SEMICONDUCTOR PACKAGE

Abstract

A semiconductor package includes a package substrate having substrate pads disposed in a first direction on one surface, a semiconductor chip having chip pads disposed in the first direction, and bonding wires connecting the chip pads and the substrate pads. The bonding wires include first and second bonding wires alternately connected to the substrate pads respectively, in the first direction, the first bonding wires are connected to the substrate pads at a first angle less than a right angle with respect to a direction of the semiconductor chip, the second bonding wires are connected to the substrate pads at a second angle less than the first angle with respect to the direction of the semiconductor chip and a position at which the first bonding wires contact the substrate pads is closer to the semiconductor chip than a position at which the second bonding wires contact the substrate pads is to the semiconductor chip.

Claims

1. (canceled)

2. A method of manufacturing a semiconductor package, the method comprising: preparing a package substrate comprising a first substrate pad, a second substrate pad spaced apart from the first substrate pad in a first horizontal direction, and a third substrate pad spaced apart from the second substrate pad in a second horizontal direction intersecting the first horizontal direction; mounting a first semiconductor chip comprising a first chip pad on an upper surface of the package substrate; mounting a second semiconductor chip comprising a second chip pad and a third chip pad spaced apart from the second chip pad in the second horizontal direction on the first semiconductor chip; bonding a first bonding wire to the first substrate pad and the first chip pad using a capillary; bonding a second bonding wire to the second substrate pad and the second chip pad using the capillary; and bonding a third bonding wire to the third substrate pad and the third chip pad using the capillary, wherein the second bonding wire is bent by the capillary to form a first angle with respect to the upper surface of the package substrate, and wherein the third bonding wire is bent by the capillary to form a second angle with respect to the upper surface of the package substrate, and the second angle is smaller than the first angle.

3. The method of claim 2, wherein one end of the second bonding wire and one end of the third bonding wire are spaced apart from each other in the second horizontal direction.

4. The method of claim 2, wherein a distance between the second substrate pad and the first semiconductor chip is greater than a distance between the first substrate pad and the first semiconductor chip.

5. The method of claim 2, further comprising forming a stud bump on the second chip pad before bonding the second bonding wire to the second chip pad.

6. The method of claim 2, wherein the first semiconductor chip comprises at least two first semiconductor chips stacked in a step form, wherein the second semiconductor chip comprises at least two second semiconductor chips stacked in a step form, and wherein the at least two second semiconductor chips have an overhang region protruding outwardly of an uppermost first semiconductor chip of the at least two first semiconductor chips in a direction normal to the upper surface of the package substrate.

7. The method of claim 2, wherein the bonding the first bonding wire to the first substrate pad and the first chip pad comprises: ball-bonding the first bonding wire to the first chip pad; and stitch-bonding the first bonding wire to the first substrate pad.

8. The method of claim 2, wherein the bonding the second bonding wire to the second substrate pad and the second chip pad comprises: ball-bonding the second bonding wire to the second chip pad; and stitch-bonding the second bonding wire to the second substrate pad, and wherein the bonding the third bonding wire to the third substrate pad and the third chip pad comprises: ball-bonding the third bonding wire to the third chip pad; and stitch-bonding the third bonding wire to the third substrate pad.

9. The method of claim 2, wherein the bonding the second bonding wire to the second substrate pad and the second chip pad using the capillary comprises: moving the capillary in a vertical direction perpendicular to the first horizontal direction and the second horizontal direction to pull the second bonding wire upward in the vertical direction; and moving the capillary simultaneously in the first horizontal direction and the vertical direction such that the second bonding wire is bent at the first angle with respect to the upper surface of the package substrate.

10. The method of claim 2, wherein the bonding the third bonding wire to the third substrate pad and the third chip pad using the capillary comprises: moving the capillary in a vertical direction perpendicular to the first horizontal direction and the second horizontal direction to pull the third bonding wire upward in the vertical direction; and moving the capillary simultaneously in the first horizontal direction and the vertical direction such that the third bonding wire is bent at the second angle with respect to the upper surface of the package substrate.

11. The method of claim 2, wherein the second bonding wire contacts the second substrate pad at an angle of about 45 to about 75 with respect to a direction of the first semiconductor chip.

12. The method of claim 2, wherein the second bonding wire and the third bonding wire have loop trajectories overlapping 70% or more.

13. The method of claim 2, wherein the first bonding wire is in contact with the first substrate pad along a first straight line in a first direction, the second bonding wire is in contact with the second substrate pad along a second straight line in the first direction, the third bonding wire is in contact with the third substrate pad along the second straight line, and wherein the first straight line and the second straight line are spaced apart from each other by an interval of at least 100 m.

