C08F222/10

Coating composition
09783683 · 2017-10-10 · ·

A coating composition contains (A) an acrylate component and (B) a metal oxide. A mass ratio (B)/(A) is from 0.6 to 1.3, (A) contains the components (a-1), (a-2) and (a-3), and a content ratio X of (a-1), a content ratio Y of (a-2) and a content ratio Z of (a-3) satisfies the conditions (1) and (2): (a-1): a polyfunctional acrylate compound having 3 or more acrylate groups in one molecule; (a-2): a dendritic aliphatic compound having an acrylate group at an end thereof; and (a-3): a modified acrylate compound having been modified with an alkylene oxide or ε-caprolactone. The condition (1): in (A), X is from 40 to 60% by mass, and a total of Y and Z is from 60 to 40% by mass, and the condition (2): in the total of Y and Z, Z is 30% by mass or more and less than 100% by mass.

Coating composition
09783683 · 2017-10-10 · ·

A coating composition contains (A) an acrylate component and (B) a metal oxide. A mass ratio (B)/(A) is from 0.6 to 1.3, (A) contains the components (a-1), (a-2) and (a-3), and a content ratio X of (a-1), a content ratio Y of (a-2) and a content ratio Z of (a-3) satisfies the conditions (1) and (2): (a-1): a polyfunctional acrylate compound having 3 or more acrylate groups in one molecule; (a-2): a dendritic aliphatic compound having an acrylate group at an end thereof; and (a-3): a modified acrylate compound having been modified with an alkylene oxide or ε-caprolactone. The condition (1): in (A), X is from 40 to 60% by mass, and a total of Y and Z is from 60 to 40% by mass, and the condition (2): in the total of Y and Z, Z is 30% by mass or more and less than 100% by mass.

Photocurable resin composition
11667741 · 2023-06-06 · ·

A curable resin composition which provides a cured product excellent in impact resistance and flexural modulus and has a low viscosity comprising a component (A), a component (B) and a component (C). The component (A) is a compound represented by formula (1), ##STR00001##
wherein in formula (1), R is hydrogen or a hydrocarbon group having 1 to 4 carbon atoms, and the hydrocarbon group optionally has a substituent, wherein the component (B) is a compound having 3 or more to 15 or less of oxyethylene groups or oxypropylene groups and two or more radically polymerizable groups per molecule, and wherein the component (C) is a radical polymerization initiator.

Dual-mechanism thickening agents for hydraulic fracturing fluids

The present invention relates to multi-arm star macromolecules which are used as thickening agents or rheology modifiers, including use in hydraulic fracturing fluid compositions. In one aspect of the invention, a star macromolecule is capable of thickening via a dual mechanism comprising (1) self-assembly of the hydrophobic polymerized segments of the star macromolecules via hydrophobic interactions or associations, and (2) association, reaction, or combination of the hydroxyl-containing polymerized segments of one or more of the star macromolecules.

LATEX COMPOSITION FOR DIP-FORMING INCLUDING CARBOXYLIC ACID MODIFIED-NITRILE BASED COPOLYMER LATEX AND DIP-FORMED ARTICLE PEREPARED THEREFROM
20170283599 · 2017-10-05 · ·

The present invention relates to a latex composition for dip-forming including two different types of carboxylic acid modified-nitrile based copolymer latex, and a dip-formed article prepared therefrom having excellent durability for sweat, and having high tensile strength and elongation percentage. Accordingly, the latex composition for dip-forming has excellent tensile strength, elongation percentage, stress and durability, and is useful in industries requiring these, for example, a rubber glove industry and the like.

POLYMER, COMPOSITION, OPTICAL FILM, AND LIQUID CRYSTAL DISPLAY DEVICE
20170283701 · 2017-10-05 · ·

A polymer is obtained by polymerizing a monomer having two or more radical polymerizable double bonds and one or more hydroxyl groups. A composition including the polymer, an optical film including a cholesteric liquid crystal layer containing the polymer on a support, and a liquid crystal display device including at least a backlight unit including the optical film and a liquid crystal cell are provided.

PHOTOCURABLE COMPOSITION FOR IMPRINTS, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING DEVICE
20170285468 · 2017-10-05 · ·

Provided are a photocurable composition for imprints, having good releasability and temporal stability of the releasability, a pattern forming method, and a method for manufacturing a device.

This photocurable composition for imprints includes a monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom, a bifunctional or higher polyfunctional (meth)acrylate (A2) not containing a fluorine atom, a monofunctional (meth)acrylate (B) containing a fluorine atom, and a photopolymerization initiator (C), in which the monofunctional chained aliphatic (meth)acrylate (A1) not containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa, and the monofunctional (meth)acrylate (B) containing a fluorine atom has a boiling point of 100° C. to 200° C. at a pressure of 0.67 kPa.

PHOTOLITHOGRAPHIC PATTERNING OF ELECTRONIC DEVICES

A method of patterning a device includes forming a fluorinated photopolymer layer over a device substrate. The photopolymer layer has a lower portion proximate the device substrate and an upper portion distal the device substrate. The fluorinated photopolymer layer includes a radiation-absorbing dye and a fluorinated photopolymer having a solubility-altering reactive group. The photopolymer layer is exposed to patterned radiation to form exposed and unexposed areas in accordance with the patterned radiation and a developed structure is formed by removing unexposed areas using a developing agent that includes a first fluorinated solvent. The lower portion of the exposed area of the photopolymer layer has a dissolution rate in the developing agent that is at least 5 times higher than a dissolution rate for the upper portion.

PHOTOLITHOGRAPHIC PATTERNING OF ELECTRONIC DEVICES

A method of patterning a device includes forming a fluorinated photopolymer layer over a device substrate. The photopolymer layer has a lower portion proximate the device substrate and an upper portion distal the device substrate. The fluorinated photopolymer layer includes a radiation-absorbing dye and a fluorinated photopolymer having a solubility-altering reactive group. The photopolymer layer is exposed to patterned radiation to form exposed and unexposed areas in accordance with the patterned radiation and a developed structure is formed by removing unexposed areas using a developing agent that includes a first fluorinated solvent. The lower portion of the exposed area of the photopolymer layer has a dissolution rate in the developing agent that is at least 5 times higher than a dissolution rate for the upper portion.

PLASTIC FILM AND A METHOD FOR MANUFACTURING SAME

The present invention relates to a plastic film and a method for manufacturing same. A plastic film, which is formed such that at least one part has a curved shape, can have high hardness, impact resistance, scratch resistance and high transparency. The plastic film is light and will not be easily damaged by external pressure and thus can substitute for the existing glass and is expected to be used for various electronic products such as a display and the like. In particular, the plastic film has at least one part in a curved shape and thereby is expected to be used for products in various shapes which cannot be manufactured by means of the existing glass. Moreover, a method for manufacturing a plastic film enables manufacturing of a plastic film having at least one part in a curved shape without curls or cracks as well as simultaneous performing of heat molding and heat curing, thereby increasing the productivity of a plastic film.