There is provided a peeling apparatus including an ingot holding unit that has a holding surface for holding an ingot, a wafer holding unit that is capable of approaching and separating from the ingot holding unit and has a holding surface for holding under suction a wafer to be produced, and a cleaning brush that cleans peel-off surfaces at which the wafer to be produced has been peeled off from the ingot and thereby removes peeling swarf.

A lower-surface center region of a substrate held by a first holder is cleaned by a cleaner. A lower-surface outer region of the substrate rotated by a second holder is cleaned by the cleaner. A mobile base provided with the second holder and the cleaner is moved in a horizontal plane such that a reference position of the first holder coincides with a center axis of the second holder in a plan view when the substrate is received and transferred between the first holder and the second holder, and is moved in the horizontal plane such that the cleaner overlaps with the lower-surface center region of the substrate held by the first holder and a center axis of the cleaner coincides with a first portion different from a center of the substrate in the plan view when the lower-surface center region is cleaned.

A method of washing a food product with a short-term, intense treatment solution. One example method generally includes: applying, using a short-term wash device, a short-term wash treatment solution to the food product; and applying, using a wash device coupled to the short-term wash device, a wash treatment to the food product such that the wash treatment rinses the short-term wash treatment solution from the food product, wherein: the short-term wash treatment solution is applied to the food product for a shorter duration than the wash treatment is applied to the food product; the short-term wash treatment solution is chemically different from the wash treatment; and the short-term wash treatment solution comprises an acidulant and a polyol.

A first cleaner cleans an upper surface of a substrate by scanning above the substrate to pass through a first point in an outer edge of the substrate in a plan view. A second cleaner cleans an outer peripheral end of the substrate by coming into contact with a second point in the outer edge of the substrate in a plan view. A virtual first straight line passing through the first point and the second point and a virtual second straight line passing through a center of the substrate and is parallel to the first straight line are defined. A third cleaner is arranged below the substrate and opposite to the first cleaner and the second cleaner with the second straight line located between the third cleaner, and the first cleaner and the second cleaner, and cleans a lower surface of the substrate.

A substrate is held in a horizontal attitude by a substrate holder. At a processing position, a lower surface of the substrate held by the substrate holder is cleaned by a lower-surface brush. The lower-surface brush is cleaned by a brush cleaner at a waiting position that overlaps with the substrate held by the substrate holder in an up-and-down direction and is below a processing position. The lower-surface brush is lifted and lowered by a lower-surface brush lifting-lowering driver between the processing position and the waiting position.

The disclosure provides a jig for attaching and detaching a cleaning member, which facilitates attaching and detaching the cleaning member to and from a rotation device without holding the cleaning member directly by hand, even when there is no sufficient spacing around the cleaning member. The jig 100 for attaching and detaching a cleaning member 60 includes a pair of jig bodies 110 capable of clamping two ends 63 of a holder 62 of the cleaning member 60, and a connecting mechanism 120 that interlocks the movements of the pair of jig bodies 110 between a clamped state in which two ends 63 of the holder 62 are clamped and a non-clamped state in which the clamped state is released.

A biological information measurement apparatus comprises: a spectrometer; a housing that contains the spectrometer and includes a surface on which a measurement target is to be placed, and an aperture portion through which light illuminating the measurement target placed on the surface and light reflected from the measurement target are to pass; and a shutter member that can move between a first position of opposing the aperture portion of the housing and a second position of retreating from the first position of opposing the aperture portion, the shutter member including a white reference surface. If the shutter member is at the first position, the spectrometer performs calibration using the white reference surface. If the shutter member is at the second position, the aperture portion and the measurement target oppose each other, and the spectrometer colorimetrically measures the measurement target.

The cleaning device (20) for cleaning a cylindrical roller (50), for example an anilox roller of a printing machine, includes a cleaning head (30) with a cleaning chamber (110), in which there is housed a mechanical cleaning member (60), and with which there are associated feeding members (70) for feeding a cleaning liquid into the cleaning chamber (110). The mechanical member (60) and cleaning liquid dispensed by the feeding members work in combination inside said cleaning chamber (110) to clean the lateral surface of the roller (50).

Disclosed is an optical window cleaning device, including: a cleaning brush; and a wiper arm. The wiper arm includes a first link, a torsion mechanism, a second link and a wiper arm drive system. A second end of the first link is hinged to a first end of the second link. The cleaning brush is hinged to a first end of the first link, a rotation trajectory of the cleaning brush and a rotation trajectory of a hinge joint between the second end of the first link and the first end of the second link are both located in a first plane. A rotation trajectory of the second link and the rotation trajectory of the hinge joint are located in the first plane. The torsion mechanism provides the first link and the second link with a force that rotates the first link relative to the second link.

An industrial robotic vacuum system for cleaning agricultural facility ventilation ductwork. The industrial robotic vacuum system generally includes a robotic vacuum head.