The present invention relates to a fluorine-containing gas removing agent comprising an alumina and an alkali earth metal compound, wherein an ammonia desorption curve obtained by an ammonia TPD-MS method having a mass-to-charge ratio of 15 has a peak in a range lower than 200 C. and has a shoulder in a range of 200 C. or higher.

The present invention relates to a fluorine-containing gas removing agent comprising an alumina and an alkali earth metal compound, wherein an ammonia desorption curve obtained by an ammonia TPD-MS method having a mass-to-charge ratio of 15 has a peak in a range lower than 200 C. and has a shoulder in a range of 200 C. or higher.

A system and process for the recovery of at least one halogenated hydrocarbon from a gas stream. The recovery includes adsorption by exposing the gas stream to an adsorbent with a lattice structure having pore diameters with an average pore opening of between about 5 and about 50 angstroms. The adsorbent is then regenerated by exposing the adsorbent to a purge gas under conditions which efficiently desorb the at least one adsorbed halogenated hydrocarbon from the adsorbent. The at least one halogenated hydrocarbon (and impurities or reaction products) can be condensed from the purge gas and subjected to fractional distillation to provide a recovered halogenated hydrocarbon.

A system and process for the recovery of at least one halogenated hydrocarbon from a gas stream. The recovery includes adsorption by exposing the gas stream to an adsorbent with a lattice structure having pore diameters with an average pore opening of between about 5 and about 50 angstroms. The adsorbent is then regenerated by exposing the adsorbent to a purge gas under conditions which efficiently desorb the at least one adsorbed halogenated hydrocarbon from the adsorbent. The at least one halogenated hydrocarbon (and impurities or reaction products) can be condensed from the purge gas and subjected to fractional distillation to provide a recovered halogenated hydrocarbon.

Disclosed is a process for treating a gas stream containing hydrochloric acid, hydrofluoric acid, a fluorinated compound and halogenated organic compounds, wherein the gas stream is subjected to: (a) a step of washing with an acid solution to obtain a washed gas stream; (b) a step of adiabatic absorption in an aqueous solution of the hydrochloric acid contained in said washed gas stream, to collect a solution of hydrochloric acid; (c) a step of adsorption on activated carbon of the impurities present in said hydrochloric acid solution, to obtain a purified hydrochloric acid solution and a gas stream containing said fluorinated compound; and (d) a step of bringing said purified hydrochloric acid solution into contact with a silica gel. Also disclosed is a plant for the implementation of this process, and also a process for preparing a fluorinated compound comprising the catalytic pyrolysis of an organofluorine compound.

Disclosed is a process for treating a gas stream containing hydrochloric acid, hydrofluoric acid, a fluorinated compound and halogenated organic compounds, wherein the gas stream is subjected to: (a) a step of washing with an acid solution to obtain a washed gas stream; (b) a step of adiabatic absorption in an aqueous solution of the hydrochloric acid contained in said washed gas stream, to collect a solution of hydrochloric acid; (c) a step of adsorption on activated carbon of the impurities present in said hydrochloric acid solution, to obtain a purified hydrochloric acid solution and a gas stream containing said fluorinated compound; and (d) a step of bringing said purified hydrochloric acid solution into contact with a silica gel. Also disclosed is a plant for the implementation of this process, and also a process for preparing a fluorinated compound comprising the catalytic pyrolysis of an organofluorine compound.

Processes for reducing the amount of a gaseous iodide-containing impurity present in a recycle gas stream used in the production of ethylene oxide, in particular a vinyl iodide impurity, are provided. Processes for producing ethylene oxide, ethylene carbonate and/or ethylene glycol, and associated reaction systems are similarly provided.

Processes for reducing the amount of a gaseous iodide-containing impurity present in a recycle gas stream used in the production of ethylene oxide, in particular a vinyl iodide impurity, are provided. Processes for producing ethylene oxide, ethylene carbonate and/or ethylene glycol, and associated reaction systems are similarly provided.

Processes for reducing the amount of a gaseous iodide-containing impurity present in a recycle gas stream used in the production of ethylene oxide, in particular alkyl iodide and vinyl iodide impurities, are provided. Processes for producing ethylene oxide, ethylene carbonate and/or ethylene glycol, and associated reaction systems are similarly provided.

Processes for reducing the amount of a gaseous iodide-containing impurity present in a recycle gas stream used in the production of ethylene oxide, in particular alkyl iodide and vinyl iodide impurities, are provided. Processes for producing ethylene oxide, ethylene carbonate and/or ethylene glycol, and associated reaction systems are similarly provided.