C11D1/004

FLUORINATED SURFACTANT CONTAINING COMPOSITIONS

A composition includes a fluorinated or perfluorinated organic solvent, and a fluorinated surfactant of the general formula (1): [Formula should be inserted here] Rf is a perfluoroalkyl group having 1-6 carbon atoms. Each occurrence of R.sub.1 and R.sub.2 is independently H or CH.sub.3, n is 1-3, and x is 1-3.

##STR00001##

METHODS FOR DETECTING END-POINTS FOR CLEANING PROCESSES OF AEROSPACE COMPONENTS

Embodiments of the present disclosure generally relate to methods for detecting end-points of cleaning processes for aerospace components containing corrosion. The method includes exposing the aerospace component to a first solvent, exposing the aerospace component to a first water rinse, and analyzing a first aliquot of the first water rinse by absorbance spectroscopy to determine an intermediate solute concentration in the first aliquot, where the intermediate solute concentration is greater than a reference solute concentration. The method further includes exposing the aerospace component to an aqueous cleaning solution to remove corrosion from the aluminum oxide layer, exposing the aerospace component to a second solvent, and exposing the aerospace component to a second water rinse, and analyzing a second aliquot of the second water rinse by absorbance spectroscopy to determine a post-clean solute concentration in the second aliquot, where the post-clean solute concentration is less than the intermediate solute concentration.

ANTI-FOGGING AGENT
20170247639 · 2017-08-31 ·

The present invention provides anti-fogging agents and cleaners that provide long-lasting prevention of fogging of glass, plastic, or other hard surfaces. The present invention relates to an anti-fogging agent or cleaner which contains: (A) a fluorinated amphoteric or anionic surfactant; and (B) a fluorinated nonionic surfactant. The present invention also relates to an eyeglass cleaner including a non-woven fabric impregnated with the anti-fogging agent or cleaner.

ANTI-FOGGING AGENT
20170240786 · 2017-08-24 ·

The present invention provides anti-fogging agents and cleaners that provide long-lasting prevention of fogging of glass, plastic, or other hard surfaces. The present invention relates to an anti-fogging agent or cleaner which contains: (A) a fluorinated amphoteric surfactant; (B) a fluorinated anionic or cationic surfactant; and (C) a non-fluorinated amphoteric surfactant. The present invention also relates to an eyeglass cleaner including a non-woven fabric impregnated with the anti-fogging agent or cleaner.

FLUORINATED TENSIDES
20170217863 · 2017-08-03 · ·

The present invention relates to novel compounds containing fluorinated end groups, to the use thereof as surface-active substances, and to compositions comprising these compounds.

Compositions and method for floor cleaning or restoration

The present disclosure relates to compositions and methods of using the compositions for treating a floor surface. The disclosed compositions clean the floor surface, repair damage, or maintain the original look of the floor. The disclosed compositions also do not provide a permanent finish on the floor, are temporary coatings, or do not significantly change the gloss of the floor after application.

FLUORINATED AMINE OXIDE SURFACTANTS
20220040655 · 2022-02-10 ·

Compositions including one or more fluorochemical surfactants of the formula: (I) where R.sub.f is a perfluoroalkyl group, each of R.sup.1, R.sup.2 and R.sup.3 are C.sub.1-C.sub.20 alkyl, alkoxy, or aryl; and R.sup.4 is alkylene, arylene of a combination thereof. R.sup.4 is preferably an alkylene of 1-20 carbons that may be cyclic or acyclic, may optionally contain catenated or terminal heteroatoms selected from the group consisting of N, O, and S. Most preferably R.sup.4 is an alkylene of 2-10 carbon atoms. Described are anionic N-substituted fluorinated amine oxide surfactants, and use thereof in cleaning and in acid etch solutions. The cleaning and etch solutions are used with a wide variety of substrates, for example, in the cleaning and etching of silicon oxide-containing substrates.

##STR00001##

FLUORINATED SURFACTANT COMPOSITION

Disclosed is a surfactant composition in which at least one of surface tension and interfacial tension is superior, the composition including a fluorinated surfactant and a phospholipid-based surfactant, and optionally further including a sulfosuccinate-based surfactant.

Photoresist stripper

Improved stripper solutions for removing photoresists from substrates are provided that typically have freezing points below about 0° C. and high loading capacities. The stripper solutions comprise dimethyl sulfoxide, quaternary ammonium hydroxide, and an alkanolamine having at least two carbon atoms, at least one amino substituent and at least one hydroxyl substituent, the amino and hydroxyl substituents attached to two different carbon atoms. Some formulations can additionally contain a secondary solvent. The formulations do not contain tetramethylammonium hydroxide. Methods for use of the stripping solutions are additionally provided.

COMPOSITION FOR DISSOLVING ABRASIVE PARTICLES AND CLEANING METHOD USING THE SAME

A composition for dissolving abrasive particles, and a cleaning method using the composition are provided. The composition includes a sulfur-containing organic acid, a fluorine ion-containing compound, and a solvent, and a turbidity change rate (%) measured at 60° C. for 15 minutes may be in a range of −80 to −99.