A method for the manufacture of mineral wool products is disclosed. In one example, the method comprises reacting an aqueous phenol-formaldehyde resole with free formaldehyde with a first amount of urea, thereby preparing a prereact. The prereact is contacted with a second amount of urea. The resulting mixture of prereact and second amount of urea, as part of a binder, optionally with additives is applied to the surface of mineral fibers. The binder is cured on the surface of the mineral fibers. A mineral wool product with reduced emissions of formaldehyde is also disclosed.

Provided are: a thermally curable composition which contains benzoxazine-based compounds obtained by condensing aromatic diamines, a phenol compound, and an aldehyde compound, the aromatic diamines being a mixture comprising 4,4-oxydianiline and 3,4-oxydianiline, the mass ratio of the 4,4-oxydianiline to the 3,4-oxydianiline being 50:50 to 80:20; a varnish of the thermally curable composition; and a thermally cured object.

Provided are: a thermally curable composition which contains benzoxazine-based compounds obtained by condensing aromatic diamines, a phenol compound, and an aldehyde compound, the aromatic diamines being a mixture comprising 4,4-oxydianiline and 3,4-oxydianiline, the mass ratio of the 4,4-oxydianiline to the 3,4-oxydianiline being 50:50 to 80:20; a varnish of the thermally curable composition; and a thermally cured object.

An anti-reflective hardmask composition contains: (a) an arylcarbazole derivative polymer represented by the following Chemical Formula 1 or a polymer blend containing the same; and (b) an organic solvent ##STR00001## in Chemical Formula 1, A.sub.1 and A.sub.2 are each independently a (C.sub.6-C.sub.40) aromatic aryl group and are the same as or different from each other, R is t-butyloxycarbonyl (t-BOC), ethoxyethyl, isopropyloxyethyl, or tetrahydropyranyl, X.sub.1 and X.sub.2 are each a polymerization linkage group derived from aldehyde or an aldehyde acetal monomer capable of being one-to-one polymerized with an arylcarbazole derivative and A.sub.2 in the presence of an acid catalyst, m/(m+n) is in a range of 0.05 to 0.8, and a weight average molecular weight (Mw) of an the polymer is in a range of 1,000 to 30,000.

An anti-reflective hardmask composition contains: (a) an arylcarbazole derivative polymer represented by the following Chemical Formula 1 or a polymer blend containing the same; and (b) an organic solvent ##STR00001## in Chemical Formula 1, A.sub.1 and A.sub.2 are each independently a (C.sub.6-C.sub.40) aromatic aryl group and are the same as or different from each other, R is t-butyloxycarbonyl (t-BOC), ethoxyethyl, isopropyloxyethyl, or tetrahydropyranyl, X.sub.1 and X.sub.2 are each a polymerization linkage group derived from aldehyde or an aldehyde acetal monomer capable of being one-to-one polymerized with an arylcarbazole derivative and A.sub.2 in the presence of an acid catalyst, m/(m+n) is in a range of 0.05 to 0.8, and a weight average molecular weight (Mw) of an the polymer is in a range of 1,000 to 30,000.

A method for roughening a surface of a substrate, including: applying a composition containing inorganic particles and organic resin to the surface of the substrate and drying and curing the composition to form an organic resin layer; and etching the substrate by a solution containing hydrogen fluoride, hydrogen peroxide, or an acid, to roughen the surface. Preferably, the solution contains hydrogen fluoride and ammonium fluoride or hydrogen peroxide and ammonia, the resin layer contains a ratio of the particles to the resin of 5 to 50 parts by mass to 100 parts by mass, and the composition is a mixture of silica sol wherein silica is dispersed as the inorganic particles in organic solvent or titanium oxide sol wherein titanium oxide is dispersed, with a solution of the organic resin.

A method for roughening a surface of a substrate, including: applying a composition containing inorganic particles and organic resin to the surface of the substrate and drying and curing the composition to form an organic resin layer; and etching the substrate by a solution containing hydrogen fluoride, hydrogen peroxide, or an acid, to roughen the surface. Preferably, the solution contains hydrogen fluoride and ammonium fluoride or hydrogen peroxide and ammonia, the resin layer contains a ratio of the particles to the resin of 5 to 50 parts by mass to 100 parts by mass, and the composition is a mixture of silica sol wherein silica is dispersed as the inorganic particles in organic solvent or titanium oxide sol wherein titanium oxide is dispersed, with a solution of the organic resin.

A method for roughening a surface of a substrate, including: applying a composition containing inorganic particles and organic resin to the surface of the substrate and drying and curing the composition to form an organic resin layer; and etching the substrate by a solution containing hydrogen fluoride, hydrogen peroxide, or an acid, to roughen the surface. Preferably, the solution contains hydrogen fluoride and ammonium fluoride or hydrogen peroxide and ammonia, the resin layer contains a ratio of the particles to the resin of 5 to 50 parts by mass to 100 parts by mass, and the composition is a mixture of silica sol wherein silica is dispersed as the inorganic particles in organic solvent or titanium oxide sol wherein titanium oxide is dispersed, with a solution of the organic resin.

The disclosure provides a catalyst for use with a benzoxazine resins which imparts accelerated curing at reduced temperatures. The catalyst is selected from elemental halogen or onium polyhalide compounds.

The disclosure provides a catalyst for use with a benzoxazine resins which imparts accelerated curing at reduced temperatures. The catalyst is selected from elemental halogen or onium polyhalide compounds.