B01D53/68

Methods and systems for providing corrosion resistant surfaces in contaminant treatment systems

Systems and apparatuses for neutralizing acidic compounds in flue gases emitted from a heat recovery coke oven. A representative system includes a spray dry absorber having a barrel that includes a plurality of wall plates that form sidewalls of the barrel. The wall plates include a steel plate and a corrosion resistant alloy cladded to the steel plate and the wall plates are oriented such that the corrosion resistant alloy faces toward and is in fluid communication with an interior area of the barrel. The alloy is resistant to corrosion caused by the acidic compounds in the flue gas and can prevent the steel plate from being corroded by these acidic compounds.

MXENES FOR SELECTIVE ADSORPTION OF DESIRED CHEMICAL ANALYTES AND METHOD THEREOF
20220274087 · 2022-09-01 ·

Provided are methods of using MXene compositions to selectively adsorb analytes such as toxic industrial chemicals, opioids, and nerve agents. Also provided are MXene compositions configured to effect selective adsorption of analytes.

Wet abatement system

A wet abatement system which can suppress the accumulation of foreign matters in a treatment gas line is proposed. There is provided a wet abatement system for detoxifying treatment gas by bringing the treatment gas into contact with liquid. The wet abatement system includes an inlet casing having an inlet port from which the treatment gas is let in and an outlet port provided below the inlet port and through which the treatment gas flows, and a liquid film forming device provided between the inlet port and the outlet port and configured to form a liquid film on an inner wall surface of the inlet casing. A heater configured to heat the inlet casing is embedded in an interior of a wall portion of the inlet casing, the wall portion constituting a portion situated above the liquid film forming device.

Wet abatement system

A wet abatement system which can suppress the accumulation of foreign matters in a treatment gas line is proposed. There is provided a wet abatement system for detoxifying treatment gas by bringing the treatment gas into contact with liquid. The wet abatement system includes an inlet casing having an inlet port from which the treatment gas is let in and an outlet port provided below the inlet port and through which the treatment gas flows, and a liquid film forming device provided between the inlet port and the outlet port and configured to form a liquid film on an inner wall surface of the inlet casing. A heater configured to heat the inlet casing is embedded in an interior of a wall portion of the inlet casing, the wall portion constituting a portion situated above the liquid film forming device.

Method and apparatus for reduction of HCI emission from cement plants using cement raw meal as absorber
11413575 · 2022-08-16 · ·

The invention relates to a method for reduction of HCl emission from a cement plant based on a treatment of a preheater (1) and/or bypass gas stream, characterized in that a cement raw meal, as a HCl absorber, is dispersed in the gas stream(s) from which HCl is to be removed; the cement raw meal is introduced from a raw mill (6) and/or a silo (8) into a pipe with a up going gas flow; the pipe being arranged in fluid communication at a point after a gas conditioning tower (7) and/or before a particle filter unit (5) and/or in a by-pass line before particle filter (4).

Method and a system for producing hydrochloric acid from flue gases

A method for producing aqueous hydrochloric acid from flue gases is provided. The method comprises conveying water to a first scrubber (102, 202, 302, 402, 502, 602, 702) or to a line (112b, 212b, 312b, 412b, 512b, 712b, 712c) to use the water in a scrubbing liquid of the first scrubber. The method also comprises providing flue gas containing chlorides into the first scrubber (102, 202, 302, 402, 502, 602, 702) and scrubbing the flue gas containing chlorides with the scrubbing liquid by contacting the flue gas with the scrubbing liquid in the first scrubber (102, 202, 302, 402, 502, 602, 702). Dilute hydrochloric acid and a flue gas derivate (104, 204, 304, 404, 504, 704) are produced. The method comprises letting out at least some of the dilute hydrochloric acid from the first scrubber (102, 202, 302, 402, 502, 602, 702) as a scrubber bleed, separating solids suspended by the scrubber bleed in a solids separator (192, 592, 692), conveying the scrubber bleed from the solids separator (192, 592, 692) into an evaporation vessel (194, 594, 694) and concentrating the scrubber bleed in the evaporation vessel (194, 594, 694) to produce hydrochloric acid vapor having a concentration of 5-22 wt-%. A corresponding system is also provided.

METHODS FOR RECOVERING IODINE (I2)
20220219980 · 2022-07-14 ·

Methods of recovering iodine (I.sub.2) from a stream including iodine (I.sub.2) vapor and at least one of: an inert gas and water vapor can include contacting the stream with an alkaline solution to form an iodide salt, contacting the stream with an adsorbent to selectively adsorb water from the stream, contacting the stream with a concentrated acid to absorb the water vapor from the stream, desublimating or condensing the iodine (I.sub.2) vapor to form solid or liquid iodine (I.sub.2), or contacting the stream with a material to condense or de-sublimate the iodine (I.sub.2) vapor from the stream as the material at least one of: absorbs latent heat through a phase change of the material and absorbs sensible heat.

SYSTEM AND METHOD FOR TREATING EXHAUST FLUID FROM SEMICONDUCTOR MANUFACTURING EQUIPMENT
20220097000 · 2022-03-31 · ·

Disclosed is a system for treating exhaust fluid from semiconductor manufacturing equipment in which cleaning gases decomposed by a plastic apparatus alternately flow towards a front rotor region (a main rotor unit) and a rear rotor region (a subsidiary rotor unit) of a booster pump and then flow towards a dry pump, and thus uniformly react with process byproducts present throughout the whole area in a vacuum pump including the booster pump and the dry pump so as to improve removal efficiency of the process byproducts. Further, the retention time of the cleaning gases decomposed by the plasma apparatus in the vacuum pump is increased by adjusting the pressure in the pump with the rotational speed of a motor, and thus the reaction time of the cleaning gases with the process byproducts is increased, so as to further improve removal efficiency of the process byproducts, such as SiO.sub.2 powder.

Methods and compositions for scrubbing chlorine-containing gases

Methods and compositions are described that remove chlorine from a chlorine-containing gas stream. The method includes adding a carbonate salt and optionally a scale inhibitor to a scrubbing liquid in a wet scrubbing system, and contacting the chlorine-containing gas with the scrubbing liquid. The amount of carbonate salt that is added can vary depending on the pH of the scrubbing liquid.

Methods and compositions for scrubbing chlorine-containing gases

Methods and compositions are described that remove chlorine from a chlorine-containing gas stream. The method includes adding a carbonate salt and optionally a scale inhibitor to a scrubbing liquid in a wet scrubbing system, and contacting the chlorine-containing gas with the scrubbing liquid. The amount of carbonate salt that is added can vary depending on the pH of the scrubbing liquid.