The cleaning device (20) for cleaning a cylindrical roller (50), for example an anilox roller of a printing machine, includes a cleaning head (30) with a cleaning chamber (110), in which there is housed a mechanical cleaning member (60), and with which there are associated feeding members (70) for feeding a cleaning liquid into the cleaning chamber (110). The mechanical member (60) and cleaning liquid dispensed by the feeding members work in combination inside said cleaning chamber (110) to clean the lateral surface of the roller (50).

A coating device includes a head, a wiping mechanism, an arm, and a controller. The head includes a nozzle surface for discharging a coating material. The wiping mechanism wipes the nozzle surface. The arm holds the head. The controller controls movement of the head via the arm. The controller relatively moves the head with respect to the wiping mechanism to wipe the nozzle surface.

A coating device includes a head, a wiping mechanism, an arm, and a controller. The head includes a nozzle surface for discharging a coating material. The wiping mechanism wipes the nozzle surface. The arm holds the head. The controller controls movement of the head via the arm. The controller relatively moves the head with respect to the wiping mechanism to wipe the nozzle surface.

Disclosed herein is a device that includes a platform and a wiper attached to the platform. The wiper includes an aperture disposed within the platform and a channel. The channel in the platform runs from an outside edge of the platform to an outside edge of the aperture. The wiper also includes an aperture disposed within the wiper and a channel that runs from the outside edge of the wiper to the outside edge of the wiper aperture. The aperture in the wiper is smaller than the aperture in the platform. Also disclose is a device that includes a platform, a wiper attached to the platform, and a brush with bristles attached to the platform.

According to one embodiment, a cleaning head for cleaning a plurality of hoisting belts and/or at least one sheave of an elevator system is provided. The at least one sheave includes a plurality of grooves for receiving each of the hoisting belts. The cleaning head comprises a base plate and a plurality of wipers fixed to an upper end of the base plate to project outwards from the base plate. The cleaning head may be used to clean the plurality of hoisting belts at once and/or the plurality of grooves of the at least one sheave at once.

According to one embodiment, a cleaning head for cleaning a plurality of hoisting belts and/or at least one sheave of an elevator system is provided. The at least one sheave includes a plurality of grooves for receiving each of the hoisting belts. The cleaning head comprises a base plate and a plurality of wipers fixed to an upper end of the base plate to project outwards from the base plate. The cleaning head may be used to clean the plurality of hoisting belts at once and/or the plurality of grooves of the at least one sheave at once.

A semiconductor manufacturing equipment cleaning system has a multi-station cleaning and inspection system. Within semiconductor manufacturing equipment cleaning system, a tray cleaning station uses a first rotating brush passing over a first surface of a carrier and possibly semiconductor die, and a second rotating brush passing over a second surface of the carrier and semiconductor die opposite the first surface of the carrier and semiconductor die. Debris and contaminants dislodged from the first surface and second surface of the carrier by the first rotating brush and second rotating brush are removed under vacuum suction. A conveyor transports the carrier through the multi-station cleaning and inspection system. The first rotating brush and second rotating brush move in tandem across the first surface and second surface of the carrier. Air pressure is injected across the first rotating brush and second rotating brush to further remove debris and contaminants.

A semiconductor manufacturing equipment cleaning system has a multi-station cleaning and inspection system. Within semiconductor manufacturing equipment cleaning system, a tray cleaning station uses a first rotating brush passing over a first surface of a carrier and possibly semiconductor die, and a second rotating brush passing over a second surface of the carrier and semiconductor die opposite the first surface of the carrier and semiconductor die. Debris and contaminants dislodged from the first surface and second surface of the carrier by the first rotating brush and second rotating brush are removed under vacuum suction. A conveyor transports the carrier through the multi-station cleaning and inspection system. The first rotating brush and second rotating brush move in tandem across the first surface and second surface of the carrier. Air pressure is injected across the first rotating brush and second rotating brush to further remove debris and contaminants.

In some examples, a processing machine has at least one cleaning device for cleaning a substrate. The at least one cleaning device and the at least one substrate are able to be arranged in a first and a second cleaning state, and the substrate is arranged at a distance from the at least one cleaning device in the first cleaning state. The substrate is arranged in contact with the at least one cleaning device in the second cleaning state, and the at least one cleaning device and the substrate are arranged so as to be transferable at least from the first cleaning state into the second cleaning state. The at least one cleaning device is arranged to be adjusted from a first cleaning position in the first cleaning state into a second cleaning position in the second cleaning state.

A recording device includes a recording unit configured to perform recording on a medium, a transporting belt configured to transport the medium, the transporting belt including a surface on which the medium is able to be supported, a washing unit configured to wash the surface using a liquid, an ultrasonic sensor configured to transmit an ultrasonic wave onto the surface and receive the ultrasonic wave reflected from the surface, and a control unit configured to determine a remaining state of the liquid on the surface based on a result of detection by the ultrasonic sensor, in which the ultrasonic sensor transmits the ultrasonic wave onto at least part of the transporting belt, from downstream of the washing unit to upstream of the recording unit, in a rotation direction of the transporting belt.