A semiconductor device assembly includes a plurality of stacks of semiconductor devices horizontally spaced apart by a gap fill material, each including multiple devices coupled by TSVs to external package contacts through an RDL, and a device connection layer formed over the stacks and including a first plurality of contacts coupled to the TSVs, a second plurality of contacts facing away from the TSVs, a first plurality of conductors coupling contacts of the first plurality to corresponding contacts of the second plurality, and a second plurality of conductors coupling contacts of the second plurality to other contacts of the second plurality. The assembly further includes a multi-reticle semiconductor device over the device connection layer and including a plurality of circuit regions horizontally spaced apart from one another by a reticle-edge region absent any electrical conductors. The second plurality of conductors in the device connection layer operably interconnect the circuit regions.

Provided is a semiconductor package including a package substrate, a first semiconductor device arranged on the package substrate, a second semiconductor device arranged on the first semiconductor device, a heat dissipation structure arranged on the second semiconductor device, and at least one first chip stack including a plurality of first core chips apart from the first semiconductor device in a lateral direction and sequentially stacked on the package substrate and a first buffer chip arranged on the second semiconductor device and the plurality of first core chips, wherein the heat dissipation structure is arranged apart from the first buffer chip in the lateral direction, and the plurality of first core chips include a plurality of first core through electrodes configured to penetrate at least a portion of each of the plurality of first core chips.

A manufacturing method of a chip-attached substrate includes preparing a stacked substrate including multiple chips, a first substrate to which the multiple chips are temporarily bonded, and a second substrate bonded to the first substrate with the multiple chips therebetween; and separating the multiple chips bonded to the first substrate and the second substrate from the first substrate to bond the multiple chips to one surface of a third substrate including a device layer.

A method includes forming a transistor over a front side of a substrate, in which the transistor comprises a channel region, a gate region over the channel region, and source/drain regions on opposite sides of the gate region; forming a front-side interconnect structure over the transistor, wherein the front-side interconnect structure includes a dielectric layer and conductive features; and bonding the front-side interconnect structure to a carrier substrate via a bonding layer, in which the bonding layer is between the front-side interconnect structure and the carrier substrate, and the bonding layer has a higher thermal conductivity than the dielectric layer of the front-side interconnect structure.

A bonded structure is disclosed. The bonded structure can comprise a first semiconductor element having a first contact pad. An interposer can include a second contact pad on a first side of the interposer and a third contact pad and a fourth contact pad on a second side of the interposer opposite the first side, the second contact pad bonded to the first contact pad; a second semiconductor element having a fifth contact pad bonded to the third contact pad and a sixth contact pad bonded to the fourth contact pad. A switching circuitry can be configured to switch between a first electrical connection between the second and third contact pads and a second electrical connection between the second and fourth contact pads.

A semiconductor package includes: a plurality of lower redistribution line patterns, a plurality of lower redistribution via patterns, and a lower redistribution insulating layer surrounding the plurality of lower redistribution line patterns and the plurality of lower redistribution via patterns; an expanded layer at least partially defining a mounting space and including, on the lower redistribution layer, a via pad at least partially defining a via pad recess extending from a bottom surface of the via pad into the via pad, an expanded structure covering the via pad, and an extending via portion connected with the via pad through the expanded structure; and a semiconductor chip in the mounting space, on the lower redistribution layer, wherein, from among the lower redistribution via patterns, a lower redistribution via pattern connected with the via pad extends into the via pad while filling the via pad recess.

An interposer, and integrated circuit including an interposer, has a lower surface adapted for bump mounting and an upper surface adapted for copper bonding. An interposer layer includes active interposers and passive interposers. Bridges connect interposers in the interposer layer to produce a functionally large interposer from smaller interposer dies. A core may overlap more than one interposer in the interposer layer. Active interposers are disposed around the edge of the core with passive interposers beneath the core to facilitate heat dissipation.

A semiconductor package includes a flexible circuit board and a chip which includes a first bump group and a second bump group. First bumps of the first bump group and second bumps of the second bump group are provided to be bonded to leads on the flexible circuit board. The second bumps are designed to be longer than the first bumps in length so as to increase bonding strength of the second bumps to the leads, prevent the leads from being shifted and separated from the first and second bumps and prevent lead bonding misalignment.

A microelectronic assembly with a bridge die and through-assembly conductive vias may enable higher performance connectivity of dies or die stacks. In one example, an assembly includes a first IC structure (e.g., a bridge die) over and coupled with a circuit board, a second IC structure (e.g., a substrate) over the first IC structure, and a plurality of coplanar dies or die stacks between and bonded with the first IC structure and the second IC structure. Conductive vias may be formed through the dies or die stacks after attaching the dies or die stacks to the first or second IC structures, where a conductive via through a die or die stack may extend through the die or die stack so that a first portion of the conductive via is coplanar with the side or face of the die or die stack that is bonded with the first IC structure.

A semiconductor memory device includes a stacked body including a plurality of conductive layers and insulating layers alternately stacked in a first direction; and a contact plug electrically connected to a corresponding one of the conductive layers and extending from a step surface of the corresponding conductive layer in the first direction to penetrate through a corresponding portion of the stacked body.