A semiconductor package includes: a package substrate, a first stack structure disposed on the package substrate, the first stack structure including first semiconductor chips stacked and connected to each other by bonding wires, a second stack structure disposed on the first stack structure, and including second semiconductor chips stacked, the second stack structure having an overhang region protruding beyond an uppermost first semiconductor chip of the first stack structure among the first semiconductor chips, an adhesive member covering a lower surface of the second stack structure and adhered to a portion of upper surfaces of the first stack structure, and an encapsulant disposed on the package substrate and covering the first stack structure and the second stack structure, wherein at least a portion of the bonding wires are buried in the die adhesive film in the overhang region to support the second stack structure.

A semiconductor memory device includes a first memory die, a second memory die disposed above the first memory die via adhesives, a first wiring connected to the first memory die, and configured to apply a power supply voltage to the first memory die, a first switch element connected to the first wiring, a second wiring connected to the second memory die, and configured to apply the power supply voltage to the second memory die, a second switch element connected to the second wiring, and a third wiring configured to electrically connect to the first wiring via the first switch element, and configured to electrically connect to the second wiring via the second switch element. The first switch element and the second switch element are independently controllable.

A bonding region is specified by having a horizontal line partially constituting crosshairs displayed on a monitor of a wire bonding apparatus superimposed on a first line segment of a first marker, and having a vertical line partially constituting the crosshairs superimposed on a first line segment of a second marker.

A semiconductor device assembly is provided. The assembly includes an outer semiconductor device which has an active surface and a back surface. The back surface includes a cut that extends to a depth between the active surface and the back surface, and uncut regions on opposing sides of the cut. The assembly further includes an inner semiconductor device disposed within the cut of the outer semiconductor device.

A memory module, includes a module substrate and at least one semiconductor package on the module substrate that includes a package substrate having a lower surface and an upper surface. First and second groups of lower pads are on the lower surface, and upper pads are on the upper surface and are electrically connected to the lower pads of the first group. A chip structure is on the upper surface of the package substrate and is electrically connected to the upper pads. First connection bumps connect the lower pads of the first group to the module substrate, and second connection bumps connect the lower pads of the second group to the module substrate. The first connection bumps have a first maximum width at a first distance from the package substrate, and the second connection bumps have a second maximum width at a second, shorter distance from the package substrate.

A semiconductor package, includes: a first semiconductor chip including first connection pads on the first front surface, and through electrodes extending perpendicularly to the first rear surface and electrically connected to at least a portion of the first connection pads; a second semiconductor chip including second connection pads on the second front surface, and on the first rear surface so that the second rear surface faces the first semiconductor chip; a dielectric layer on the second semiconductor chip; first conductive structures in the dielectric layer, and connecting the through electrodes of a first group and the second connection pads; second conductive structures in the dielectric layer, and having first and second ends, the first ends connected to the through electrodes of a second group and at least a portion of the second ends thereof being exposed from the dielectric layer; at least one third semiconductor chip including third connection pads on the third front surface, and on the dielectric layer so that the third rear surface faces the second semiconductor chip; conductive wires connecting the second conductive structures and the third connection pads.

A 3D semiconductor device including: a first level including a first single crystal layer and first transistors, which each include a single crystal channel; a first metal layer with an overlaying second metal layer; a second level including second transistors, overlaying the first level; a third level including third transistors, overlaying the second level; a fourth level including fourth transistors, overlaying the third level, where the second level includes first memory cells, where each of the first memory cells includes at least one of the second transistors, where the fourth level includes second memory cells, where each of the second memory cells includes at least one of the fourth transistors, where the first level includes memory control circuits, where second memory cells include at least four memory arrays, each of the four memory arrays are independently controlled, and at least one of the second transistors includes a metal gate.

Non-volatile memory devices, methods for fabricating the same, and/or electronic systems including the same may be provided. A non-volatile memory device may include a substrate, a gate electrode layer, an electrode pad, a channel structure, a vertical through contact, and a separation insulation pattern.

A semiconductor device includes a memory cell structure in a cell array region, an electrode stacking structure including a plurality of electrodes and a plurality of interlayer insulation layers alternately stacked in a connection region, and a plurality of electrode contact portions penetrating at least a partial portion of the electrode stacking structure and are electrically connected to the plurality of electrodes. The plurality of electrode contact portions include first and second contact portions. The first contact portion includes a first conductive portion, and a first side insulation layer between the electrode stacking structure and the first conductive portion. The second contact portion includes a second conductive portion, and a second side insulation layer between the electrode stacking structure and the second conductive portion. The second side insulation layer has a shape or a structure different from a shape or a structure of the first side insulation layer.

In some embodiments, a semiconductor package includes a package substrate that includes a first surface, a second surface that is opposite to the first surface, first substrate pads disposed on the first surface in a first row, and second substrate pads disposed on the first surface in a second row. The semiconductor package further includes a first semiconductor chip that includes first chip pads, lower bonding wires configured to respectively couple the first chip pads and the first substrate pads, a second semiconductor chip that includes second chip pads, upper bonding wires configured to respectively couple the second chip pads and the second substrate pads, and an encapsulant disposed on the package substrate and covering the first semiconductor chip and the second semiconductor chip. The lower bonding wires are ball-bonded to the first chip pads and stich-bonded to the first substrate pads.