Proposed is a process liquid composition for improving a lifting defect level of a photoresist pattern containing a surfactant and for reducing the number of defects of the photoresist pattern, the composition containing a surfactant and having a surface tension of 40 mN/m or less and a contact angle of 60° or smaller in the photoresist pattern having hydrophobicity represented by a contact angle of 70° or greater of water with respect to a photoresist surface in a photoresist pattern process.

Provided is a cleaning solution composition which, when cleaning the surface of a semiconductor substrate or glass substrate, does not damage SiO.sub.2, Si.sub.3N.sub.4, Si, and the like forming a layer on the substrate surface, can be used under processing conditions applicable to a brush scrub cleaning chamber equipped with a CMP apparatus, and can efficiently remove compounds derived from abrasive particles in a slurry. This cleaning solution composition for cleaning the surface of a semiconductor substrate or glass substrate contains: one or two or more fluorine atom-containing inorganic acids or salts thereof; water; one or two or more reducing agents; and one or two or more anionic surfactants, and has a hydrogen ion concentration (pH) of less than 7.

Disclosed is a surfactant mixture including: (i) 50%-99% of C1 which includes, per 100% of its weight: (a) 65%-90% of alkyl glutamate with C7-C17, and (b) 10%-35% of formula R1-C(═O)—OH; and (ii) 1%-50% of C2 which includes, per 100% of its weight: (c) 14-80% of C3, represented by R3-O-(G3)p-H where R3 represents C12-C16, G3 represents the residue of a reducing sugar, and 1.05≤p≤5, (d) 0%-3% of an alcohol R3-OH, (e) 20%-80% of C4, which is represented by R4-O-(G4)q-H where R4 represents C4-C7, G4 represents the residue of a reducing sugar and 1.05≤q≤5, and (f) 0%-3% of an alcohol R4-OH. Also disclosed are a fire-fighting foam liquid and a method for extinguishing a fire.

The present disclosure relates to compositions and methods of using the compositions for treating a floor surface. The disclosed compositions clean the floor surface, repair damage, or maintain the original look of the floor. The disclosed compositions also do not provide a permanent finish on the floor, are temporary coatings, or do not significantly change the gloss of the floor after application.

A tile system for covering a surface. The tile system comprises a first tile assembly connected to a second tile assembly by a connector. Each tile assembly comprises a first tile stacked on a second tile, the first tile and the second tile joined to a reinforcing material disposed therebetween. The connector comprises a first component and a second component that is complementary to the first component. The first component is mounted to the first tile assembly, and the second component is mounted to the second tile assembly.

The present disclosure relates to compositions and methods of using the compositions for treating a floor surface. The disclosed compositions clean the floor surface, repair damage, or maintain the original look of the floor. The disclosed compositions also do not provide a permanent finish on the floor, are temporary coatings, or do not significantly change the gloss of the floor after application.

The present invention provides anti-fogging agents and cleaners that provide long-lasting prevention of fogging of glass, plastic, or other hard surfaces. The present invention relates to an anti-fogging agent or cleaner which contains: (A) a fluorinated amphoteric or anionic surfactant; and (B) a fluorinated nonionic surfactant. The present invention also relates to an eyeglass cleaner including a non-woven fabric impregnated with the anti-fogging agent or cleaner.

The present invention provides anti-fogging agents and cleaners that provide long-lasting prevention of fogging of glass, plastic, or other hard surfaces. The present invention relates to an anti-fogging agent or cleaner which contains: (A) a fluorinated amphoteric surfactant; (B) a fluorinated anionic or cationic surfactant; and (C) a non-fluorinated amphoteric surfactant. The present invention also relates to an eyeglass cleaner including a non-woven fabric impregnated with the anti-fogging agent or cleaner.

Provided is a cleaning solution composition which, when cleaning the surface of a semiconductor substrate or glass substrate, does not damage SiO.sub.2, Si.sub.3N.sub.4, Si, and the like forming a layer on the substrate surface, can be used under processing conditions applicable to a brush scrub cleaning chamber equipped with a CMP apparatus, and can efficiently remove compounds derived from abrasive particles in a slurry. This cleaning solution composition for cleaning the surface of a semiconductor substrate or glass substrate contains: one or two or more fluorine atom-containing inorganic acids or salts thereof; water; one or two or more reducing agents; and one or two or more anionic surfactants, and has a hydrogen ion concentration (pH) of less than 7.

Hard surface, in particular glass, cleaners having an ease in wipe-out while providing good cleaning with a streak-free, glossy shine are described. The cleaner includes at least one fluorosurfactant including a fluorinated functional group with 2 to 6 carbon atoms, and a hydrophilic moiety; at least one non-fluorinated surfactant; a combination of solvents; a combination of cleaning agents; and water.