14. A method of manufacturing a semiconductor package, the method comprising: preparing a package substrate comprising a first substrate pad and a second substrate pad spaced apart from the first substrate pad in a first horizontal direction; mounting a semiconductor chip comprising a first chip pad and a second chip pad spaced apart from the first chip pad in the first horizontal direction on an upper surface of the package substrate; ball-bonding a first bonding wire to the first substrate pad using a capillary; moving the capillary in a vertical direction to pull the first bonding wire upward in the vertical direction; moving the capillary simultaneously in a second horizontal direction intersecting the first horizontal direction, and the vertical direction such that the first bonding wire is bent at a first angle with respect to the upper surface of the package substrate; stitch-bonding the first bonding wire to the first chip pad; ball-bonding a second bonding wire to the second substrate pad using the capillary; moving the capillary in the vertical direction to pull the second bonding wire upward in the vertical direction; moving the capillary simultaneously in the second horizontal direction and the vertical direction such that the second bonding wire is bent at a second angle with respect to the upper surface of the package substrate, wherein the second angle is smaller than the first angle; and stitch-bonding the second bonding wire to the second chip pad.

15. The method of claim 14, wherein the first angle is an angle of 45 to 75.

16. The method of claim 14, wherein the first bonding wire and the second bonding wire have loop trajectories overlapping 70% or more.

17. A method of manufacturing a semiconductor package, the method comprising: preparing a package substrate having first substrate pads and second substrate pads respectively arranged in first and second rows extending in a first direction and spaced apart from each other; mounting a first semiconductor chip comprising first chip pads disposed in the first direction on an upper surface of the package substrate at a position closer to the first substrate pads than to the second substrate pads; mounting a second semiconductor chip comprising second chip pads disposed in the first direction on an upper surface of the first semiconductor chip; alternatively bonding each of lower bonding wires at one end to a respective one of the first chip pads and at the other end to a respective one of the first substrate pads; alternately bonding each of first upper bonding wires at one end to a respective one of the second substrate pads and at the other end to a respective one of the second chip pads, and each of second upper bonding wires at one end to a respective one of the second substrate pads and at the other end to a respective one of the second chip pads.

18. The method of claim 17, wherein each of the second upper bonding wires has a length longer than each of the first upper bonding wires.

19. The method of claim 17, wherein the bonding the lower bonding wires to the first chip pads and the first substrate pads comprises: ball-bonding the lower bonding wires to the first chip pads; and stitch-bonding the lower bonding wires to the first substrate pads.

20. The method of claim 17, wherein the bonding the first upper bonding wires and the second upper bonding wires to the second chip pads and the second substrate pads comprises: ball-bonding the first upper bonding wires and the second upper bonding wires to the second substrate pads; and stitch-bonding the first upper bonding wires and the second upper bonding wires to the second chip pads.

21. The method of claim 17, wherein the first upper bonding wires and the second upper bonding wires have loop trajectories overlapping 70% or more.

Description

BRIEF DESCRIPTION OF DRAWINGS

[0008] The above and other aspects and features will be more apparent from the following description of example embodiments, taken in conjunction with the accompanying drawings, in which:

[0009] FIG. 1 is a perspective view of a semiconductor package according to an example embodiment;

[0010] FIG. 2 is a side view of the semiconductor package as viewed in the Y-axis direction of FIG. 1;

[0011] FIG. 3 is an enlarged view of part A of FIG. 2;

[0012] FIG. 4 is a plan view of the semiconductor package as viewed in the Z-axis direction of FIG. 1;

[0013] FIG. 5 is an enlarged view of part B of FIG. 4; and

[0014] FIGS. 6A, 6B, 7A, 7B, 8A, 8B, 9A, 9B, 10A, 10B, 11A, 11B, 12A, 12B, 13A and 13B are diagrams illustrating respective processes of a method of manufacturing a semiconductor package according to an example embodiment.

DETAILED DESCRIPTION

[0015] Hereinafter, example embodiments will be described with reference to the accompanying drawings, in which example embodiments are shown. Embodiments described herein are provided as examples, and thus, the present disclosure is not limited thereto, and may be realized in various other forms. Each example embodiment provided in the following description is not excluded from being associated with one or more features of another example or another example embodiment also provided herein or not provided herein but consistent with the present disclosure. It will be understood that when an element or layer is referred to as being on, connected to or coupled to another element or layer, it can be directly on, connected or coupled to the other element or layer, or intervening elements or layers may be present. By contrast, when an element is referred to as being directly on, directly connected to or directly coupled to another element or layer, there are no intervening elements or layers present. Expressions such as at least one of, when preceding a list of elements, modify the entire list of elements and do not modify the individual elements of the list. For example, the expression, at least one of a, b, and c, should be understood as including only a, only b, only c, both a and b, both a and c, both b and c, or all of a, b, and c.

