A propeller assembly to facilitate the cleaning of aquaculture nets. The propeller assembly has a centrally disposed hub with a plurality of aluminum alloy blades extending outwardly to a perimeter ring. A plurality of triangular shaped rigid knuckles is coupled to the perimeter ring. A blade spacer is attached to a leading edge of each blade, the blade spacer constructed of a wear resistant material. In operation, rotation of the blades provides thrust for positioning the knuckles against an aquaculture net, whereby the knuckles remove fouling from the aquaculture net by violently shaking the aquaculture net. The blade spacer positions the propeller assembly a predetermined distance from the aquaculture net to protect the leading edge by distance and/or use of a wear resistant material.

The present invention provides methods and systems for a self-cleaning ion generator that includes a self-cleaning ion generator device that includes a bottom portion, a top portion, at least one electrode extending from the top portion, and a cleaning apparatus for cleaning the at least one electrode.

A substrate treatment apparatus includes a brush moving mechanism which moves a shaft to which a cleaning brush is attached. The brush body includes a substrate contact portion of a pillar-shaped portion. The substrate treatment apparatus further includes a correcting member and a relatively-positioning mechanism. When the correcting member is placed in a target position, a contact portion of the correcting member overlaps an object portion which is a combination of a design contact portion and a belt-shaped annular portion in an outer surface of a design pillar-shaped portion of a design body of a design brush. The contact portion is formed to have an inverted shape of the object portion of the design brush, and a portion of the contact portion, which corresponds to the belt-shaped annular portion, is a center-axis facing surface which faces a center axis of the shaft.

Embodiments set forth a cleaning brush handle that includes a head region that includes one or more brush apertures, where each brush aperture is configured to receive one replaceable brush. The brush apertures may be orthogonal to the brush handle, or, in the alternative, may be at an angle in the longitudinal direction, the transversal direction, or both. The brush includes a nominally round or hex-shaped shank that is inserted into the brush aperture. The brushes are held in place via a suitable mounting mechanism, such as a threaded insert that receives a thumbscrew or a bushing with a threaded hole that receives a thumbscrew. The mounting mechanism provides for easy insertion, rotation, removal, and replacement of the brushes. The mounting mechanism provides for rotating the brushes, in small increments, through a 360 range, for more even brush wear and longer brush life, relative to conventional cleaning brushes.

The disclosure concerns a system for cleaning lavatory plumbing fixtures, an instrument forming part of the system for cleaning lavatory plumbing fixtures, and a method for utilizing the system and instrument for cleaning lavatory plumbing fixtures. The instrument generally includes a shaft and a brush head configured to couple with the shaft. In certain embodiments, a rotary device is provided; the rotary device is coupled to the instrument for supplying power rotation for enhanced cleaning.

A cleaning apparatus is provided. The cleaning apparatus includes a housing assembly having an exterior housing connected with a vacuum intake unit and an interior housing fixed to the exterior housing at a preset interval from an interior surface of the exterior housing. A brush assembly is disposed within the interior housing and is configured to rotate by a drive motor to contact a surface of a cleaning target. An air intake member has an air intake passageway that is connected with a cavity between the exterior housing and the interior housing and is slidably coupled to the housing assembly. A shock absorbing spring is mounted on the housing assembly and is configured to elastically supports the air intake member.

A method for increasing the rate of debris collection of a robotic vacuum through increasing the number of times a robotic vacuum's cleaning apparatus passes over a work surface during each pass of the device. The device's main cleaning apparatus is installed on a plate that rotates within the housing of the device. The drive unit is housed separately from the rotating plate so that the device's normal movement patterns will be uninterrupted by the rotation of the cleaning apparatus. Ideally, the cleaning apparatus will be caused to rotate two or more times over an area before the robotic vacuum has driven completely through the area.

A high pressure surface cleaner includes a housing having an open end, a high pressure coupling in fluid communication with the housing and having a first end and a second end, the first end configured to receive a high pressure water source, and a supply conduit rotatably secured to the second end of the high pressure coupling and configured to rotate about the high pressure coupling defining a horizontal plane within the housing. The cleaner also includes first and second nozzles having a vertical axis therethrough and secured proximate to the first and opposing second ends of the supply conduit, respectively, the vertical axis of the first and second nozzles approximately normal to the first horizontal plane, and a directional nozzle coupled to the supply conduit and having a directional outlet orientated to cause the supply conduit with the first and second nozzles to rotate when discharging water.

An apparatus which can polish an entirety of a surface of a substrate, such as a wafer, is disclosed. The apparatus includes a substrate holder configured to hold a substrate and rotate the substrate; and a polishing head configured to rub a polishing tool against a first surface of the substrate to polish the first surface. The substrate holder includes a plurality of rollers which can contact a periphery of the substrate. The plurality of rollers are rotatable about their respective own axes.

A substrate processing apparatus is provided with a polishing part that polishes a substrate, a transporting part that transports a substrate before polishing to the polishing part, and a cleaning part that cleans the polished substrate. The cleaning part has a first cleaning unit and a second cleaning unit that are vertically arranged in two stages. The first cleaning unit and the second cleaning unit each have a plurality of cleaning modules that are arranged in series. The transporting part has a slide stage that is disposed between the first cleaning unit and the second cleaning unit, and transports a substrate before polishing along an arrangement direction of the plurality of cleaning modules.