Provided is a microorganism including a gene encoding a protein having a dehalogenase activity, a composition for using in reducing a concentration of fluorinated methane in a sample, the composition including the microorganism including the gene encoding the protein having the dehalogenase activity, and a method of reducing the concentration of fluorinated methane in the sample.

Provided is a microorganism including a gene encoding a protein having a dehalogenase activity, a composition for using in reducing a concentration of fluorinated methane in a sample, the composition including the microorganism including the gene encoding the protein having the dehalogenase activity, and a method of reducing the concentration of fluorinated methane in the sample.

A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.

A vacuum pump with abatement function is used for evacuating a chamber of a manufacturing apparatus. The vacuum pump with abatement function includes a vacuum pump having a discharge port to which at least one abatement part for treating an exhaust gas discharged from the vacuum pump to make the exhaust gas harmless is attached. The abatement part is selected from a plurality of abatement parts having different treatment types of exhaust gas and/or different treatment amounts of exhaust gas and/or different treatment performances of exhaust gas.

A method of drying a fluid comprising a fluoropropene, which method comprises the step of contacting the fluid with a desiccant comprising molecular sieve having openings which have a size across their largest dimension of from about 3 ? to about 5 ?. A heat transfer device comprising a heat transfer fluid comprising a fluoropropene, and a desiccant comprising a molecular sieve having openings which have a size across their largest dimension of from about 3 ? to about 5 ?. Preferably, the fluoropropene is R134yf or R-1225ye.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

A plasma abatement process for abating effluent containing compounds from a processing chamber is described. A plasma abatement process takes gaseous foreline effluent from a processing chamber, such as a deposition chamber, and reacts the effluent within a plasma chamber placed in the foreline path. The plasma dissociates the compounds within the effluent, converting the effluent into more benign compounds. Abating reagents may assist in the abating of the compounds. The abatement process may be a volatizing or a condensing abatement process. Representative volatilizing abating reagents include, for example, CH.sub.4, H.sub.2O, H.sub.2, NF.sub.3, SF.sub.6, F.sub.2, HCl, HF, Cl.sub.2, and HBr. Representative condensing abating reagents include, for example, H.sub.2, H.sub.2O, O.sub.2, N.sub.2, O.sub.3, CO, CO.sub.2, NH.sub.3, N.sub.2O, CH.sub.4, and combinations thereof.

An inlet nozzle assembly, an abatement apparatus and a method are disclosed. The inlet nozzle assembly is for an abatement apparatus for treating an effluent stream from a semiconductor processing tool, the inlet nozzle assembly comprises: an inlet nozzle configured to deliver the effluent stream into an abatement chamber; a head defining an aperture for receiving the inlet nozzle; and an insulating mount configured to retain the inlet nozzle within the aperture. In this way, the thermal path between the inlet nozzle and the head is interrupted by the insulating mount which helps to prevent the inlet nozzle being cooled by the head, which helps to prevent condensates gathering as powder or particulates on the inlet nozzle.

An inlet nozzle assembly, an abatement apparatus and a method are disclosed. The inlet nozzle assembly is for an abatement apparatus for treating an effluent stream from a semiconductor processing tool, the inlet nozzle assembly comprises: an inlet nozzle configured to deliver the effluent stream into an abatement chamber; a head defining an aperture for receiving the inlet nozzle; and an insulating mount configured to retain the inlet nozzle within the aperture. In this way, the thermal path between the inlet nozzle and the head is interrupted by the insulating mount which helps to prevent the inlet nozzle being cooled by the head, which helps to prevent condensates gathering as powder or particulates on the inlet nozzle.

An abatement apparatus includes a combustion chamber formed by a foraminous sleeve defining an upstream portion of the combustion chamber for treating an effluent stream, the upstream portion of the combustion chamber having an inlet for receiving the effluent stream and a wetted sleeve fluidly coupled with foraminous sleeve, the wetted sleeve defining a downstream portion of the combustion chamber, wherein the foraminous sleeve is configured to provide a foraminous axial surface facing downstream towards the downstream portion of the combustion chamber. In this way, the foraminous surface not only faces inwards towards the upstream portion of the combustion chamber, but also faces downstream, towards the downstream portion of the combustion chamber.