[0016] Referring to FIGS. 1 and 2, the semiconductor package 100 may include a package substrate 110, a semiconductor stack SS, a bonding wire BW, and an encapsulant 170.

[0017] The package substrate 110 may have a plate shape having a first surface S1 and a second surface S2. For example, the package substrate 110 may be a printed circuit board (PCB) or a silicon interposer substrate (Si interposer substrate). A substrate pad 112 may be disposed on the first surface S1 of the package substrate 110, and a bump pad 113 may be disposed on the second surface S2 of the package substrate 110. An internal wiring connecting the substrate pad 112 and the bump pad 113 may be included in the package substrate 110. The substrate pad 112 and the bump pad 113 may be patterned in the solder resist layer 111.

[0018] The substrate pad 112 may include a plurality of substrate pads 112 divided into groups and disposed on the first surface S1 of the package substrate 110. An example embodiment illustrates, as an example, a case in which the substrate pad 112 is divided into first to third substrate pad groups PG1, PG2, and PG3, and the first to third substrate pad groups PG1, PG2, and PG3 include first to third substrate pads 112A, 112B and 112C, respectively, but the number of substrate pad groups and the number of substrate pads in each group may be variously modified. The first to third substrate pad groups PG1, PG2, and PG3 may be respectively arranged in the first direction (Y-direction) and may be disposed along imaginary first to third straight lines L1, L2, and L3 that are parallel to each other. For example, the first substrate pad group PG1 and the second substrate pad group PG2 may be disposed on one side of the semiconductor stack SS and parallel to the semiconductor stack SS, the third substrate pad group PG3 may be disposed on the other side of the semiconductor stack SS and parallel to the semiconductor stack SS. In addition, the first substrate pad group PG1 may be disposed closer to the semiconductor stack SS than the second substrate pad group PG2 and the third substrate pad group PG3, and the third substrate pad group PG3 may be disposed closer to the semiconductor stack SS than the second substrate pad group PG2. The substrate pad 112 may be a bonding finger elongated in the X-direction. For example, the substrate pad 112 may be formed on the first surface S1 of the package substrate 110 to a length of about 300 to 400 m, and may be disposed at a pitch of about 65 m or less. The first to third substrate pads 112A, 112B, and 112C may have the same pitch. However, embodiments of the present disclosure are not limited thereto, and according to example embodiments, the first to third substrate pads 112A, 112B, and 112C included in the first to third substrate pad groups PG1, PG2, and PG3 may be inclined to face the semiconductor stack SS, and the pitches of the first to third substrate pads 112A, 112B, and 112C included in the first to third substrate pad groups PG1, PG2, and PG3 may be different. For example, the pitch of the first substrate pads 112A may be smaller than the pitch of the second substrate pads 112B.

[0019] The bump pad 113 may be disposed on the second surface S2 of the package substrate 110, and a conductive bump 120 may be attached to the bump pad 113. For example, the conductive bump 120 may have a land, ball, or pin shape. For example, the conductive bump 120 may include tin (Sn) or an alloy (e.g., SnAgCu) containing tin (Sn). The conductive bump 120 may be used to electrically connect to an external device such as the package substrate 110, a module substrate, or a system board.

[0020] The semiconductor stack SS may be disposed on the first surface S1 of the package substrate 110. For example, the semiconductor stack SS may have a structure in which the first to third chip stack bodies 140, 160, and 150 are stacked. In an example embodiment, the third chip stack 150 is disposed between the first chip stack 140 and the second chip stack 160, and a case in which two semiconductor chips are arranged in each stack will be described as an example. However, the number of chip stacks included in the semiconductor stack SS and the number of semiconductor chips included in each chip stack may be variously modified. For example, the semiconductor stack SS may include seven or more chip stacks.

[0021] The first to third chip stacks 140, 160, and 150 may include first semiconductor chips 141 and 142, second semiconductor chips 161 and 162, and third semiconductor chips 151 and 152, respectively. The number of semiconductor chips included in each of the first to third chip stacks 140, 160, and 150 may be the same. However, embodiments of the present disclosure are not limited thereto, and the number of the first semiconductor chips 141 and 142, the number of the second semiconductor chips 161 and 162, and the number of the third semiconductor chips 151 and 152 may be different from each other. The upper surface of the second semiconductor chip 161 disposed at the lowermost portion of the second chip stack 160 may be spaced apart from the first surface S1 of the package substrate 110 by a predetermined distance or more. For example, the predetermined distance may be about 700 m.

