A helmet rental system keeping the helmets in individual boxes that have a self-cleaning system built into the system to make the helmets safe for reuse. The full surface of the helmet is to be exposed to heat, possible steam, cleaner, one or more rotating brush(es) and/or UV light to clean the surface fully. The helmet holder allows the heat, steam, cleaner, brushes, and light to easily hit the surface. The cleaning system is based on heat and then cool off the box with AC and/or vent system before allowing the helmet to be rented again after each return. Heat comes from vents under the helmet holding system, holding it in place and/or from all around the helmet. Boxes are modular so one could simply remove a few screws to add or remove rows or boxes to the system to expand or reduce the amount of available helmets and configuration.

A helmet rental system keeping the helmets in individual boxes that have a self-cleaning system built into the system to make the helmets safe for reuse. The full surface of the helmet is to be exposed to heat, possible steam, cleaner, one or more rotating brush(es) and/or UV light to clean the surface fully. The helmet holder allows the heat, steam, cleaner, brushes, and light to easily hit the surface. The cleaning system is based on heat and then cool off the box with AC and/or vent system before allowing the helmet to be rented again after each return. Heat comes from vents under the helmet holding system, holding it in place and/or from all around the helmet. Boxes are modular so one could simply remove a few screws to add or remove rows or boxes to the system to expand or reduce the amount of available helmets and configuration.

A wiping system for a robotic repair unit is presented that includes a motive robot arm with a motor, a connection mechanism coupled to the motive robot arm, and a wiping medium coupled to the connection mechanism. The wiping medium includes a base layer and a plurality of features extending from the base layer. The motive robot arm, powered by the motor, moves the wiping medium. The motive robot arm is configured to move the wiping medium toward, or away from, a worksurface. The motive arm is configured to press the wiping medium toward the worksurface during a wiping operation. During the wiping operation, the wiping medium is driven by a wiping motor against the surface.

A wiping system for a robotic repair unit is presented that includes a motive robot arm with a motor, a connection mechanism coupled to the motive robot arm, and a wiping medium coupled to the connection mechanism. The wiping medium includes a base layer and a plurality of features extending from the base layer. The motive robot arm, powered by the motor, moves the wiping medium. The motive robot arm is configured to move the wiping medium toward, or away from, a worksurface. The motive arm is configured to press the wiping medium toward the worksurface during a wiping operation. During the wiping operation, the wiping medium is driven by a wiping motor against the surface.

A substrate holding device includes a spin table, and three or more holders. The three or more holders each have a base and a position regulator, and are arranged on an outer periphery of the spin table while being spaced apart from one another. At least one of the holders includes a rotating base as the base that is rotatable around a longitudinal shaft axis, a rotating position regulator as the position regulator that regulates a horizontal position of the substrate on the spin table, a rotating mechanism configured to switch the rotating position regulator between a first condition and a second condition, and a pushing member that is spaced apart from the substrate when the rotating position regulator is under the first condition and pushes the substrate in a direction apart from the position regulator when the rotating position regulator is switched to the second condition.

An apparatus which can remove particles, such as polishing debris, from a back surface with high removal efficiency is provided. The apparatus includes: a substrate holder configured to rotate the substrate while holding the substrate with the back surface facing upward; a scrub cleaning tool configured to be rotatable; a two-fluid nozzle disposed above the substrate holder; and a housing defining a cleaning chamber in which the substrate holder, the scrub cleaning tool, and the two-fluid nozzle are located.

Cleaning systems proposed in the art have technical construct limitations in the cleaning mechanisms used, which leads to a lower ratio of power consumed to area cleaned, directly affecting the cleaning efficiency. Thus, an Unmanned Aerial Vehicle (UAV) Propelled Autonomous Multiplane Cleaning System (UPAMCS) is disclosed. An UAV and Mopping Interface Mechanism (UAV-MIM) connects a UAV to one or more mopping systems comprising an epicyclic gear driven moppers with no additional power devices used. A maneuvering mechanism disclosed enables the UAV to propel the mopping systems to reach any geometric shape or inclination. The UPAMCS provides cost, time, and power efficient surface cleaning. The UPAMCS is also equipped with vision cameras and LiDAR for guidance during landing and crawling over surfaces along with additional surface defect detection by processing the captured images.

While a substrate is being rotated, the lower surface of a brush is moved along the upper surface of the substrate. The brush and a spray nozzle are moved upward from a takeoff position to a lower non-contact position so as to separate the lower surface of the brush from the upper surface of the substrate. The spray nozzle generates the droplets in a state where the brush and the spray nozzle are located in the lower non-contact position so as to make the droplets collide with the upper surface of the substrate, and then the droplets colliding with the upper surface of the substrate are discharged from a gap between the lower surface of the brush and the upper surface of the substrate while the droplets are being supplied to the lower surface of the brush.

A self-cleaning device of the present disclosure includes: a cleaning member configured to clean a cleaning tool that cleans a substrate; and an injection unit configured to inject a liquid toward the cleaning member or the cleaning tool. The cleaning member has a cleaning surface that cleans the cleaning tool when the cleaning tool is pressed thereagainst, and the cleaning surface is inclined with respect to a horizontal plane.

A brush is moved from a central position to an outer periphery position while the brush is contacted with an upper surface of a substrate being rotated at a first rotational speed. In this way, a flat region of the substrate is scrub-cleansed. Thereafter, the brush is contacted with a bevel region of the substrate being rotated at a second rotational speed lower than the first rotational speed. In this way, the bevel region of the substrate is scrub-cleansed. Thereafter, while the substrate is rotated at a third rotational speed higher than the second rotational speed, the brush is disposed at an overlapping region cleaning position. In this way, an overlapping region of the flat region and the bevel region are scrub-cleansed.