Disclosed are embodiments of a semiconductor package. The semiconductor package may include: a first substrate; a chip stack on the first substrate, wherein the chip stack comprises one or more semiconductor chips that are stacked to be inclined at a first angle relative to a top surface of the first substrate; a tilt support structure, wherein the tilt support structure is between a first portion of the chip stack and the first substrate; and an anti-slip structure in contact with an end portion of the chip stack.

A semiconductor package may include a package substrate; first semiconductor chips sequentially stacked on an upper surface of the package substrate; a second semiconductor chip on an uppermost first semiconductor chip among the first semiconductor chips, the second semiconductor chip having an overhang region protruding from one side of the uppermost first semiconductor chip and an overlapping region overlapping the uppermost first semiconductor chip, the second chip pads including first bonding pads in the overhang region and second bonding pads in the overlapping region; first conductive bumps respectively on the first bonding pads; second conductive bumps respectively on the second bonding pads; vertical wires extending from the first conductive bumps to substrate pads of the package substrate, respectively; and a molding member covering the first semiconductor chips, the second semiconductor chip, and the vertical wires.

Provided is a semiconductor device including a peripheral circuit structure comprising peripheral circuits and a cell array structure overlapping the peripheral circuit structure and comprising first and second cell array regions and a connection region therebetween in a first direction, the cell array structure including a buried insulating pattern in the connection region, the buried insulating pattern having first and second side surfaces facing each other in the first direction and a third side surface connecting the first and second side surfaces, a stack including vertically stacked conductive patterns, each of the conductive patterns including a horizontal portion parallel to the first direction and a pad portion inclined with respect to the horizontal portion, and cell contact plugs connected to the pad portions of the conductive patterns, respectively, and the pad portion of each conductive pattern being on the first, second, and third side surfaces of the buried insulating pattern.

A semiconductor package includes a package substrate having substrate pads disposed in a first direction on one surface, a semiconductor chip having chip pads disposed in the first direction, and bonding wires connecting the chip pads and the substrate pads. The bonding wires include first and second bonding wires alternately connected to the substrate pads respectively, in the first direction, the first bonding wires are connected to the substrate pads at a first angle less than a right angle with respect to a direction of the semiconductor chip, the second bonding wires are connected to the substrate pads at a second angle less than the first angle with respect to the direction of the semiconductor chip and a position at which the first bonding wires contact the substrate pads is closer to the semiconductor chip than a position at which the second bonding wires contact the substrate pads is to the semiconductor chip.

A semiconductor package includes a package substrate, a processor chip mounted on a first region of the package substrate, a plurality of memory chips mounted on a second region of the package substrate being spaced apart from the first region of the package substrate, a signal transmission device mounted on a third region of the package substrate between the first and second regions of the package substrate, and a plurality of first bonding wires connecting the plurality of memory chips to the signal transmission device. The signal transmission device includes upper pads connected to the plurality of first bonding wires, penetrating electrodes arranged in a main body portion of the signal transmission device and connected to the upper pads, and lower pads in a lower surface portion of the signal transmission device and connected to the penetrating electrodes and connected to the package substrate via bonding balls.

The semiconductor package structure may include a support substrate, a chip stack body on a central region of the support substrate and including a plurality of chips; a first interface on a first edge region of the support substrate and a first redistribution layer on the first interface; a second interface on a second edge region and a second redistribution layer on the second interface; a bonding wire electrically connecting the plurality of chips to the first redistribution layer and the second redistribution layer, respectively; a dummy chip on the chip stack body; and an encapsulation layer, packaging the chip stack body, the dummy chip, the first interface, the second interface and the bonding wire, wherein an upper surface of the dummy chip is coplanar with an upper surface of the encapsulation layer, and external connection terminals on the first redistribution layer and the second redistribution layer.

A semiconductor device includes a memory cell structure in a cell array region, an electrode stacking structure including a plurality of electrodes and a plurality of interlayer insulation layers alternately stacked in a connection region, and a plurality of electrode contact portions penetrating at least a partial portion of the electrode stacking structure and are electrically connected to the plurality of electrodes. The plurality of electrode contact portions include first and second contact portions. The first contact portion includes a first conductive portion, and a first side insulation layer between the electrode stacking structure and the first conductive portion. The second contact portion includes a second conductive portion, and a second side insulation layer between the electrode stacking structure and the second conductive portion. The second side insulation layer has a shape or a structure different from a shape or a structure of the first side insulation layer.

A semiconductor package includes a package substrate including an upper pad on an upper surface of the package substrate, a first chip structure including a plurality of first chips offset-stacked in a first direction, a controller chip on the package substrate and apart from the first chip structure in a horizontal direction, a chip connection bump between the package substrate and the controller chip, and an underfill material layer covering the chip connection bump, wherein a side surface of the underfill material layer is perpendicular to the package substrate.

A method of fabricating a semiconductor device may include forming a lower mold structure on a substrate, forming a first mold structure on the lower mold structure, the first mold structure including first interlayer insulating layers and first sacrificial layers, which are alternately stacked in a vertical direction, forming first vertical channel holes to penetrate the first mold structure, the lower mold structure, and a portion of the substrate, and forming an active layer to cover a top surface of the first mold structure and extend to an upper side surface of each of the first vertical channel holes. The active layer may include a horizontal portion covering the top surface of the first mold structure and a vertical portion covering the upper side surface of each of the first vertical channel holes, and the active layer may include a metallic material.

Bonded die structures and methods of fabricating bonded die structures with improved stress distribution. A bonded die structure may include a second die bonded to a first die. The sizes, shapes and/or relative position of the first die with respect to the second die may be configured to minimize stress concentrations in the bonded die structure. In some embodiments, a length dimension of a corner region of the second die may be less than a length dimension of the adjacent corner region of the first die, which may aid in redistributing stress away from the corner of the first die. An offset distance between the corner of the second die and the corner of the first die may also be controlled to minimize stress applied to the corner of the first die along a vertical direction. Accordingly, crack formation may be reduced, and device performance and yields may be improved.