[0022] Also, the first semiconductor chips 141 and 142, the second semiconductor chips 161 and 162, and the third semiconductor chips 151 and 152 may be the same type of semiconductor chip having the same size. For example, the first semiconductor chips 141 and 142, the second semiconductor chips 161 and 162, and the third semiconductor chips 151 and 152 may be memory chips of the same type, and may be memory chips having the same capacity. Memory chips include phase change random access memory (PRAM), resistive random access memory (PRAM), magnetic random access memory (MRAM), and dynamic random access memory (DRAM) or a flash memory device. However, the present example embodiment is not limited thereto, and some of the first semiconductor chips 141 and 142, the second semiconductor chips 161 and 162, and the third semiconductor chips 151 and 152 may be heterogeneous semiconductor chips. Also, the sizes of the first semiconductor chips 141 and 142, the sizes of the second semiconductor chips 161 and 162, and the sizes of the third semiconductor chips 151 and 152 may be different from each other.

[0023] The first to third chip stacks 140, 160, and 150 include first semiconductor chips 141 and 142, second semiconductor chips 161 and 162, and third semiconductor chips 151 and 152, and may respectively form a cascade structure stacked in a step form. Each of the second and third chip stacks 160 and 150 may have an overhang region in which the lowermost semiconductor chips 161 and 151 further protrude outward than the side surfaces of the uppermost semiconductor chips 142 and 152 disposed therebelow. For example, the overhang region OH of the chip stack body disposed on the upper portion is not supported by the chip chuck layer body disposed on the lower side, and may be defined as an area protruding in the X-axis direction.

[0024] The first semiconductor chips 141 and 142, the second semiconductor chips 161 and 162, and the third semiconductor chips 151 and 152 are adhered to each other by adhesive members 141F, 142F, 151F, 152F, 161F, and 162F, respectively, and may be fixed. The adhesive members 141F, 142F, 151F, 152F, 161F, and 162F may be a die attach film.

[0025] In the case of the first semiconductor chips 141 and 142, the second semiconductor chips 161 and 162, and the third semiconductor chips 151 and 152, chip pads to which bonding wires are respectively connected may be disposed adjacent to edge regions of any one of the edges disposed in the Y-axis direction. The chip pads 141P, 142P, 151P, 152P, 161P, and 162P may be aligned in rows in the Y-axis direction, and may be spaced apart from each other at regular intervals. For example, the chip pads 141P, 142P, 151P, 152P, 161P, and 162P may be disposed at a pitch of about 60 um or less.

[0026] The bonding wire BW may electrically connect the package substrate 110 and the semiconductor stack SS to each other. Specifically, the bonding wire BW may connect the substrate pad 112 of the package substrate 110 to the chip pad of the semiconductor chip included in the semiconductor stack SS. Also, the bonding wire BW may electrically connect the semiconductor chips included in the semiconductor stack SS to each other. The diameter of the bonding wires BW may be, for example, about 0.7 mil. According to an example embodiment, a first bonding wire BW1 connecting the package substrate 110 and the first chip stack 140 and a second bonding wire BW2 connecting the package substrate 110 and the second chip stack 160 are provided. The bonding wires BW2 are described below. The third bonding wire BW3 connected to the third chip stack 150 has a configuration similar to that of the second bonding wire BW2.

[0027] The bonding wire BW may be defined as a lower bonding wire and an upper bonding wire, respectively, depending on the position of the chip stack to be bonded. For example, the first bonding wire BW1 connected to the first chip stack 140 disposed at a relatively lower position is may be described as a lower bonding wire BW1. Also, for example, the second bonding wire BW2 connected to the second chip stack 160 disposed at a relatively higher position may be described as an upper bonding wire BW2.

[0028] The lower bonding wire BW1 may include a chip-to-substrate lower bonding wire BW1_A and an inter-chip lower bonding wire BW1_B. The chip-substrate lower bonding wire BW1_A may electrically connect the lowermost first semiconductor chip 141 included in the first chip stack 140 to the package substrate 110. The inter-chip lower bonding wire BW1_B may electrically connect the first semiconductor chips 141 and 142 included in the first chip stack 140 to each other.

[0029] The chip-substrate lower bonding wire BW1_A may electrically connect the package substrate 110 and the lowermost first semiconductor chip 141 of the first chip stack 140. The first chip pad 141P may be electrically connected to the first substrate pad 112A through lower bonding wire BW1_A. An electrical signal may be transmitted between the package substrate 110 and the lowermost semiconductor chip 141 through the chip-substrate lower bonding wire BW1_A.

