Methods of hybrid bonding with inspection are provided herein. In some embodiments, a method of hybrid bonding with inspection includes: cleaning a substrate via a first cleaning chamber and a tape frame having a plurality of chiplets via a second cleaning chamber; inspecting, via a first metrology system, the substrate for pre-bond defects in a first metrology chamber and the tape frame for pre-bond defects in a second metrology chamber; bonding one or more of the plurality of chiplets to the substrate via a hybrid bonding process in a bonder chamber to form a bonded substrate; and performing, via a second metrology system different than the first metrology system, a post-bond inspection of the bonded substrate via a third metrology chamber for post-bond defects.

A system for wafer pairing for wafer-to-wafer bonding may include a wafer shape metrology sub-system and controller. The controller may receive the shape measurements for a set of top wafers and bottom wafers and then sort the set of top wafers and the bottom wafers into wafer groups based on the shape measurements. The controller may tag each top and bottom wafer with a wafer group number and determine wafer pairs from selected wafer groups. The controller may calculate the bow difference for each wafer pair of the set of wafer pairs and sort the set of wafer pairs into wafer pair groups based on intervals of bow difference. The controller may associate each wafer pair group with a corresponding reference recipe and direct a bonder to bond the wafer pairs in a selected wafer pair group according to a corresponding reference recipe associated with the selected wafer pair group.

Systems including voltage regulator circuits are disclosed. In one embodiment, an apparatus includes a voltage regulator controller integrated circuit (IC) die including one or more portions of a voltage regulator circuit. The apparatus further includes a capacitor die, an inductor die, and an interconnect layer arranged over the voltage regulator controller IC die, the capacitor die and the inductor die. The interconnect provides electrical connections between the voltage regulator controller IC die, the capacitor die and the inductor die to form the voltage regulator circuit. In a further embodiment, the voltage regulator controller IC die, the capacitor die and the inductor die are arranged in a planar fashion within a voltage regulator module. In still another embodiment, a system IC is coupled to the voltage regulator module and includes one or more functional circuit blocks coupled to receive a regulated supply voltage generated by the voltage regulator circuit.

Embodiments disclosed herein include a processing tool for measuring neutral radical concentrations. In an embodiment, the processing tool comprises a processing chamber, and a neutral radical mass spectrometry (NRMS) analyzer fluidically coupled to the processing chamber. In an embodiment, the NRMS analyzer comprises a first chamber fluidically coupled to the processing chamber, where the first chamber comprises a modulator, and a second chamber fluidically coupled to the first chamber, where the second chamber is a residual gas analyzer or a mass spectrometer. In an embodiment, an unobstructed line of sight passes from the processing chamber to the second chamber.

A surface scanning tool and methods of using a surface scanning tool to determine a surface shape of a tool. In embodiments, the surface scanning tool includes a laser, a detector, and a signal analysis module. The laser sends a beam of light that is reflected off a bottom surface of the tool. The detector receives the reflected beam of light and sends the reflected beam of light signals to a signal analysis module. The signal analysis module determines a surface shape of the bottom surface and triggers mitigation actions. In alternative embodiments, the surface scanning tool includes a camera and a signal analysis module. The camera takes a picture of the bottom surface of the tool and sends the image to the signal analysis module. The signal analysis module determines the surface shape of the bottom surface and triggers mitigation actions.

Aspects of the present disclosure provide an inspection system, which can include an image module and processing circuitry. The imaging module can image a wafer with a first light beam and a second light beam. The first light beam can be coaxially aligned with the second light beam, and image a first pattern located on a front side of a wafer to form a first image. The second light beam can image a second pattern located below the first pattern to form a second image via quantum tunneling imaging or infrared transmission imaging. The second light beam can have power sufficient to pass through at least a portion of a thickness of the wafer and reach the second pattern. The processing circuitry can perform image analysis on the first image and the second image to calculate an overlay value of the first and second patterns and/or defects of the wafer.

Methods and systems for measurements of semiconductor structures based on a trained parameter conditioned measurement model are described herein. The shape of a measured structure is characterized by a geometric model parameterized by one or more conditioning parameters and one or more non-conditioning parameters. A trained parameter conditioned measurement model predicts a set of values of each non-conditioning parameter based on measurement data and a corresponding set of predetermined values for each conditioning parameter. In this manner, the trained parameter conditioned measurement model predicts the shape of a measured structure. Although a parameter conditioned measurement model is trained at discrete geometric points of a structure, the trained model predicts values of non-conditioning parameters for any corresponding conditioning parameter value. In some examples, training data is augmented by interpolation of conditioning parameters and corresponding non-conditioning parameters that lie between discrete DOE points. This improves prediction accuracy of the trained model.

An optical inspection system for pre-bonding inspection includes a stage having a surface on which a sample to be inspected is placed, the surface of the sample having a two dimensional (2D) periodic pattern and defects, an optical fiber, a transmissive spatial light modulator (SLM), a measurement lens configured to transmit a beam of light transmitted through the transmissive SLM, a camera configured to detect the transmitted beam of light from the measurement lens, and a measuring beam path through which a beam of light from the optical fiber is incident on and reflected at the surface of the sample on the stage, and transmitted to the transmissive SLM, wherein the transmissive SLM is configured to block the beam of light reflected by the 2D periodic pattern on the surface of the sample.

Provided are a deposition method, a deposition apparatus, and an electronic device manufactured by using the deposition apparatus. The deposition method includes forming a plurality of sensors on a substrate or a deposition mask which measure gaps between the substrate and the deposition mask, positioning the substrate on the deposition mask, measuring the gaps between the substrate and the deposition mask using the plurality of sensors, adjusting a parallelism between the substrate and the deposition mask based on the measuring of the gaps between the substrate and the deposition mask, and providing a deposition material onto the substrate through the deposition mask, wherein providing the deposition material forms a deposition material layer on the substrate.

An apparatus for manufacturing a display device includes a jig including a bottom portion on which a circuit portion of a circuit board is seated, a plurality of electromagnets disposed on the bottom portion to be spaced apart from each other, where plurality of electromagnets is male and female coupled to a plurality of protrusions of the circuit board protruding from the circuit portion, and a power supply which supplies current to the plurality of electromagnets.