A device includes a first cleaning element and a second cleaning element positioned opposite the first cleaning element. An optical device can be placed between the first cleaning element and the second cleaning element. A sensor is configured to output a force signal that represents a force applied by the first cleaning element, and a controller is operable to control operation of the first cleaning element based on the force signal.

A device includes a first cleaning element and a second cleaning element positioned opposite the first cleaning element. An optical device can be placed between the first cleaning element and the second cleaning element. A sensor is configured to output a force signal that represents a force applied by the first cleaning element, and a controller is operable to control operation of the first cleaning element based on the force signal.

A cleaning device for removing impurities from a bar-shaped structure includes a drive unit, and two roughing discs capable of being driven to rotate about a common axis of rotation. At least one roughing disc of the two roughing discs is capable of being driven by the drive unit. The two roughing discs form, along the common axis of rotation, a receiving region for the bar-shaped structure. Each roughing disc has, on a side facing the receiving region, a plurality of roughing projections. The two roughing discs are formed along the axis of rotation in a movably sprung manner in order to cause, in a state in which the two roughing discs are arranged on the bar-shaped structure, the roughing discs to be pushed onto both sides of the bar-shaped structure.

A cleaning device for removing impurities from a bar-shaped structure includes a drive unit, and two roughing discs capable of being driven to rotate about a common axis of rotation. At least one roughing disc of the two roughing discs is capable of being driven by the drive unit. The two roughing discs form, along the common axis of rotation, a receiving region for the bar-shaped structure. Each roughing disc has, on a side facing the receiving region, a plurality of roughing projections. The two roughing discs are formed along the axis of rotation in a movably sprung manner in order to cause, in a state in which the two roughing discs are arranged on the bar-shaped structure, the roughing discs to be pushed onto both sides of the bar-shaped structure.

Disclosed are substrate cleaning heads, substrate cleaning modules, substrate cleaning systems, and substrate processing methods. The substrate cleaning head comprises a support body having a vertical axis, and a plurality of brushes at a bottom surface of the support body, wherein the brushes of the plurality of brushes are arranged in a circumferential direction about the vertical axis of the support body. The brushes of the plurality of brushes are each spaced apart from one another in the circumferential direction. Each of the brushes includes a brush body that extends in the circumferential direction from a first side surface to a second side surface opposing the first side surface, and an inclination portion extending inward from an inner lateral extent of the brush body. A thickness of the inclination portion decreases in an inward direction. An inclined surface as a bottom surface of the inclination portion forms an acute angle with the vertical axis.

Disclosed are substrate cleaning heads, substrate cleaning modules, substrate cleaning systems, and substrate processing methods. The substrate cleaning head comprises a support body having a vertical axis, and a plurality of brushes at a bottom surface of the support body, wherein the brushes of the plurality of brushes are arranged in a circumferential direction about the vertical axis of the support body. The brushes of the plurality of brushes are each spaced apart from one another in the circumferential direction. Each of the brushes includes a brush body that extends in the circumferential direction from a first side surface to a second side surface opposing the first side surface, and an inclination portion extending inward from an inner lateral extent of the brush body. A thickness of the inclination portion decreases in an inward direction. An inclined surface as a bottom surface of the inclination portion forms an acute angle with the vertical axis.

According to one embodiment, a substrate treatment method of removing an upper end of a protrusion on a substrate is disclosed. An unevenness is formed on a surface of the substrate. The method can supply a first liquid on the surface of the substrate. The unevenness is formed on the surface. The method can form a protective layer. The protective layer covers the surface of the substrate from the first liquid supplied to the surface of the substrate. The method can supply a second liquid onto the protective layer. In addition the method can physically remove the protective layer which is on the upper end of the protrusion, and can bring the second liquid into contact with the upper end of the protrusion. The protective layer is removed from the upper end of the protrusion.

A fluid flow actuated tool including a housing, a tool and an actuating mechanism. The housing includes a housing interior. The housing interior receives a flow of fluid. The actuating mechanism includes a fluid wheel structure. The fluid wheel structure is connected to the tool. At least a portion of the fluid wheel structure is arranged in the flow of fluid for rotating the fluid wheel structure. The tool is actuated based on rotation of the fluid wheel structure.

A fluid flow actuated tool including a housing, a tool and an actuating mechanism. The housing includes a housing interior. The housing interior receives a flow of fluid. The actuating mechanism includes a fluid wheel structure. The fluid wheel structure is connected to the tool. At least a portion of the fluid wheel structure is arranged in the flow of fluid for rotating the fluid wheel structure. The tool is actuated based on rotation of the fluid wheel structure.

A cleaning apparatus includes: first and second dischargers configured to discharge a brush cleaning liquid so that the brush cleaning liquid lands linearly on contact surfaces of first and second brushes, in a state in which the first and second brushes configured to clean a substrate are located at a retracted position spaced apart from the substrate; and a support configured to support the first and second discharger, so that the brush cleaning liquid discharged from the first discharger and the brush cleaning liquid discharged from the second discharger do not interfere with each other until the brush cleaning liquid lands on the contact surfaces of the first and second brushes.