[0030] The inter-chip lower bonding wire BW1_B may connect the first semiconductor chips 141 and 142 to each other. An electrical signal may be transmitted between the first semiconductor chips 141 and 142 through the inter-chip lower bonding wire BW1_B. Accordingly, the electrical signal transmitted from the package substrate 110 through the chip-substrate lower bonding wire BW1_A may be transmitted to the uppermost first semiconductor chip 142 through the inter-chip lower bonding wire BW1_B.

[0031] The chip-to-substrate lower bonding wire BW1_A and the inter-chip lower bonding wire BW1_B may be bonded by a forward bonding method. For example, after bonding one end of the chip-substrate lower bonding wire BW1_A to the first chip pad 141P of the lowermost first semiconductor chip 141 by ball bonding, the other end of the chip-substrate lower bonding wire BW1_A may be connected to the first substrate pad 112A of the package substrate 110 by stitch bonding. According to an example embodiment, the chip-substrate lower bonding wire BW1_A may be stitch-bonded to the stud bump BP formed on the first substrate pad 112A.

[0032] In addition, after bonding one end of the lower inter-chip bonding wire BW1_B to the first chip pad 142P of the uppermost first semiconductor chip 142 by ball bonding, the other end of the lower inter-chip bonding wire BW1_B may be connected to the first chip pad 141P of the lowermost first semiconductor chip 141 by stitch bonding. According to an example embodiment, the inter-chip lower bonding wire BW1_B may be stitch-bonded to the stud bump BP formed on the first chip pad 142P.

[0033] The upper bonding wire BW2 may include a chip-to-substrate upper bonding wire BW2_A and an inter-chip upper bonding wire BW2_B. The chip-substrate upper bonding wire BW2_A may electrically connect the lowermost semiconductor chip 161 included in the second chip stack 160 to the package substrate 110. The inter-chip upper bonding wire BW2_B may electrically connect the semiconductor chips 161 and 162 included in the second chip stack 160 to each other.

[0034] The inter-chip upper bonding wire BW2_B may connect the second semiconductor chips 161 and 162 to each other. An electrical signal may be transmitted between the second semiconductor chips 161 and 162 through the inter-chip lower bonding wire BW2_B. Accordingly, the electrical signal transmitted from the package substrate 110 through the chip-to-substrate upper bonding wire BW2_A may be transmitted to the second semiconductor chips 161 and 162 through the inter-chip upper bonding wire BW2_B.

[0035] The chip-substrate upper bonding wire BW2_A may electrically connect the package substrate 110 and the lowermost second semiconductor chip 161 of the second chip stack 160. For example, the chip-substrate upper bonding wire BW2_A includes the second substrate pad 112B of the package substrate 110 and the chip pad 161P may be electrically connected to each other. An electrical signal may be transmitted between the package substrate 110 and the lowermost second semiconductor chip 161 through the chip-substrate upper bonding wire BW2_A.

[0036] The chip-substrate upper bonding wire BW2_A may be bonded by a reverse bonding method. For example, after bonding one end of the chip-board upper bonding wire BW2_A to the second substrate pad 112B of the package substrate 110 by ball bonding, the other end of the chip-substrate upper bonding wire BW2_A may be connected to the chip pad 161P of the lowermost second semiconductor chip 161 by stitch bonding. According to an example embodiment, the chip-substrate upper bonding wire BW2_A may be stitch-bonded to the stud bump BP formed on the chip pad 161P of the lowermost second semiconductor chip 161.

[0037] Also, the inter-chip upper bonding wire BW2_B may be bonded by a reverse bonding method. For example, after bonding one end of the inter-chip upper bonding wire BW2_B to the second chip pad 161P of the lowermost second semiconductor chip 161 by ball bonding, the other end of the inter-chip upper bonding wire BW2_B may be connected to the second chip pad 162P of the second uppermost semiconductor chip 162 by stitch bonding. According to an example embodiment, the inter-chip upper bonding wire BW2_B may be stitch-bonded to the stud bump BP formed on the second chip pad 162P of the uppermost second semiconductor chip 162.

[0038] In the semiconductor package 100 according to an example embodiment, the upper bonding wire BW2 may, for example, be bonded by a reverse bonding method, and the lower bonding wire BW1 may, for example, be bonded by a forward bonding method.

