Patent classifications
B08B1/001
Debris removal in high aspect structures
A debris collection and metrology system for collecting and analyzing debris from a tip used in nanomachining processes, the system including an irradiation source, an irradiation detector, an actuator, and a controller. The irradiation source is operable to direct incident irradiation onto the tip, and the irradiation detector is operable to receive a sample irradiation from the tip, the sample irradiation being generated as a result of the direct incident irradiation being applied onto the tip. The controller is operatively coupled to an actuator system and the irradiation detector, and the controller is operable to receive a first signal based on a first response of the irradiation detector to the sample irradiation, and the controller is operable to effect relative motion between the tip and at least one of the irradiation source and the irradiation detector based on the first signal.
Articulating dust collector
The device includes a substantially cylindrical, oblong, rigid, extension pole having a distal end upon which is formed an articulatable jaw structure head which can be actuated between open and closed positions by the pull of either a medial handle or knob located at the proximal end. A collector sock made from a pliable sheet material can be mounted upon the jaw structure so that the sock enwraps the entire item to be dusted such as a ceiling fan blade. The inner surface of the sock surrounding its open end maw can include asperities and electrostatic, dust adhering fibers to help scrape off and capture fine particles of dust and other debris from the item being dusted. The head can include a pair of parallely separatable cantelevered beams engaging the sock.
SUBSTRATE CLEANING METHOD AND SUBSTRATE CLEANING APPARATUS
A substrate cleaning method and a substrate cleaning apparatus are provided. The substrate cleaning method includes a first step of applying a chemical solution to a lower surface of a substrate, and a second step of subsequently applying a bubble-containing liquid to the lower surface of the substrate.
Machine tool wiper and method for manufacturing machine tool wiper
Provided are a wiper for a machine tool and a method for manufacturing a wiper for a machine tool, which can simplify a manufacturing process. A wiper for a machine tool mountable on a machine tool includes: a wiper body fixable to the machine tool, and made of a first elastic material having hardness of 80 degrees or more; and a sliding part made of a second elastic material containing a particulate reinforcing material and having hardness in a range of 50 degrees or more and 90 degrees or less which is smaller than the hardness of the first elastic material, the sliding part being provided integrally with the wiper body, wherein the wiper body and the sliding part are integrally formed without an adhesive.
Cleaning and charging portable X-ray detectors
The invention concerns a storage device for cleaning and charging portable X-ray detectors, and an X-ray system comprising such storage device. The storage device comprises a receiving unit for receiving at least one portable X-ray detector, a cleaning unit for cleaning the portable X-ray detector when being received by the receiving unit, and a charging unit for charging the portable X-ray detector, wherein the cleaning unit is configured for mechanically and/or chemically cleaning the portable X-ray detector. Further, the invention concerns a method of cleaning and charging a portable X-ray detector in a storage device.
SUBSTRATE CLEANING SYSTEM AND SUBSTRATE CLEANING METHOD
The present invention relates to a substrate cleaning system and a substrate cleaning method for cleaning a substrate. The substrate cleaning system (50) includes a heater (51), a chemical-liquid diluting module (52), and a cleaning module. A temperature of the diluted-chemical-liquid mixed by the chemical-liquid diluting module (52) is determined to be higher than normal a temperature and lower than a glass transition point of a cleaning member. The cleaning member scrubs the substrate (W) with the diluted chemical liquid having the determined temperature supplied to the substrate (W).
METHOD FOR CLEANING MEDICAL EQUIPMENT
A method for cleaning medical equipment by scrubbing the equipment with an open-cell melamine-formaldehyde foam comprising an antibacterial active composition, and wherein the open-cell melamine-formaldehyde foam is prepared from a melamine-formaldehyde precondensate, wherein the molar ratio melamine to formaldehyde of the melamine-formaldehyde precondensate is smaller than 0.5.
METHOD FOR WASHING ALUMINUM NITRIDE SINGLE CRYSTAL SUBSTRATE, METHOD FOR PRODUCING ALUMINUM NITRIDE SINGLE CRYSTAL LAYERED BODY, AND METHOD FOR PRODUCING ALUMINUM NITRIDE SINGLE CRYSTAL SUBSTRATE, AND ALUMINUM NITRIDE SINGLE CRYSTAL SUBSTRATE
A method for washing an aluminum nitride single crystal substrate, the aluminum nitride single crystal substrate including: an aluminum-polar face; and a nitrogen-polar face opposite to the aluminum-polar face, the method including: (a) scrubbing a surface of the nitrogen-polar face.
PERSONAL CLEANSING DEVICE
A personal cleansing device may include, but is not limited to: a body portion; an electric motor disposed within the body portion; control circuitry configured for control of operation of the electric motor; and a recess defined in the body portion and configured to receive at least one sponge insert.
ROASTING AND GLAZING APPARATUS
A roasting and glazing apparatus includes a roaster, an agitator mounted within the roaster bowl for mixing a mixture of nuts and sugar during a roasting or glazing operation, a heater controlled to heat the roaster bowl during the roasting or glazing operation, and a cover removably mounted to the roaster bowl. The cover includes a reservoir for receiving water from a user and restricting water flow from the reservoir into the mixture of nuts and sugar in the roaster bowl. The cover and the roaster bowl together define a vent on a side of the cover opposite the reservoir. The vent is configured to direct steam out of the roaster bowl in a direction away from the reservoir.