A hot plug immune circuitry (100) for protecting against electrostatic discharge events comprises an input/output (I/O) pad (101) of an electronic system with a pad threshold voltage and connections to ground potential by a first circuit (110) and a parallel second circuit (130). The first circuit includes a MOS field-effect transistor (FET) (111) doubling as a parasitic bipolar transistor. The second circuit is a voltage level sensor formed as a voltage divider with a first impedance (131) tied by a link (133) in series with a second impedance (132). Link (133) is cross-tied (134) to the FET of the first circuit, and carries a shut-off voltage for the FET determined by the pad threshold voltage diminished by the ratio of the first and the second impedances.

An electrostatic discharge protection device includes an anode, a cathode, a negative voltage holding transistor and a positive voltage holding transistor. The anode is coupled to an input terminal, and the cathode is coupled to a ground. The negative voltage holding transistor includes an N-well. The positive voltage holding transistor includes an N-well. The N-well of the positive voltage holding transistor and the N-well of the negative voltage holding transistor are coupled together and are float. The negative voltage holding transistor and the positive voltage holding transistor are coupled between the anode and the cathode in a manner of back-to-back.

There is set forth herein a field effect transistor (FET) configured as an ESD protection device. In one embodiment, the FET can be configured to operate in a snapback operating mode. The FET can include a semiconductor substrate, a gate formed on the substrate and a dummy gate formed on the substrate spaced apart from the gate.

The present disclosure relates to a semiconductor device with an ESD protection structure. The semiconductor device includes a high-voltage power device 101, the ESD protection structure is a NMOS transistor 102, a drain of the NMOS transistor is shared by a source of the power device as a common-drain-source structure 107, substrate leading-out regions of the power device 101 and the NMOS transistor are coupled to the source 106 of the NMOS transistor as a ground leading-out. In the present disclosure, the drain of the NMOS transistor is shared by the source of the power device, so the increased area of the device with the ESD protection structure incorporated is small. In addition, the holding voltage at the source of the high-voltage power device is relatively low, which helps to protect the gate oxide and improve the source reliability.

An Ill-nitride semiconductor based heterojunction power device is disclosed and includes a first and second heterojunction transistors formed on a substrate. The first and second heterojunction transistors include first and second Ill-nitride semiconductor regions formed over the substrate. The first Ill-nitride semiconductor region includes a first heterojunction, a first terminal connected to the first Ill-nitride semiconductor region, a second terminal laterally spaced from the first terminal and connected to the first Ill-nitride semiconductor region, and a first gate region over the first Ill-nitride semiconductor region between the first and second terminals. The second Ill-nitride semiconductor region includes a second heterojunction, a third terminal connected to the second Ill-nitride semiconductor region, a fourth terminal laterally spaced from the third terminal and connected to the second Ill-nitride semiconductor region, first highly doped semiconductor regions of a first conductivity type formed over the second Ill-nitride semiconductor region.

A voltage tracking circuit includes a first, second, third and fourth transistor. The first transistor is in a first well, the first transistor including a first source terminal and a first body terminal that are coupled to a first voltage supply. The second transistor includes a second source terminal being coupled to the first drain terminal, a second gate terminal being coupled to a pad voltage terminal and configured to receive a pad voltage. The third transistor is in a second well, and includes a third gate terminal coupled to the first voltage supply, and a third body terminal coupled to a first node. The fourth transistor includes a fourth drain terminal coupled to the third source terminal, a fourth gate terminal coupled to the third gate terminal and the first voltage supply, and a fourth source terminal coupled to the pad voltage terminal.

A semiconductor device includes a substrate. The semiconductor device further includes a doped region in the substrate. The semiconductor device further includes an active area, and wherein the active area comprises an emitter region and a collector region, wherein the emitter region is electrically connected to the doped region. The semiconductor device further includes a deep trench isolation (DTI) structure extending through the active area and between the emitter region and the collector region.

Snapback ESD protection device employing one or more non-planar metal-oxide-semiconductor transistors (MOSFETs) are described. The ESD protection devices may further include lightly-doped extended drain regions, the resistances of which may be capacitively controlled through control gates independent of a gate electrode held at a ground potential. Control gates may be floated or biased to modulate ESD protection device performance. In embodiments, a plurality of core circuits are protected with a plurality of non-planar MOSFET-based ESD protection devices with control gate potentials varying across the plurality.

A semiconductor device includes a first semiconductor region that has an external profile including at least one corner, and that includes a semiconductor of a first conductivity type, and a first insulation region that surrounds an outer periphery of the first semiconductor region, and that includes an insulator that, at a corner portion corresponding to the corner, has a depth deeper than a depth at a location other than the corner portion. The semiconductor device further includes a second semiconductor region that surrounds an outer periphery of the first insulation region, and that includes a semiconductor of a second conductivity type, and a second insulation region that surrounds an outer periphery of the second semiconductor region, and that includes an insulator that is deeper than the depth of the first insulation region at the location other than the corner portion.

A device includes a plurality of STI regions, a plurality of semiconductor strips between the STI regions and parallel to each other, and a plurality of semiconductor fins over the semiconductor strips. A gate stack is disposed over and crossing the plurality of semiconductor fins. A drain epitaxy semiconductor region is disposed on a side of the gate stack and connected to the plurality of semiconductor fins. The drain epitaxy semiconductor region includes a first portion adjoining the semiconductor fins, wherein the first portion forms a continuous region over and aligned to the plurality of semiconductor strips. The drain epitaxy semiconductor region further includes second portions farther away from the gate stack than the first portion. Each of the second portions is over and aligned to one of the semiconductor strips. The second portions are parallel to each other, and are separated from each other by a dielectric material.