[0039] The forward bonding method may have high productivity compared to the reverse bonding method because it connects the objects to be connected with the shortest distance. However, when bonding objects with a large height difference using the forward bonding method, in the process of extending in the direction of the substrate pad after bonding at the chip pad, the loop of the bonding wire may be inclined to the side, and a short circuit may occur through contact with other bonding wires that have already been bonded. Since the chip-substrate upper bonding wire BW2_A of an example embodiment bonds between the second substrate pad 112B of the package substrate 110 and the lowermost second semiconductor chip 161 having a large height difference, when using the forward bonding method, a sagging phenomenon in which the loop of the chip-board upper bonding wire BW2_A is inclined laterally may occur. In an example embodiment, by bonding the chip-board upper bonding wire (BW2_A) by a reverse bonding method, it is possible to prevent the problem that the loop of the chip-board upper bonding wire BW2_A is inclined to the side.

[0040] The chip-substrate upper bonding wire BW2_A is connected to the second substrate pad 112B depending on the position, and may be classified into a first group of first chip-board upper bonding wires BW2_A1 and a second group other than the first group of second chip-board upper bonding wires BW2_A2.

[0041] Referring to FIG. 5, the first chip-to-substrate upper bonding wire BW2_A1 and the second chip-to-substrate upper bonding wire BW2_A2 may be alternately disposed in the Y-direction, and may be alternately connected to the second substrate pad 112B. For example, an end of the first chip-to-substrate upper bonding wire BW2_A1 and an end of the second chip-to-substrate upper bonding wire BW2_A2 may be arranged in a zigzag arrangement on the second substrate pad 112B. The length of the first chip-to-substrate upper bonding wire BW2_A1 may be shorter than the length of the second chip-to-substrate upper bonding wire BW2_A2.

[0042] One end of the first chip-to-substrate upper bonding wire BW2_A1 and one end of the second chip-to-substrate upper bonding wire BW2_A2 may be connected to the second substrate pad group PG2 of the substrate pad 112 may be respectively connected by ball bonding along an imaginary fourth straight line L4 and a fifth straight line L5 parallel to the second straight line L2 on which the second substrate pad group PG2 is disposed. For example, one end of the first chip-board upper bonding wire BW2_A1 may be disposed on the fourth straight line L4, and one end of the second chip-board upper bonding wire BW2_A2 may be disposed on the fifth straight line L5. For example, the fourth straight line L4 and the fifth straight line L5 may be spaced apart from each other by an interval W2 of about 100 m or more.

[0043] As described above, when the chip-board upper bonding wire BW2_A is bonded by the reverse bonding method, it is possible to solve the problem that the loop of the chip-board upper bonding wire BW2_A is inclined to the side. However, when the pitch of the second substrate pad 112B is very small, in the process of forming the ball bonding on the second substrate pad 112B, a capillary from which the bonding wire is ejected may come into contact with the adjacent bonding wire, such that a loop of the adjacent bonding wire may be deformed. In an example embodiment, one end of the first chip-to-substrate upper bonding wire BW2_A1 and one end of the second chip-to-substrate upper bonding wire BW2_A2 are alternately arranged on the second substrate pad 112B, and the first chip-to-substrate upper bonding wire BW2_A1 having a relatively short length is first bonded, and by later bonding the relatively long second chip-to-substrate upper bonding wire BW2_A1, it is possible to secure a bonding space without the capillary being in contact with the adjacent bonding wire. Accordingly, the problem of the capillary in contact with the adjacent bonding wire in the process of forming the bonding wire may be alleviated.

[0044] Referring to FIG. 3, a loop of the first chip-to-substrate upper bonding wire BW2_A1 and a loop of the second chip-to-substrate upper bonding wire BW2_A2 may be connected to the first surface S1 of the package substrate 110 to be inclined in the direction of the first chip stack 140. The first chip-substrate upper bonding wire BW2_A1 may be connected to be inclined at a first angle 1 with respect to the first surface S1 of the package substrate 110. As described above, the first chip-to-substrate upper bonding wire BW2_A1 having a relatively short length is first bonded, and the relatively long second chip-to-substrate upper bonding wire BW2_A2 is bonded later, and since the gap between the first chip-to-substrate upper bonding wire BW2_Al and the second chip-to-substrate upper bonding wire BW2_A1 is narrow, there may be a problem in that a capillary for forming the second chip-to-substrate upper bonding wire BW2_A2 contacts the first chip-to-substrate upper bonding wire BW2_A1. In an example embodiment, since the first chip-board upper bonding wire BW2_A1 is formed to be inclined with respect to the first surface S1 of the package substrate 110, a problem in which the capillary contacts the adjacent first chip-to-substrate upper bonding wire BW2_A1 may be alleviated.

[0045] In addition, according to an example embodiment, the second chip-substrate upper bonding wire BW2_A2 may also be disposed to be inclined at a second angle 2 with respect to the first surface S1 of the package substrate 110. The first angle 1 may be greater than the second angle 2, but is not limited thereto.

