A template for imprint comprises a main body having a bottom surface, a middle surface on a portion protruding relative to the bottom surface, and a pattern surface on a portion protruding relative to the middle surface, the pattern surface having an uneven pattern, wherein an outer edge of the pattern surface has a jigsaw shape, wherein a light-shielding member having a light transmittance lower than a light transmittance of the main body is disposed on the middle surface to surround the outer edge of the pattern surface in a plan view as viewed from the pattern surface, and wherein an outer edge of light-shielding member defines four sides having a shape in which a center of each side bulges outward with respect to a rectangle surrounding the outer edge of the pattern surface in the plan view, and wherein the shape of each side bulges outwardly in a stepwise manner from the ends of each side to the center of each side.

The present invention relates to a molding die comprising a base portion and a pattern portion having recesses and protrusions provided on a surface of the base portion, wherein a distance between the centers of protruding portions of the pattern portion is 15 to 50 nm, a ratio of recessed and protruding portion (protrusion/distance between centers of the protruding portions) of the pattern portion is 0.5 or less, a height of the protruding portion of the pattern portion is 2 nm or more, and a defect density of the pattern portion is 10×10.sup.10 cm.sup.2 or less. The present invention also relates to a lens comprising a base portion and a pattern portion having recesses and protrusions provided on a surface of the base portion, wherein a distance between centers of protruding portions of the pattern portion is 15 to 50 nm.

Provided is a complex patterning device. The complex patterning device includes a patterning module, on which a master substrate including a master pattern that contacts and is separated from a target substrate and which forms a plurality of target patterns having a reverse image of the master pattern on the target substrate by applying a pressure onto the target substrate, and a punching module including a punching mold that contacts and is separated from the target substrate, in which the plurality of target patterns are formed, and which divides at least any one of the plurality of target patterns by applying a pressure onto the target substrate.

A textured release sheet includes a substrate, which has been electron beam treated, including a top side and a bottom side. A matte surface is formed on the bottom side thereof, wherein the matte surface of the surfacing material is a coating of an radiation curable material applied to the bottom side of the substrate. The coating is an UV curable acrylate mixture applied to the substrate, wherein the UV curable acrylate mixture is irradiated with UV-radiation via an excimer laser emitter to produce a UV-irradiated layer wherein the UV curable acrylate mixture is only crosslinked on the surface thereof, which produces a matting surface through the effects of a micro-convolution.

The present invention provides an imprint apparatus including a control unit that feedback-controls a mold deformation unit based on difference data indicating a shape difference between a pattern region of a mold and a shot region on a substrate, target data indicating a relative target deformation amount between the pattern region of the mold and the shot region on the substrate, and time series data indicating a relative deformation amount between the pattern region of the mold and the shot region on the substrate which changes at each time while performing shape control on the shot region.

A template for imprint comprises a main body having a bottom surface, a middle surface on a portion protruding relative to the bottom surface, and a pattern surface on a portion protruding relative to the middle surface, the pattern surface having an uneven pattern, wherein an outer edge of the pattern surface has a jigsaw shape, wherein a light-shielding member having a light transmittance lower than a light transmittance of the main body is disposed on the middle surface to surround the outer edge of the pattern surface in a plan view as viewed from the pattern surface, and wherein the light-shielding member is disposed at least in an entire region within a depressed portion of an outer edge of the jigsaw shape.

An imprint apparatus that performs a supply step of supplying an imprint material onto each of shot regions adjacent to each other on a substrate and, after the supply step, execute an imprint process including a contact step, a curing step, and a mold releasing step for each of the shot regions. The apparatus comprises an irradiator that irradiates the imprint material on the shot region with light in the curing step, and a light-shielding member that defines an irradiation region of the light from the irradiator, wherein the light-shielding member defines the irradiation region such that the imprint material in an end portion of a first shot region on a side of a second shot region adjacent to the first shot region is complementarily cured by light irradiation in the curing step performed on the second shot region.

A method of nanoscale patterning is disclosed. The method comprises: mixing predetermined amounts of a first solvent and a second solvent to generate a solvent, the first solvent and the second solvent being immiscible with each other; dissolving a solute material in the solvent to generate a coating material, the solute material having solubility that is higher in the first solvent than in the second solvent; and applying the coating material onto a substrate to form a plurality of pinholes in the coating material. The formation of the plurality of pinholes is associated with suspension drops mostly comprised of the second solvent, separated from the solute material dissolved in the first solvent, in the coating material. A method of making a stamp with a nanoscale pattern is also disclosed based on the above method.

An imprint apparatus includes first illumination optical system for emit light to cure imprint material between mold and substrate, second illumination optical system having light adjuster for illuminating the imprint material in part of region between the mold and the substrate, combiner located on pupil plane common to the first and second illumination optical systems and configured to combine the light from the first illumination optical system and the light from the second illumination optical system The combiner combines the light from the first illumination optical system and the light from the second illumination optical system by a mirror located in region surrounded by illumination region of the first illumination optical system including annular light intensity distribution on the pupil plane reflecting the light from the second illumination optical system.

Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.