between the second end of the first link and the first end of the second link are both located in a first plane. A rotation trajectory of the second link and the rotation trajectory of the hinge joint are located in the first plane. The torsion mechanism provides the first link and the second link with a force that rotates the first link relative to the second link.

Disclosed is an optical window cleaning device, including: a cleaning brush; and a wiper arm. The wiper arm includes a first link, a torsion mechanism, a second link and a wiper arm drive system. A second end of the first link is hinged to a first end of the second link. The cleaning brush is hinged to a first end of the first link, a rotation trajectory of the cleaning brush and a rotation trajectory of a hinge joint between the second end of the first link and the first end of the second link are both located in a first plane. A rotation trajectory of the second link and the rotation trajectory of the hinge joint are located in the first plane. The torsion mechanism provides the first link and the second link with a force that rotates the first link relative to the second link.

An industrial robotic vacuum system for cleaning agricultural facility ventilation ductwork. The industrial robotic vacuum system generally includes a robotic vacuum head.

The present invention relates generally to the field of pressure washer wands and a cleaning attachment that can be attached to any standard pressure washer wand. The attachment has a roller assembly with a bristled roller head. The head can be positioned in front of the spray tip of a wand such that water that exits the wand and causes the head to spin.

The present invention relates generally to the field of pressure washer wands and a cleaning attachment that can be attached to any standard pressure washer wand. The attachment has a roller assembly with a bristled roller head. The head can be positioned in front of the spray tip of a wand such that water that exits the wand and causes the head to spin.

Provided are a vacuum head, a collection bin, a cleaning tray, a filter assembly, and a cleaning apparatus. The cleaning apparatus includes: a housing, a rolling brush, and a cleaning assembly, where the cleaning assembly includes a cleaning medium inlet and a plurality of cleaning medium spray orifices; the plurality of cleaning medium spray orifices face the rolling brush, and lengths of flow channels from various cleaning medium spray orifices to the cleaning medium inlet are equal. According to the present disclosure, a cleaning medium may be sprayed to a rolling brush surface uniformly, so that the rolling brush may be cleaned completely, thereby improving the cleaning efficiency and the cleanliness of the rolling brush.

An outdoor surface cleaning apparatus having a handle, a power head with a prime mover, an attachment head having a cleaning attachment, and a spray mechanism. The spray mechanism includes a first fluid input, a second fluid input, a cleaning fluid output, and a mixing assembly. The mixing assembly is in fluid communication with the first fluid input, the second fluid input, and the cleaning solution output.

The present application relates to the field of semiconductors and discloses a cleaning device and a cleaning method. The cleaning device comprises a bearing mechanism for supporting an object to be cleaned in a preset direction, and a cleaning mechanism for cleaning the object to be cleaned, the cleaning mechanism comprising a base and a first cleaning member detachably disposed on the base. The first cleaning member comprises a housing for detachably connecting with the base and a first brush head portion disposed on the housing, an accommodating space being formed and surrounded by the housing and the first brush head portion. A second cleaning member is further disposed on the base, the second cleaning member being accommodated in the accommodating space.

The present application relates to the field of semiconductors and discloses a cleaning device and a cleaning method. The cleaning device comprises a bearing mechanism for supporting an object to be cleaned in a preset direction, and a cleaning mechanism for cleaning the object to be cleaned, the cleaning mechanism comprising a base and a first cleaning member detachably disposed on the base. The first cleaning member comprises a housing for detachably connecting with the base and a first brush head portion disposed on the housing, an accommodating space being formed and surrounded by the housing and the first brush head portion. A second cleaning member is further disposed on the base, the second cleaning member being accommodated in the accommodating space.

Provided is a substrate cleaning apparatus including: a substrate support mechanism configured to support a substrate; and a roll-type first cleaning member configured to clean a first surface of the substrate by rotating while being in contact with a bevel and/or an edge of the first surface of the substrate, wherein a rotation axis of the first cleaning member is in parallel with the substrate, and the first cleaning member has a large diameter portion and a small diameter portion.