A functional water producing apparatus in an embodiment includes: a water pressure regulator configured to regulate the water pressure of the ultrapure water, the water pressure regulator having a pressure regulating valve configured to regulate a water pressure of the ultrapure water to an almost constant pressure and a feed water pump configured to pressurize the ultrapure water; a dissolving device configured to dissolve functional gas imparting a specific function in the ultrapure water regulated the water pressure by the water pressure regulator; and a control device configured to control the feed water pump to regulate the water pressure of the functional water to a predetermined constant pressure based on a water pressure or a flow rate of the functional water flowing out of the dissolving device.

The present invention concerns a nozzle for injecting pressurized water containing a dissolved gas, said nozzle comprising: a cylindrical intake chamber (20) for said water; a cylindrical expansion chamber (30) comprising a part (301) communicating with said intake chamber (20) by an orifice (401) and an outlet; a diffusion chamber (60) of truncated conical section communicating with the outlet of said expansion chamber (30) and widening out from said expansion chamber;
said nozzle comprising means for putting the stream of water that flows out of said expansion chamber (30) into rotation.

A gas dissolution accelerating device with a simple structure efficiently increases the concentrations of oxygen dissolved in deep water, such as at lake bottoms. A gas dissolution accelerating device includes a cylindrical member located parallel to a vertical direction when installed, a box member having an opening facing downward when installed, and a fixing unit for fixing the box member to a diffuser. The box member includes a top plate having a cone-shaped protrusion protruding inward and a through-hole receiving the cylindrical member. The fixing unit includes a flat attachment plate having an upper surface onto which the box member is mounted, a pair of halved banding members for clamping a feeding pipe of the diffuser, and rod-shaped connecting members connecting the attachment plate to the banding members.

A mixer is provided for mixing exhaust gas (A) flowing in an exhaust gas-carrying duct (14) of an internal combustion engine with reactant injected into the exhaust gas-carrying duct (14). The mixer includes a mixing body (22) with a reactant-receiving duct (34), an exhaust gas inlet opening device (54) with a plurality of exhaust gas inlet openings (56) leading to the reactant-receiving duct (34), and at least one releasing duct (40, 42) leading away from the reactant-receiving duct (34) with a releasing duct opening (48, 50) for releasing a reactant/exhaust gas mixture from the mixer body (22). An electrically energizable heater (68) is provided at the mixer body (22).

A method and apparatus for diffusing or reducing gas into a liquid is described. This invention covers several different methods for infusing or reducing gas into a liquid with a feedback loop that monitors specific parameters of the process and can vary controls to achieve a targeted value or keep within a range of values. The parameter of interest is the ORP (Oxidative Reduction Potential) and one way to determine that value is using an ORP sensor to directly measure it at various points in the process such as on the untreated incoming process fluid, right after infusing the reducing gas, or later in the process such as where the fluid is discharged back into the original tank in the case of a recirculating system or when it is discharged to the next phase of the treatment train.

A cleaning apparatus (10) for a semiconductor substrate that cleans a semiconductor substrate by using ozone water, including cooling means (3) for cooling ozone water (W2) of 20 C. or more to a predetermined temperature, and cleaning means (4) for cleaning a substrate by using ozone water (W3) cooled by the cooling means (3). The cleaning means (4) has a cleaning tank (41) for cleaning the substrate by immersing the substrate in the ozone water (W3) cooled by the cooling means (3). According to a cleaning method using the semiconductor substrate cleaning apparatus (10), by immersing a semiconductor substrate in ozone water, organic substances, such as resist, and metal foreign materials remaining on the substrate surface are cleaned and removed, and the loss of substrate material in a cleaning step can be reduced.

A micro bubble generation method and generation device. The micro bubble generation method includes: passing a gas through a microporous material, the gas forming micro bubbles at an interface between the microporous material and liquid, the bubbles being adsorbed on the surface of the microporous material; impacting the micro bubbles adsorbed on the microporous material by relative motion of the microporous material and the liquid, such that the micro bubbles detach from the microporous material and enter into the liquid. The micro bubble generation device includes a gas accommodating chamber (1) disposed below the liquid surface, and a gas transmission pipeline (3). A microporous material layer (2) is arranged around the periphery of the gas accommodating chamber (1). The gas in the gas accommodating chamber (1) passes through the microporous material layer (2) by gas pressure to form micro bubbles on the outer surface thereof. The microporous material layer (2) moves and/or the liquid outside the microporous material layer (2) moves to cut the micro bubbles.

A system for mixing and mixing processes and structures are disclosed. In addition a nozzle used for mixing is disclosed.

A device for bubbling a gas into a liquid is disclosed. The device comprises a first bubbling apparatus nested inside a second bubbling apparatus. The first bubbling apparatus comprises a gas inlet for receiving the gas and a plurality of first openings for releasing the gas. The second bubbling apparatus at least partially encloses the plurality of first openings of the first bubbling apparatus. The second bubbling apparatus receives the gas from the plurality of first openings. The second bubbling apparatus comprises a plurality of second openings for bubbling the gas into the liquid.

A gas sparger produces an intermittent flow of bubbles even if provided with a continuous gas flow. The sparger has a housing to collect a pocket of gas and a conduit to release some of the gas from the pocket when the pocket reaches a sufficient size. The housing is integrated with the potting head of a module. The conduit passes through the potting head.