[0046] A loop trajectory of the first chip-substrate upper bonding wire BW2_A1 and the second chip-substrate upper bonding wire BW2_A2 may be disposed to overlap each other with the first point P1 as a starting point. In detail, the first chip-to-substrate upper bonding wire BW2_A1 and the second chip-to-substrate upper bonding wire BW2_A2 may include a section in which the loop trajectories do not overlap and a section in which the loop trajectories overlap. When the height section AR3 of the loop trajectory of the second chip-board upper bonding wire BW2_A2 is about 1000 m, the height section AR4 of the first point P1 may be about 750 m. The section in which the loop trajectories overlap may be defined as an area in which the loop of the first chip-to-substrate upper bonding wire BW2_A1 and the loop of the second chip-to-substrate upper bonding wire BW2_A2 are disposed parallel to each other on a coplanar surface. Among the entire section AR1 of the second chip-to-substrate upper bonding wire BW2_A2, the section AR2 having a loop trajectory overlapped with the first chip-to-substrate upper bonding wire BW2_A1 is 70 of the entire section AR1 % or more. In detail, in the first chip-to-substrate upper bonding wire BW2_A1 and the second chip-to-substrate upper bonding wire BW2_A2, a section in which the loop trajectories do not overlap may be less than 30% of the entire section AR1. The loop of the first chip-to-substrate upper bonding wire BW2_A1 and the loop of the second chip-to-substrate upper bonding wire BW2_A2 become parallel to each other as the second section AR2 increases. Electrical characteristics of electrical signals transmitted through the first chip-to-substrate upper bonding wire BW2_A1 and the second chip-to-substrate upper bonding wire BW2_A2 may be improved.

[0047] The encapsulant 170 is disposed on the package substrate 110 and may cover the semiconductor stack SS. Examples of the encapsulant 170 may include an insulating material, for example, a thermosetting resin such as an epoxy resin, a thermoplastic resin such as polyimide, or prepreg containing inorganic filler and/or glass fiber, Ajinomoto Build-up Film (ABF), FR-4, Bismaleimide Triazine (BT), EMC, and the like.

[0048] A method of manufacturing the semiconductor package of FIG. 2 will be described with reference to FIGS. 6A to 13B. 6A to 13B are diagrams illustrating processes of a method of manufacturing a semiconductor package according to an example embodiment. FIGS. 6A to 13B may use the same reference numerals as those used to describe the semiconductor package of FIG. 2 to describe the same or similar parts. FIGS. 6A to 13B illustrate a process of bonding a first chip-to-substrate upper bonding wire (BW2_A1), a second chip-to-substrate upper bonding wire (BW2_A2), and an inter-chip upper bonding wire (BW2_B) of the semiconductor package 100 of FIG. 2 by a reverse bonding method. FIGS. 6A and 6B may be understood that after the process of bonding the chip-substrate lower bonding wire BW1_A to the lowermost first semiconductor chip 141 and the process of bonding the inter-chip lower bonding wire BW1_B to the uppermost first semiconductor chip 142 are performed. As described above, the chip-to-substrate lower bonding wire BW1_A and the inter-chip lower bonding wire BW1_B may be bonded by a forward bonding method, and a detailed description thereof will be omitted.

[0049] Referring to FIGS. 6A and 6B, the first chip-bonding end of the upper bonding wire BW2_A1 is ball-bonded to the second substrate pad 112B of the package substrate 110, and by moving the capillary (C) in the upward direction (D1), the first chip-board upper bonding wire BW2_A1 may be pulled in the upper direction D1. According to the example embodiment, before forming the first chip-to-substrate upper bonding wire BW2_A1, a stud bump BP may be formed on the chip pad 161P. One end of the first chip-substrate upper bonding wire BW2_A1 may be bonded on the second substrate pad 112B at a point that intersects the fourth virtual straight line L4.

[0050] Next, referring to FIGS. 7A and 7B, while moving the capillary C in the upper direction D1, and at the same time moving the first semiconductor chips 141 and 142 in the arrangement direction D2, the first chip-substrate upper bonding wire BW2_A1 may be refracted at a first angle 1 with respect to the upper surface of the package substrate 110. Therefore, in the example embodiment, a problem in which the capillary contacts the adjacent first chip-to-substrate upper bonding wire BW2_A1 in a subsequent process of forming the second chip-to-substrate upper bonding wire BW2_A2 may be alleviated.

