Novel radioactive iodide molecular traps, in which one or more metal atoms are functionalized by coordinating to an amine containing two or more nitrogens, and methods of using the molecular traps to capture radioactive iodide.

Novel radioactive iodide molecular traps, in which one or more metal atoms are functionalized by coordinating to an amine containing two or more nitrogens, and methods of using the molecular traps to capture radioactive iodide.

A treatment device for semiconductor manufacturing exhaust gas of the present invention includes an inlet scrubber, a gas treatment furnace, and an outlet scrubber. The gas treatment furnace includes an outer cylinder having a main body that includes a gas treatment space formed therein and a gas introduction port drilled in a bottom thereof, an inner cylinder that extends across the gas treatment space such that one end thereof is mounted to the bottom inside the main body so as to enclose the gas introduction port and another end thereof is opened and located at a position close to a ceiling surface of the main body, and an electric heater that is hung from a ceiling of the main body and that has a heating element having a long bar shape placed in an internal space of the inner cylinder.

A treatment device for semiconductor manufacturing exhaust gas of the present invention includes an inlet scrubber, a gas treatment furnace, and an outlet scrubber. The gas treatment furnace includes an outer cylinder having a main body that includes a gas treatment space formed therein and a gas introduction port drilled in a bottom thereof, an inner cylinder that extends across the gas treatment space such that one end thereof is mounted to the bottom inside the main body so as to enclose the gas introduction port and another end thereof is opened and located at a position close to a ceiling surface of the main body, and an electric heater that is hung from a ceiling of the main body and that has a heating element having a long bar shape placed in an internal space of the inner cylinder.

A cylindrical heating unit of an exhaust gas processing device is installed in a reactor. The cylindrical heating unit is provided with an exhaust gas introduction port provided in an insertion base part and a heated exhaust gas outlet provided at insertion end. The cylindrical heating unit includes a hollow cylinder, insulators, electric heaters, and holding members. The hollow cylinder has a double structure with an inner cylinder and an outer cylinder made of metal. A plurality of the insulators surround the inner cylinder and are provided at intervals from each other in a heater installation space between the inner cylinder and the outer cylinder. Electric heaters are mounted to the insulators. The holding members are attached to one of the inner cylinder and the outer cylinder or both and hold the insulators in the heater installation space.

To provide a means removing chlorine gas, which can remove chlorine gas contained in, for example, exhaust gas with high efficiency and does not require frequent exchange. A chlorine gas decomposition catalyst including a metal oxide (X), wherein the metal oxide (X) includes an oxide (X1) of at least one element selected from the group consisting of Ce and Co.

A filtered containment venting system includes a filtered containment venting tank having: an organic iodine remover for collecting organic iodine; scrubbing water for collecting inorganic iodine; and an alkalizing agent for adding an action of buffering a pH value to the scrubbing water.

A filtered containment venting system includes a filtered containment venting tank having: an organic iodine remover for collecting organic iodine; scrubbing water for collecting inorganic iodine; and an alkalizing agent for adding an action of buffering a pH value to the scrubbing water.

A reheating collection device for a gas phase process is provided with a container elongated in an axial direction along an axis to define a chamber, an inflow path and an exhaust path respectively in communication with the chamber and apart in the axial direction from each other, and a heater heating the chamber between the inflow path and the exhaust path.

A reheating collection device for a gas phase process is provided with a container elongated in an axial direction along an axis to define a chamber, an inflow path and an exhaust path respectively in communication with the chamber and apart in the axial direction from each other, and a heater heating the chamber between the inflow path and the exhaust path.