A method of manufacturing a semiconductor package may include: preparing a semiconductor wafer including rear pads and a rear insulating layer surrounding the rear pads, the rear insulating layer including first recesses spaced apart from the rear pads in a first lateral direction; preparing second semiconductor chips including front pads and a front insulating layer surrounding the front pads, the front insulating layer including second recesses spaced apart from the front pads in the first lateral direction; forming an air gap between the first recesses and the second recesses in a vertical direction by disposing the second semiconductor chips on the semiconductor wafer, the rear pads contacting the front pads; and bonding the rear insulating layer and the front insulating layer to each other and bonding the rear pads and the front pads to each other by performing a thermal compression process.

A semiconductor package may include a first semiconductor chip and a second semiconductor chip on a top surface thereof. The first semiconductor chip may include a first bonding pad on a top surface of a first semiconductor substrate and a first penetration via on a bottom surface of the first bonding pad and penetrating the first semiconductor substrate. The second semiconductor chip may include a second interconnection pattern on a bottom surface of a second semiconductor substrate and a second bonding pad on a bottom surface of the second interconnection pattern and coupled to the second interconnection pattern. The second bonding pad may be directly bonded to the first bonding pad. A width of the first penetration via may be smaller than that of the first bonding pad, and a width of the second interconnection pattern may be larger than that of the second bonding pad.

A device package comprising an integrated cooling assembly comprising a semiconductor device and a cold plate directly bonded to the semiconductor device. The cold plate comprises a top portion, sidewalls extending downwardly from the top portion to a backside of the semiconductor device, an inlet opening, and an outlet opening. The top portion, the sidewalls, and the backside of the semiconductor device collectively define a coolant chamber volume therebetween. The inlet opening and the outlet opening are disposed in the top portion and are in fluid communication with the coolant chamber volume. The inlet opening is disposed above a hotspot region of the semiconductor device.

A copper diffusion-suppressing electrical bond between a first semiconductor wafer or chip or interposer and a second semiconductor wafer or chip or interposer includes a first bond pad metal with a first bond pad metal surface disposed on the first semiconductor wafer or chip or interposer, bonded with a second bond pad metal with a second bond pad metal surface disposed on the second semiconductor wafer or chip or interposer. A copper outdiffusion-suppressing coating such as a titanium, cobalt, nickel/gold, or nickel/palladium/gold layer may be disposed on the first copper bond pad metal surface and/or on the second copper bond pad metal surface. The copper of the bond pad metal may be doped with manganese to form a copper outdiffusion-suppressing surface manganese oxide. The bond pad metal may alternatively be tungsten to prevent copper outdiffusion.

A power chip packaging structure includes: a ceramic substrate; a first and a second top metal layers are formed on the ceramic substrate; a bottom metal layer formed on the ceramic substrate; a power chip having an active surface and a chip back surface. The active surface has a contact pad, and the chip back surface is connected to the first top metal layer. One or more first copper layers are formed on the contact pad, a top surface of the first copper layer has a peripheral region and an arrangement region surrounded by the peripheral region. Multiple second copper layers are formed in the arrangement region and separated from each other. Each of multiple wires is respectively connected to the second copper layer with one end and connected to the second top metal layer with the other end.

The disclosure provides an electronic device and a manufacturing method thereof. The electronic device includes a package structure, a circuit structure, a bonding structure and an external element. The circuit structure is disposed on the package structure and is electrically connected to the package structure. The circuit structure has a recess. The bonding structure includes a first bonding pad and a second bonding pad. The second bonding pad is disposed in the recess, and the second bonding pad is disposed on the first bonding pad. The bonding structure is disposed between the circuit structure and the external element. The external element is electrically connected to the circuit structure through the bonding structure. A width of the first bonding pad is smaller than a width of the second bonding pad.

A microelectronic device includes a first microelectronic device structure and a second microelectronic device structure vertically underlying the first microelectronic device structure. The first microelectronic device structure includes a stack structure and a first insulative material vertically underlying the stack structure. The stack structure includes tiers vertically stacked relative to one another and respectively including a first semiconductor material, and a second semiconductor material vertically neighboring the first semiconductor material. The second microelectronic device structure includes a second insulative material and a base semiconductor structure. The second insulative material is bonded to the first insulative material of the first microelectronic device structure. The base semiconductor structure is at least partially vertically adjacent to and in physical contact with the second insulative material. Related methods, memory devices, and electronic systems are also described.

The present disclosure provides a semiconductor structure and a manufacturing method thereof. A semiconductor structure includes a first chip. The first chip includes a first interconnect layer, a first conductive layer disposed on the first interconnect layer, a first dielectric layer covering the first conductive layer, and a first bonding pad embedded in the first dielectric layer and extending into the first conductive layer. The method of manufacturing the semiconductor structure includes the following operations. A first conductive layer is formed on a first interconnect layer. A first dielectric layer is formed on the first conductive layer and the first interconnect layer. The first dielectric layer is etched to form a first trench on the first conductive layer. A portion of the first conductive layer is etched to form a second trench. A first bonding pad is formed in the second trench.

A semiconductor device includes a substrate having a first main surface and a second main surface opposite to the first main surface, and a first conductive layer including a first metal layer and a second metal layer, the first metal layer covering the second main surface, the second metal layer covering the first metal layer and including dendrites, wherein a via hole extending through the substrate and having an inner wall surface is formed in the substrate, and wherein the first metal layer, which is covered with the second metal layer, covers the inner wall surface.

A semiconductor structure may be provided by forming a first molding compound around a first semiconductor die such that a top surface of the first molding compound is coplanar with a top dielectric surface of the first semiconductor die; forming a combination of at least one bonding-level dielectric layer, first bonding pads, and dummy pads over the first semiconductor die and the first molding compound, wherein each of the bonding pads is formed directly on a respective conductive structure within the first semiconductor die; and attaching a second semiconductor die including second bonding pads therein to the first semiconductor die by performing a bonding process that bonds the second bonding pads to the first bonding pads by metal-to-metal bonding such that a first subset of the dummy pads has an areal overlap in a plan view with the second semiconductor die.