A semiconductor device is provided. On one main surface side of an n-type semiconductor substrate, a p-type diffusion region to serve as an anode of a diode is formed. A guard ring formed of a p-type diffusion region is formed to surround the anode. On the other main surface side, an n-type ultrahigh-concentration impurity layer and an n-type high-concentration impurity layer to serve as a cathode are formed. In a guard-ring opposed region located in the cathode and opposite to the guard ring, a cathode-side p-type diffusion region is formed. Accordingly, concentration of the electric current on an outer peripheral end portion of the anode is suppressed.

A semiconductor device and an electronic device are improved in performances by supporting a large current. An emitter terminal protrudes from a first side of a sealing body, and signal terminals protrude from a second sides of the sealing body. Namely, the side of the sealing body from which the emitter terminal protrudes and the side of the sealing body from which the signal terminals protrude are different. More particularly, the signal terminals protrude from the side of the sealing body opposite the side thereof from which the emitter terminal protrudes. Further, a second semiconductor chip including a diode formed therein is mounted over a first surface of a chip mounting portion in such a manner as to be situated between the emitter terminal and the a first semiconductor chip including an IGBT formed therein in plan view.

Embodiments include a method and structure to that provide a clamping structure in an integrated semiconductor device. In accordance with an embodiment, the method includes forming trenches in a semiconductor material and forming a shield electrode in a portion of at least one of the trenches. A clamping structure is formed adjacent to a trench. The clamping structure has an electrode that may be electrically connected to a source region of the integrated semiconductor device. In accordance with another embodiment, an impedance element is formed in a trench.

A semiconductor package structure comprises: a high-voltage depletion type semiconductor transistor comprising a source electrode, a gate electrode and a drain electrode; a low-voltage enhancement type semiconductor transistor comprising a source electrode, a gate electrode and a drain electrode; a shell comprising a cavity for receiving the high-voltage depletion type semiconductor transistor and the low-voltage enhancement type semiconductor transistor, and a high-voltage terminal, a first low-voltage terminal and a second low-voltage terminal; and cascade circuits comprising a supporting sheet having a conductive surface. The source electrode of the high-voltage depletion type transistor and the drain electrode of the low-voltage enhancement type semiconductor transistor are fixed to the conductive surface of the supporting sheet and electrically connected to each other through the conductive surface of the supporting sheet. A side of the supporting sheet away from the conductive surface is fixed to the cavity of the shell.

A semiconductor device is provided. The device includes an n type layer with a trench disposed in a first surface of an n+ type silicon carbide substrate. An n+ type region and a first p type region are disposed at the n type layer and at a lateral surface of the trench. A plurality of second p type regions are disposed at the n type layer and spaced apart from the first p type region. A gate electrode includes a first and a plurality of second gate electrodes disposed at the trench and extending from the first gate electrode, respectively. A source electrode is disposed on and insulated from the gate electrode. A drain electrode is disposed on a second surface of the n+ type silicon carbide substrate. The source electrode contacts the plurality of second p type regions spaced apart with the n type layer disposed therein.

A method for manufacturing a semiconductor device having an SiC-IGBT and an SiC-MOSFET in a single semiconductor chip, including forming a second conductive-type SiC base layer on a substrate, and selectively implanting first and second conductive-type impurities into surfaces of the substrate and base layer to form a collector region, a channel region in a surficial portion of the SiC base layer, and an emitter region in a surficial portion of the channel region, the emitter region serving also as a source region of the SiC-MOSFET.

A power module is disclosed that includes a housing with an interior chamber wherein multiple switch modules are mounted within the interior chamber. The switch modules comprise multiple transistors and diodes that are interconnected to facilitate switching power to a load. In one embodiment, at least one of the switch modules supports a current density of at least 10 amperes per cm.sup.2.

A semiconductor device including a first line configured to receive a power supply voltage, a second line configured to be coupled to a load of the semiconductor device, first and second metal-oxide-semiconductor (MOS) transistors coupled in series between the first line and the second line, each of the first and second MOS transistors having a drain electrode and a gate electrode, the drain electrode of the first MOS transistor being coupled to the drain electrode of the second MOS transistor, a third line coupled to the gate electrode of the first MOS transistor, and a fourth line coupled to the gate electrode of the second MOS transistor, the third and fourth lines being electrically separated from each other.

A semiconductor device includes MOSFET cells having a drift region of a first conductivity type. A first and second active area trench are in the drift region. A split gate uses the active trenches as field plates or includes planar gates between the active trenches including a MOS gate electrode (MOS gate) and a diode gate electrode (diode gate). A body region of the second conductivity type in the drift region abutts the active trenches. A source of the first conductivity type in the body region includes a first source portion proximate to the MOS gate and a second source portion proximate to the diode gate. A vertical drift region uses the drift region below the body region to provide a drain. A connector shorts the diode gate to the second source portion to provide an integrated channel diode. The MOS gate is electrically isolated from the first source portion.

According to one embodiment, a semiconductor device is provided. The semiconductor device has a first region formed of semiconductor and a second region formed of semiconductor which borders the first region. An electrode is formed to be in ohmic-connection with the first region. A third region is formed to sandwich the first region. A first potential difference is produced between the first and the second regions in a thermal equilibrium state, according to a second potential difference between the third region and the first region.