C08F4/04

THERMOPLASTIC RESIN COMPOSITION

Provided is a thermoplastic resin composition which includes: a first graft copolymer including a C.sub.4 to C.sub.10 alkyl (meth)acrylate-based monomer unit, a C.sub.1 to C.sub.3 alkyl-substituted styrene-based monomer unit, and a vinyl cyan-based monomer unit; a second graft copolymer including a C.sub.4 to C.sub.10 alkyl (meth)acrylate-based monomer unit, an alkyl-unsubstituted styrene-based monomer unit, and a vinyl cyan-based monomer unit; a first styrene-based copolymer including a C.sub.1 to C.sub.3 alkyl-substituted styrene-based monomer unit and a vinyl cyan-based monomer unit; a second styrene-based copolymer including an alkyl-unsubstituted styrene-based monomer unit and a vinyl cyan-based monomer unit; and an olefin-based copolymer including a C.sub.1 to C.sub.3 alkyl (meth)acrylate-based monomer unit. The thermoplastic resin composition exhibits remarkably excellent chemical resistance and remarkably excellent appearance characteristics while maintaining basic properties.

Acrylic polymers having controlled placement of functional groups

Acrylic copolymers that include the controlled placement of functional groups within the polymer structure are provided. The copolymers contain a reactive segment and a non-reactive segment and are manufactured via a controlled radical polymerization process. The copolymers are useful in the manufacture of adhesives and elastomers.

Acrylic polymers having controlled placement of functional groups

Acrylic copolymers that include the controlled placement of functional groups within the polymer structure are provided. The copolymers contain a reactive segment and a non-reactive segment and are manufactured via a controlled radical polymerization process. The copolymers are useful in the manufacture of adhesives and elastomers.

RESIN, RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND COMPOUND

Disclosed are a resin comprising a structural unit represented by formula (I), and a structural unit represented by formula (a1-1) and/or a structural unit represented by formula (a1-2), and a resist composition including this resin:

##STR00001##

Methods of Preparing Compositions for Containers and Other Articles and Methods of Using Same

This invention provides a polymer, which is preferably a polyether polymer. The polymer may be uses in coating compositions. Containers and other articles comprising the polymer and methods of making such containers and other articles are also provided. The invention further provides compositions including the polymer (e.g., powder coatings), which have utility in a variety of coating end uses, including, for example, valve and pipe coatings.

Methods of Preparing Compositions for Containers and Other Articles and Methods of Using Same

This invention provides a polymer, which is preferably a polyether polymer. The polymer may be uses in coating compositions. Containers and other articles comprising the polymer and methods of making such containers and other articles are also provided. The invention further provides compositions including the polymer (e.g., powder coatings), which have utility in a variety of coating end uses, including, for example, valve and pipe coatings.

Polyacrylate-polysilane block copolymers

The invention relates a polyacrylate-polysilane block copolymer of general structure (I): wherein m and n independent of one another, are integers ranging from 2 to 4000; p is an integer ranging from 0 to 5; q is an integer ranging from 1 to 5; R.sup.1 represents hydrogen, straight-chain or branched alkyl group having 1 to 4 carbon atoms; R.sup.2 represents hydrogen, straight-chain or branched alkyl group having 1 to 18 carbon atoms; R3 represents hydrogen, hydroxyl group, straight-chain or branched alkyl group having 1 to 4 carbon atoms, or an C.sub.6-C.sub.14 aryl group; L is a linking moiety representing amine (—NH—) group, amide (—C(O)NH—) group, urea (—NHC(O)NH—) group, urethane (—OC(O)NH—) group or methylene (—CH.sub.2—) group; R.sup.4, R.sup.5 and R.sup.6 independent of one another, represents hydrogen, straight-chain or branched, alkyl group having 1 to 8 carbon atoms or polydimethylsiloxane group; and R.sup.7 represents hydrogen or methyl group. ##STR00001##

LIQUID CRYSTAL PANEL AND ELECTRO-OPTICAL DEVICE
20210103168 · 2021-04-08 ·

A liquid crystal panel according to one embodiment includes a first substrate, a second substrate opposed to the first substrate, a sealing member bonding the first substrate and the second substrate, and a liquid crystal layer sealed between the first substrate and the second substrate by the sealing member. The sealing member includes a ten-hour half-life temperature of 95° C. or lower and an acrylic resin. The liquid crystal layer includes a macromolecular compound.

POLYMERIZATION PHOTOINHIBITOR

Provided herein is technology relating to polymerization and producing polymers and particularly, but not exclusively, to methods, systems, and compositions for producing articles using three-dimensional printing and for improving control of polymerization using a polymerization photoinhibitor having fast back reaction kinetics such as hexaarylbiimidazole compounds and bridged hexaarylbiimidazole compounds.

POLYMERIZATION PHOTOINHIBITOR

Provided herein is technology relating to polymerization and producing polymers and particularly, but not exclusively, to methods, systems, and compositions for producing articles using three-dimensional printing and for improving control of polymerization using a polymerization photoinhibitor having fast back reaction kinetics such as hexaarylbiimidazole compounds and bridged hexaarylbiimidazole compounds.