Patent classifications
B08B1/02
SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
A lower-surface center region of a substrate held by a first holder is cleaned by a cleaner. A lower-surface outer region of the substrate rotated by a second holder is cleaned by the cleaner. A mobile base provided with the second holder and the cleaner is moved in a horizontal plane such that a reference position of the first holder coincides with a center axis of the second holder in a plan view when the substrate is received and transferred between the first holder and the second holder, and is moved in the horizontal plane such that the cleaner overlaps with the lower-surface center region of the substrate held by the first holder and a center axis of the cleaner coincides with a first portion different from a center of the substrate in the plan view when the lower-surface center region is cleaned.
SUBSTRATE CLEANING DEVICE AND SUBSTRATE CLEANING METHOD
A lower-surface center region of a substrate held by a first holder is cleaned by a cleaner. A lower-surface outer region of the substrate rotated by a second holder is cleaned by the cleaner. A mobile base provided with the second holder and the cleaner is moved in a horizontal plane such that a reference position of the first holder coincides with a center axis of the second holder in a plan view when the substrate is received and transferred between the first holder and the second holder, and is moved in the horizontal plane such that the cleaner overlaps with the lower-surface center region of the substrate held by the first holder and a center axis of the cleaner coincides with a first portion different from a center of the substrate in the plan view when the lower-surface center region is cleaned.
CLEANING DEVICE, POLISHING DEVICE, AND DEVICE AND METHOD FOR CALCULATING ROTATION SPEED OF SUBSTRATE IN CLEANING DEVICE
A cleaning device includes: a plurality of rollers that hold a peripheral edge part of a substrate; a rotation driving unit that rotates the substrate by rotationally driving the plurality of rollers; a cleaning member that abuts on the substrate and cleans the substrate; a cleaning liquid supply nozzle that supplies a cleaning liquid to the substrate; a microphone that detects a sound generated when a notch of the peripheral edge part of the substrate hits the plurality of rollers; and a rotation speed calculation unit that calculates a rotation speed of the substrate on the basis of the sound detected by the microphone.
CLEANING DEVICE, POLISHING DEVICE, AND DEVICE AND METHOD FOR CALCULATING ROTATION SPEED OF SUBSTRATE IN CLEANING DEVICE
A cleaning device includes: a plurality of rollers that hold a peripheral edge part of a substrate; a rotation driving unit that rotates the substrate by rotationally driving the plurality of rollers; a cleaning member that abuts on the substrate and cleans the substrate; a cleaning liquid supply nozzle that supplies a cleaning liquid to the substrate; a microphone that detects a sound generated when a notch of the peripheral edge part of the substrate hits the plurality of rollers; and a rotation speed calculation unit that calculates a rotation speed of the substrate on the basis of the sound detected by the microphone.
SUBSTRATE CLEANING DEVICE AND SUBSTRATE PROCESSING DEVICE
The disclosure provides a substrate cleaning device and a substrate processing device capable of suppressing erroneous rotation detection of an optical sensor due to adhesion of droplets or mist. A substrate cleaning device includes a substrate cleaning part for cleaning a substrate, a drive roller for rotating the substrate, a driven roller rotated by the substrate, and a rotation detection part for detecting rotation of the driven roller. The rotation detection part includes a detected part provided on the driven roller, an optical sensor for detecting rotation of the detected part by irradiation with detection light, and a liquid filling part for filling an optical path forming space in which an optical path of the detection light is formed with a liquid having transmittance.
SUBSTRATE CLEANING DEVICE AND SUBSTRATE PROCESSING DEVICE
The disclosure provides a substrate cleaning device and a substrate processing device capable of suppressing erroneous rotation detection of an optical sensor due to adhesion of droplets or mist. A substrate cleaning device includes a substrate cleaning part for cleaning a substrate, a drive roller for rotating the substrate, a driven roller rotated by the substrate, and a rotation detection part for detecting rotation of the driven roller. The rotation detection part includes a detected part provided on the driven roller, an optical sensor for detecting rotation of the detected part by irradiation with detection light, and a liquid filling part for filling an optical path forming space in which an optical path of the detection light is formed with a liquid having transmittance.
RADIOPHARMACEUTICAL PIG CLEANING AND TRANSPORTATION SYSTEM
A pig cleaning and transportation system is disclosed. Exemplary implementations include a platform with a plurality of apertures; a plurality of securing mechanisms, each mechanism within each aperture and configured to hold a pig and allow it to rotate around its longitudinal axis; a base underneath the platform; and a cleaning element connected to the base and positioned on each longitudinal side of the platform in pressure contact with the pigs on the plurality of securing mechanisms, each cleaning element including at least one cleaning material surface.
Apparatus and method for recycling
The present invention provides an apparatus for recycling artificial or synthetic layered materials. The apparatus includes a first conveying section arranged to receive and unroll a used or pre-processed roll of artificial or synthetic layered material, in use, and at least a second conveying section arranged to receive and re-roll the subsequently processed roll of said material. The apparatus further includes a beating section located intermediate said first and second conveying sections, arranged to beat and/or agitate said unrolled material as it is moved from the first conveying section to the at least second conveying section, in use.
Apparatus and method for recycling
The present invention provides an apparatus for recycling artificial or synthetic layered materials. The apparatus includes a first conveying section arranged to receive and unroll a used or pre-processed roll of artificial or synthetic layered material, in use, and at least a second conveying section arranged to receive and re-roll the subsequently processed roll of said material. The apparatus further includes a beating section located intermediate said first and second conveying sections, arranged to beat and/or agitate said unrolled material as it is moved from the first conveying section to the at least second conveying section, in use.
Cleaning device and image forming apparatus
A cleaning device includes a cleaning unit, a movement mechanism, and a unit mounting portion. The cleaning unit includes a cleaning part having a contact surface brought into contact with a surface of a conveyance roller. The movement mechanism moves the cleaning unit between a cleaning position at which the cleaning part comes in contact with the conveyance roller, and a mounting and removing position at which the cleaning part is located below the conveyance roller in a separated manner and the cleaning unit is allowed to be mounted and removed on and from the apparatus body. The unit mounting portion houses the cleaning unit disposed at the mounting and removing position. The cleaning unit is configured such that the cleaning unit in a state of being housed in the unit mounting portion is mounted and removed, together with the processing unit, on and from the apparatus body.