Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.

The present invention relates to new amphiphilic perfluorinated compounds and their use as a detergent for extracting membrane-proteins or synthesizing membrane-proteins in acellular system. It also relates to a method for extracting a membrane-protein from a biological sample using such compounds.

The present disclosure relates to compositions and methods of using the compositions for treating a floor surface. The disclosed compositions clean the floor surface, repair damage, or maintain the original look of the floor. The disclosed compositions also do not provide a permanent finish on the floor, are temporary coatings, or do not significantly change the gloss of the floor after application.

A composition for dissolving abrasive particles, and a cleaning method using the composition are provided. The composition includes a sulfur-containing organic acid, a fluorine ion-containing compound, and a solvent, and a turbidity change rate (%) measured at 60? C. for 15 minutes may be in a range of ?80 to ?99.

Disclosed is a surfactant composition in which at least one of surface tension and interfacial tension is superior, the composition including a fluorinated surfactant and a phospholipid-based surfactant, and optionally further including a sulfosuccinate-based surfactant.

Described is a composition comprising as primary surfactant an ionic compound comprising one or more fluoroalkyl groups and as secondary surfactant at least one non-ionic compound comprising one or more polyalkyloxy and/or polyalkylenoxy groups, for cleaning or rinsing a product, preferably a product used in the semiconductor industry, and a respective use of said composition. Further described is a method of making a cleaned or rinsed product, preferably a product used in the semiconductor industry, comprising a substrate and supported thereon a patterned material layer having line-space structures with a line width of 50 nm or below, comprising the step of cleaning or rinsing said product with the composition of the invention.

A multifunctional slick water concentrate, is obtained by W/W dispersion polymerization at elevated temperature, wherein water-soluble monomer A1, water-soluble fluorocarbon surfactant A2, water-soluble quaternary ammonium clay stabilizer A3, water-soluble dispersant A4, water-soluble free radical initiator A5, inorganic salt A6 and water A7, is first formed a homogeneous system under mechanical agitation; wherein, the percentage of the weight of each respective component, relative to the total weight of the reaction system, is as the following: water-soluble monomer A1: 5.0-20.0%; water-soluble fluorocarbon surfactant agent A2: 0.1-5.0%; water-soluble quaternary ammonium clay stabilizer A3: 0.1-20.0%; water-soluble dispersant A4: 0.1-10.0%; water-soluble radical initiator A5: 0.000001-0.100%; inorganic salt A6: 15.0-40.0%; water A7: remainder.

An oil-phase-free triple-play slick water concentration system, is characterized by first synthesizing a water-soluble dispersion polymer drag reducer A; and then preparing an inorganic salt solution B, under mechanical agitation, of high-performance water-soluble fluorocarbon surfactant and a water-soluble of high-performance small molecule or macromolecule clay stabilizer containing quaternary ammonium ions; and finally, the aqueous inorganic salt solution B is slowly added to the drag reducer dispersion A, wherein the ratio of the aqueous inorganic salt solution B and the dispersion A is 20-80:80-20.

A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %. ##STR00001##

Provided is a cleaning solution used for cleaning an ink containing a resin in an amount of 5 percent by mass or greater, the cleaning solution including a mixture solvent containing water and a solvent, wherein a hydrogen bond term of a Hansen solubility parameter of the mixture solvent is 7.0 (cal/cm.sup.3).sup.1/2 or less.