[0051] Next, referring to FIGS. 8A and 8B, the other end of the first chip-to-substrate upper bonding wire BW2_A1 may be stitch-bonded on the chip pad 161P of the lowermost second semiconductor chip 161. According to an example embodiment, the other end of the first chip-board upper bonding wire BW2_A1 may be stitch-bonded to the stud bump BP formed on the chip pad 161P.

[0052] Next, referring to FIGS. 9A and 9B, one end of the inter-chip upper bonding wire BW2_B is bonded to the second chip pad 161P of the lowermost second semiconductor chip 161 by ball bonding, and the other end of the inter-chip upper bonding wire BW2_B may be connected to the second chip pad 162P of the second uppermost semiconductor chip 162 by stitch bonding. According to an example embodiment, one end of the inter-chip upper bonding wire BW2_B may be ball-bonded to the stud bump BP formed on the chip pad 161P. Also, according to an example embodiment, the other end of the inter-chip upper bonding wire BW2_B may be stitch-bonded to the stud bump BP formed on the second chip pad 162P of the uppermost second semiconductor chip 162. Thereafter, the process of bonding the first chip-to-substrate upper bonding wire BW2_A1 and the inter-chip upper bonding wire BW2_B (processes of FIGS. 6A to 9A) may be repeatedly performed. Therefore, after the bonding process of the first chip-board upper bonding wire BW2_A1 is completed, a subsequent process of bonding the second chip-board upper bonding wire BW2_A2 may be performed.

[0053] Next, referring to FIGS. 10A and 10B, the second chip-bonding end of the upper bonding wire BW2_A2 is ball-bonded to the second substrate pad 112B of the package substrate 110, and by moving the capillary C in the upper direction D1, the second chip-board upper bonding wire BW2_A2 may be pulled in the upper direction D1. In the previous process, in the process of bending the first chip-board upper bonding wire BW2_A1 at a first angle 1 with the upper surface of the package substrate 110, it can be seen that the space of the capillary C is secured and the first chip-substrate upper bonding wire BW2_A1 is not in contact. According to the example embodiment, before forming the second chip-to-substrate upper bonding wire BW2_A2, a stud bump BP may be formed on the chip pad 161P. One end of the second chip-to-substrate upper bonding wire BW2_A2 may be bonded on the second substrate pad 112B at a point crossing the fifth straight line L5 parallel to the fourth straight line L4. Accordingly, one end of the second chip-to-substrate upper bonding wire BW2_A2 may be arranged in a zigzag arrangement with one end of the first chip-to-substrate upper bonding wire BW2_A1 and the second substrate pad 112B. As such, by alternately arranging one end of the first chip-to-substrate upper bonding wire BW2_A1 and one end of the second chip-to-substrate upper bonding wire BW2_A2 to the second substrate pad 112B, it is possible to secure a bonding space without the capillary C in contact with the adjacent first chip-board upper bonding wire BW2_A1.

[0054] Next, referring to FIGS. 11A and 11B, while moving the capillary C in the upper direction D1, and at the same time moving the first semiconductor chips 141 and 142 in the arrangement direction D2, the second chip-substrate upper bonding wire BW2_A2 may be bent at a second angle 2 with the upper surface of the package substrate 110. According to an example embodiment, the second angle 2 may be smaller than the first angle 1.

[0055] Next, referring to FIGS. 12A and 12B, the other end of the second chip-to-substrate upper bonding wire BW2_A2 may be stitch-bonded on the chip pad 161P of the lowermost second semiconductor chip 161. According to an example embodiment, the other end of the second chip-board upper bonding wire BW2_A2 may be stitch-bonded to the stud bump BP formed on the chip pad 161P.

[0056] Next, referring to FIGS. 13A and 13B, one end of the inter-chip upper bonding wire BW2_B is bonded to the second chip pad 161P of the lowermost second semiconductor chip 161 by ball bonding, and the other end of the inter-chip upper bonding wire BW2_B may be connected to the second chip pad 162P of the second uppermost semiconductor chip 162 by stitch bonding. According to an example embodiment, one end of the inter-chip upper bonding wire BW2_B may be ball-bonded to the stud bump BP formed on the chip pad 161P. Also, according to an example embodiment, the other end of the inter-chip upper bonding wire BW2_B may be stitch-bonded to the stud bump BP formed on the chip pad 162P of the second uppermost semiconductor chip 162.

[0057] As set forth above, an example embodiment describes that by disposing the bonding wires in a zigzag shape and bending the loop shape of the bonding wires in the direction of the chip stack, a semiconductor package in which a contact between the capillary and the adjacent bonding wire may be prevented during the process of forming the bonding wires.

[0058] While aspects of example embodiments have been particularly shown and described, it will be understood that various changes in form and details may be made therein without departing from the spirit and scope of the following claims.