A method of forming a semiconductor device includes: forming a conductive pad over and electrically coupled to an interconnect structure, where the interconnect structure is disposed over a substrate and electrically coupled to electrical components formed on the substrate; forming a passivation layer over the conductive pad and the interconnect structure; and forming a sacrificial test structure over the passivation layer and electrically coupled to the conductive pad, where the sacrificial test structure includes a sacrificial pad extending along an upper surface of the passivation layer distal from the substrate, and includes a sacrificial via extending into the passivation layer and contacting the conductive pad.

Stacked semiconductor packages with features to mitigate trace exposer and associated systems and methods are disclosed herein. In some embodiments, the stacked semiconductor package includes a base substrate, a stack of dies carried by the base substrate, and a mold material deposited at least partially encapsulating the stack of dies. The base substrate can include an active surface and a back surface opposite the active surface. Further, the active surface can include one or more cuts into a peripheral portion of the active surface (e.g., stepped structures at the peripheral edges of the base substrate). The base substrate can also include a plurality of bond pads carried by the active surface over the peripheral portion. Still further, the mold material can fill each of the one or more cuts in the active surface, thereby insulating the bond pads from exposure at a sidewall of the stacked semiconductor package.

Semiconductor (SC) chip devices and associated methods of making are presented. The SC chips are designed to include enlarged extension semiconductor areas next to functional integrated circuit (IC) dies on these SC chips. Some variations include designing semiconductor wafers prior to fabrication so that the resultant IC dies are surrounded by the extension semiconductor areas. Other variations include processing post manufactured semiconductor wafers to expand the size of the available extension areas by including truncated pieces of IC dies that are immediately adjacent to functional working primary IC dies. These variations provide additional room for redistribution layers to fan-out from the IC dies outwards onto the extension areas.

Provided is a technique for enhancing the accuracy of deterioration diagnosis in a semiconductor device. The semiconductor device relating to the technique disclosed in the present specification is provided with a case, a semiconductor chip inside the case, a metal wire bonded to an upper surface of the semiconductor chip, at least one test piece inside the case, and a pair of terminals provided outside the case and connected to the test piece. The test piece is separated from the metal wire inside the case.

Various aspects of the present disclosure generally relate to a bonding pad configuration. A device includes a die including multiple bonding pads, pad configuration circuitry, and control circuitry. The pad configuration circuitry is configured to, based on a routing configuration, selectively connect multiple nodes of first circuitry to a first set of bonding pads of the multiple bonding pads. The control circuitry is connected to the pad configuration circuitry and configured to obtain the routing configuration.

An object is to provide a high reliability thin film transistor using an oxide semiconductor layer which has stable electric characteristics. In the thin film transistor in which an oxide semiconductor layer is used, the amount of change in threshold voltage of the thin film transistor before and after a BT test is made to be 2 V or less, preferably 1.5 V or less, more preferably 1 V or less, whereby the semiconductor device which has high reliability and stable electric characteristics can be manufactured. In particular, in a display device which is one embodiment of the semiconductor device, a malfunction such as display unevenness due to change in threshold voltage can be reduced.

A standby current detection circuit includes multiple first transistors. The first transistors are coupled in series to form a first detection circuit string, where N is a positive integer. The first detection circuit string is disposed on a scribe lane of a wafer, and the first detection circuit string is operated in a standby state and serves as a test medium for a standby current.

An electronic product includes a number of die and an interposer. The die are coupled to the interposer. Each respective die includes an edge integrity detection structure extending along at least part of an edge of the respective die. The interposer includes at least one pad coupled to at least one edge integrity detection structure of the die.

A scribe line structure is provided. The scribe line structure includes a die region, a scribe line region, and one or more circuit probing pads. The die region is disposed on a semiconductor wafer. The scribe line region surrounds the die region. The one or more circuit probing pads are disposed on a first top surface of the die region and a second top surface of the scribe line region.

An electronic product includes a package substrate, a number of die, and an interposer. The die are coupled to the interposer, and each respective includes an edge integrity detection structure extending along at least part of an edge of the respective die. The package substrate includes at least one pad coupled to at least one edge integrity detection structure of at least one die of the die.