Embossing resins, methods of manufacturing such resins, and electrokinetic display system, which includes display cells containing such resins. The resins include a fluoropolymer in weight percentage 5%-60%, a difunctional diluent in weight percentage 0-30%, a monofunctional diluent in weight percentage 0-40%, a urethane diacrylate or functionalized nanoscale material, e.g., a functionalized urethane material, in weight percentage 5-50%, a photoinitiator in weight percentage 0.5-5%, and a surfactant in weight percentage less than 0.5%. The difunctional diluent may be Hexanediol Diacrylate, and the monofunctional diluent may be a monofunctional hydrocarbon. The resins are made by identifying a target index of refraction for a cured state thereof, and combining together, by weight percentage, the constituent components to produce the liquid state version of the embossing resin having a desired composite index of refraction.

A method of producing a fluorine-containing compound is a method of producing a compound (30) having partial structure (3) by an insertion reaction of compound (20) into compound (10) that has partial structure (1), in the presence of an ionic catalyst formed from a specific monovalent anion and a counter cation. In the formulas, * represents a bonding site, and X.sup.1 and R.sup.1 to R.sup.4 each independently represents a hydrogen atom, a fluorine atom, a chlorine atom, or an organic group having a carbon number of 1 to 20 which may have a substituent. ##STR00001##

A method of producing a fluorine-containing compound is a method of producing a compound (30) having partial structure (3) by an insertion reaction of compound (20) into compound (10) that has partial structure (1), in the presence of an ionic catalyst formed from a specific monovalent anion and a counter cation. In the formulas, * represents a bonding site, and X.sup.1 and R.sup.1 to R.sup.4 each independently represents a hydrogen atom, a fluorine atom, a chlorine atom, or an organic group having a carbon number of 1 to 20 which may have a substituent. ##STR00001##

A method of producing a fluorine-containing compound is a method of producing a compound (30) having partial structure (3) by an insertion reaction of compound (20) into compound (10) that has partial structure (1), in the presence of an ionic catalyst formed from a specific monovalent anion and a counter cation. In the formulas, * represents a bonding site, and X.sup.1 and R.sup.1 to R.sup.4 each independently represents a hydrogen atom, a fluorine atom, a chlorine atom, or an organic group having a carbon number of 1 to 20 which may have a substituent. ##STR00001##

A production method capable of producing a hollow fine particulate containing a perfluororesin, having a large average particle size, and having a monoporous structure. A method for producing a hollow fine particulate including: a step A of dispersing a solution containing a perfluoromonomer and a non-polymerizable solvent capable of dissolving the perfluoromonomer and having an SP value of 9.00 to 9.80 (cal/cm.sup.3).sup.1/2 into water to provide a dispersion; a step B of polymerizing the perfluoromonomer to provide a phase-separated fine particulate containing a perfluororesin and having a monoporous structure; and a step C of removing the non-polymerizable solvent in the phase-separated fine particulate to provide a hollow fine particulate having a monoporous structure.

A method for producing a fluoropolymer, which includes: polymerizing a monomer (I) represented by the general formula (I) below in an aqueous medium substantially in the absence of a fluorine-containing surfactant (except for the monomer (I) represented by the general formula (I)) to obtain a crude composition containing a polymer of the monomer (I); removing a dimer and a trimer of the monomer (I) contained in the crude composition from the crude composition to obtain a polymer (I) in which the content of the dimer and trimer of the monomer (I) is 1.0% by mass or less based on the polymer (I); and polymerizing a fluoromonomer in an aqueous medium in the presence of the polymer (I) to obtain a fluoropolymer:

##STR00001## wherein X.sup.1, X.sup.3, X.sup.2, A.sup.0, R, Z.sup.1, Z.sup.2, and m are as defined herein.

The present invention provides a crosslinking agent which can improve crosslinked fluoroelastomer high-temperature vapor resistance and a crosslinked fluoroelastomer having improved high-temperature vapor resistance. The present invention provides a compound having a structure represented by the following formula (1) (in the formula, R.sup.1 to R.sup.6 are each a hydrogen atom, a substituent, or a leaving group, and two or more of R.sup.1 to R.sup.6 are leaving groups; R.sup.a to R.sup.c are each a hydrogen atom or a substituent; and n is an integer from 2 to 5). ##STR00001##

The present invention provides a crosslinking agent which can improve crosslinked fluoroelastomer high-temperature vapor resistance and a crosslinked fluoroelastomer having improved high-temperature vapor resistance. The present invention provides a compound having a structure represented by the following formula (1) (in the formula, R.sup.1 to R.sup.6 are each a hydrogen atom, a substituent, or a leaving group, and two or more of R.sup.1 to R.sup.6 are leaving groups; R.sup.a to R.sup.c are each a hydrogen atom or a substituent; and n is an integer from 2 to 5). ##STR00001##

The present invention provides a crosslinking agent which can improve crosslinked fluoroelastomer high-temperature vapor resistance and a crosslinked fluoroelastomer having improved high-temperature vapor resistance. The present invention provides a compound having a structure represented by the following formula (1) (in the formula, R.sup.1 to R.sup.6 are each a hydrogen atom, a substituent, or a leaving group, and two or more of R.sup.1 to R.sup.6 are leaving groups; R.sup.a to R.sup.c are each a hydrogen atom or a substituent; and n is an integer from 2 to 5). ##STR00001##