A surfacing material includes a substrate having a top side and a bottom side. A matte surface is formed on the bottom side thereof, wherein the matte surface of the surfacing material is a coating of an electron beam radiation curable material applied to the bottom side of the substrate. The coating is an epoxy acrylic or urethane acrylic laid upon the substrate. The epoxy acrylic or urethane acrylic is irradiated with UV-radiation to produce a UV-radiation layer wherein the epoxy acrylic or urethane acrylic is neither hardened nor is an entire layer of the epoxy acrylic or urethane acrylic crosslinked but rather the epoxy acrylic or urethane acrylic only crosslinked on the surface thereof, which produces a matting surface through the effects of a micro-convolution.

Disclosed is a stamp (14) for an imprint lithography process, the stamp comprising an elastomer stamp body including a polysiloxane bulk portion (110) and a patterned surface comprising a feature pattern (16) for imprinting an imprinting composition (12) wherein the elastomer stamp body comprises a basic organic amine in an amount of at least 0.1% by weight based on the total weight of the elastomer stamp body. Also disclosed are methods of manufacturing such a stamp, and a method of forming a patterned layer on a substrate using such a stamp.

Implanted medical devices need a mechanism of immobilization to surrounding tissues, which minimizes tissue damage while providing reliable long-term anchoring. This disclosure relates to techniques for patterning arbitrarily shaped 3D objects and to patterned balloon devices having micro- or nano-patterning on an outer surface of an inflatable balloon. The external pattern can provide enhanced friction and anchoring in an aqueous environment. Examples of these types of patterns are hexagonal arrays inspired by tree frogs, corrugated patterns, and microneedle patterns. The patterned balloon devices can be disposed between an implant and surrounding tissues to facilitate anchoring of the implant.

Provided is an imprint apparatus which reduces a shift of a mold from a desired position. The imprint apparatus that forms a pattern of an imprint material on a substrate using a mold includes a correction mechanism which corrects a shape and a magnification of the mold, and a control unit which controls the correction mechanism on the basis of a difference in shape and magnification between the mold and the substrate. The control unit changes a shape coefficient multiplied by a correction amount of the shape to balance a resultant force and a moment on the mold applied by the correction mechanism on the basis of a magnification coefficient, which is a coefficient multiplied by a correction amount of the magnification through closed-loop control.

Provided is a complex patterning device. The complex patterning device includes a patterning module, on which a master substrate including a master pattern that contacts and is separated from a target substrate and which forms a plurality of target patterns having a reverse image of the master pattern on the target substrate by applying a pressure onto the target substrate, and a punching module including a punching mold that contacts and is separated from the target substrate, in which the plurality of target patterns are formed, and which divides at least any one of the plurality of target patterns by applying a pressure onto the target substrate.

The present disclosure provides a preparation method of a splicing imprint template including a first splicing area and a second splicing area adjacent to each other, the preparation method including: forming a first splicing imprint pattern in the first splicing area on a base substrate; forming a sacrificial layer on a side surface of the first splicing imprint pattern facing away from the base substrate; forming a second template glue in the second splicing area on the base substrate; patterning the second template glue in the second splicing area by a preset cavity template; curing and demolding the second template glue; and removing the sacrificial layer through a specific film removing process. The present disclosure further provides a splicing imprint template and a cavity template.

A hand-operated tool for embossing a membrane or other soft pliable implant with microgrooves or microgeometries is disclosed. The tool includes an embossing surface such as a pressure plate or roller that includes a specific microgroove or microtopographical pattern. This allows a user such as a clinician to create an embossed surface on a membrane or other implantable device at the time of surgery for the purposes of directing cellular orientation and migration, increasing cell migration velocity and enhancing re-epithelialization rates in various medical and dental applications.

A stamp replication device for producing stamps for the production of at least one of microstructured and nanostructured components has a platform, a cover that is positionable on the platform and a holding device for a stamp carrier, wherein the holding device is provided on the cover or on the platform and includes a carrier as well as a microstructured vacuum surface on the carrier for holding the stamp carrier. In addition, a method for producing a holding device for a stamp replication device as well as a method for producing a stamp are specified.

A forming apparatus operable to, in a state in which a composition on a substrate and a mold have been brought into contact, cure the composition to thereby mold the composition, is provided. The forming apparatus comprises a supplier configured to discretely supply droplets of the composition onto the substrate, a controller configured to control the supplier in accordance with a supply pattern that indicates a drop amount and a drop position of each droplet, wherein the controller determines the supply pattern such that a minimum distance between adjacent droplets supplied onto the substrate by the supplier is smaller at a corner than at a center of an outermost side of a region to which the composition is supplied.

An imprint mold includes a mesa portion projecting from a base material. The mesa portion includes a contact surface configured for contact with a curable composition made of an organic material, and a surface of a side wall at which the contact surface projects from the base material. A liquid repellent surface is formed on at least the surface of the side wall, the liquid repellent surface having a contact angle with respect to the curable composition being higher than a contact angle of the contact surface. The liquid repellent surface includes at least one type of compound selected from the group consisting of an oxide of an inorganic element, a fluoride of an inorganic element, and a nitride of an inorganic element.