C01B9/08

METHOD FOR PRODUCING ANION-CONTAINING INORGANIC SOLID MATERIAL, DEVICE FOR PRODUCING ANION-CONTAINING INORGANIC SOLID MATERIAL, AND ANION-CONTAINING INORGANIC SOLID MATERIAL
20240356007 · 2024-10-24 ·

A method for producing an anion-containing inorganic solid material includes: a laminating step of forming a laminate including an electrode, a solid electrolyte layer, and a doping target layer containing a material to be doped; and a doping step of doping the material to be doped with an anion using the doping target layer as a reaction field by applying a voltage to the laminate to have a potential of the doping target layer to be higher than a potential of the electrode.

FLUORINATION PROCESSES

A process for preparing a fluorinating reagent from a calcium-containing compound is disclosed. The process bypasses the requirement to form hydrofluoric acid. The fluorinating reagent can be used to prepare high-value fluorochemicals.

FLUORINATION PROCESSES

A process for preparing a fluorinating reagent from a calcium-containing compound is disclosed. The process bypasses the requirement to form hydrofluoric acid. The fluorinating reagent can be used to prepare high-value fluorochemicals.

PROCESS FOR THE PRODUCTION OF MAGNESIUM FLUORIDE SOL SOLUTIONS FROM ALKOXIDES COMPRISING ADDITION OF CARBON DIOXIDE
20170183505 · 2017-06-29 · ·

The invention relates to a method for obtaining a magnesium fluoride (MgF.sub.2) sol solution, comprising the steps of providing a magnesium alkoxide precursor in a non-aqueous solvent and adding 1.85 to 2.05 molar equivalents of non-aqueous hydrofluoric acid to said magnesium precursor, characterized in that the reaction proceeds in the presence of carbon dioxide. The invention further relates to sol solutions, method of applying the sol solutions of the invention to surfaces as a coating, and to antireflective coatings obtained thereby.

METHOD FOR PRODUCING HYDROGEN FLUORIDE

The present invention provides a novel method for producing hydrogen fluoride which can suppress the occurrence of the pasty state over the whole process of producing hydrogen fluoride, reduce the problem of corrosion caused by sulfuric acid, and improve energy efficiency of the process. A method for producing hydrogen fluoride by reacting calcium fluoride and sulfuric acid comprises: (a) mixing and reacting calcium fluoride and sulfuric acid such that a mixture comprising calcium fluoride particles and sulfuric acid substantially maintains a form of particulate to obtain hydrogen fluoride while supplying sulfuric acid to the calcium fluoride particles at a flow rate of 0.002 to 1 mol/min relative to 1 mol of calcium fluoride to such an amount that a molar ratio of sulfuric acid/calcium fluoride is 0.9 to 1.1.

METHOD FOR PRODUCING HYDROGEN FLUORIDE

The present invention provides a novel method for producing hydrogen fluoride which can suppress the occurrence of the pasty state over the whole process of producing hydrogen fluoride, reduce the problem of corrosion caused by sulfuric acid, and improve energy efficiency of the process. A method for producing hydrogen fluoride by reacting calcium fluoride and sulfuric acid comprises: (a) mixing and reacting calcium fluoride and sulfuric acid such that a mixture comprising calcium fluoride particles and sulfuric acid substantially maintains a form of particulate to obtain hydrogen fluoride while supplying sulfuric acid to the calcium fluoride particles at a flow rate of 0.002 to 1 mol/min relative to 1 mol of calcium fluoride to such an amount that a molar ratio of sulfuric acid/calcium fluoride is 0.9 to 1.1.

Process for the production of magnesium fluoride sol solutions from alkoxides comprising addition of carbon dioxide
09605160 · 2017-03-28 · ·

The invention relates to a method for obtaining a magnesium fluoride (MgF.sub.2) sol solution, comprising the steps of providing a magnesium alkoxide precursor in a non-aqueous solvent and adding 1.85 to 2.05 molar equivalents of non-aqueous hydrofluoric acid to said magnesium precursor, characterized in that the reaction proceeds in the presence of carbon dioxide. The invention further relates to sol solutions, method of applying the sol solutions of the invention to surfaces as a coating, and to antireflective coatings obtained thereby.

Process for producing fluorine-containing combined salt
09556037 · 2017-01-31 · ·

Disclosed is a process for producing a fluorine-containing complex salt, characterized by that, on a reaction mother liquor containing a plurality of cation species and a fluoroanion in a state that they have been dissolved in a solvent, a trigger for accelerating decomposition of the fluoroanion is allowed to act, thereby precipitating a complex salt containing a plurality of cation species and fluorine, as a solid, from the reaction mother liquor. According to this process, it is possible to produce a monodispersed fluorine-containing complex salt with uniform particle size and shape.

Process for producing fluorine-containing combined salt
09556037 · 2017-01-31 · ·

Disclosed is a process for producing a fluorine-containing complex salt, characterized by that, on a reaction mother liquor containing a plurality of cation species and a fluoroanion in a state that they have been dissolved in a solvent, a trigger for accelerating decomposition of the fluoroanion is allowed to act, thereby precipitating a complex salt containing a plurality of cation species and fluorine, as a solid, from the reaction mother liquor. According to this process, it is possible to produce a monodispersed fluorine-containing complex salt with uniform particle size and shape.

FLUORINATED GAS ABATEMENT AND FLUORIDE SEQUESTRATION USING SILICON
20250345747 · 2025-11-13 ·

A process includes providing a reactor containing a compound of the formula SiO.sub.x, wherein 0x2, and receiving, at the reactor, fluorinated gas. The process also includes obtaining a gaseous mixture formed at an elevated temperature in the reactor and removing silicon tetrafluoride from the gaseous mixture. An apparatus includes a reactor containing a compound of the formula SiO.sub.x, wherein 0x2, a component for receiving fluorinated gas at the reactor, a heating element for heating the compound of the formula SiO.sub.x and the fluorinated gas in the reactor, and a separation component for removing silicon tetrafluoride from a gaseous mixture formed in the reactor. A process of semiconductor manufacturing includes defluorinating exhaust gas using the process. A system for semiconductor manufacturing includes a set of components for carrying out the process.