A composition includes a fluorinated or perfluorinated organic solvent, and a fluorinated surfactant of the general formula (1): [Formula should be inserted here] Rf is a perfluoroalkyl group having 1-6 carbon atoms. Each occurrence of R.sub.1 and R.sub.2 is independently H or CH.sub.3, n is 1-3, and x is 1-3. ##STR00001##

Hard surface, in particular glass, cleaners having an ease in wipe-out while providing good cleaning with a streak-free, glossy shine are described. The cleaner includes at least one fluorosurfactant including a fluorinated functional group with 2 to 6 carbon atoms, and a hydrophilic moiety; at least one non-fluorinated surfactant; a combination of solvents; a combination of cleaning agents; and water.

A multifunctional slick water concentrate, is obtained by W/W dispersion polymerization at elevated temperature, wherein water-soluble monomer A1, water-soluble fluorocarbon surfactant A2, water-soluble quaternary ammonium clay stabilizer A3, water-soluble dispersant A4, water-soluble free radical initiator A5, inorganic salt A6 and water A7, is first formed a homogeneous system under mechanical agitation; wherein, the percentage of the weight of each respective component, relative to the total weight of the reaction system, is as the following: water-soluble monomer A1: 5.0-20.0%; water-soluble fluorocarbon surfactant agent A2: 0.1-5.0%; water-soluble quaternary ammonium clay stabilizer A3: 0.1-20.0%; water-soluble dispersant A4: 0.1-10.0%; water-soluble radical initiator A5: 0.000001-0.100%; inorganic salt A6: 15.0-40.0%; water A7: remainder.

An oil-phase-free triple-play slick water concentration system, is characterized by first synthesizing a water-soluble dispersion polymer drag reducer A; and then preparing an inorganic salt solution B, under mechanical agitation, of high-performance water-soluble fluorocarbon surfactant and a water-soluble of high-performance small molecule or macromolecule clay stabilizer containing quaternary ammonium ions; and finally, the aqueous inorganic salt solution B is slowly added to the drag reducer dispersion A, wherein the ratio of the aqueous inorganic salt solution B and the dispersion A is 20-80:80-20.

A reverse emulsion-based slick water concentration system, wherein the reverse emulsion is obtained by dispersing an aqueous phase A to an oil phase B under mechanical agitation; wherein the aqueous phase A is composed of a water-soluble monomer A1, a water-soluble fluorocarbon surfactant A2, a water-soluble quaternary ammonium clay stabilizer A3 and water A4; wherein the oil phase B comprises an oil-soluble dispersant/surfactant Bi, an oil-soluble radical initiator B2 and a hydrophobic solvent B3 as a dispersing medium; wherein, the percentages of each component described above, relative to the total weight of the reaction system is as the following: water-soluble monomer A1: 5.0-30.0%; water-soluble fluorocarbon surfactant A2: 0.1-5.0%; water-soluble quaternary ammonium clay stabilizer A3: 0.1-15.0%; water A4: 5.0-35.0%; oil-soluble dispersant/surfactant B1: 0.1-5.0%; oil-soluble radical initiator B2: 0.000001-0.100%; hydrophobic solvent B3: remainder.

In a method for cleaning photo masks having patterns with smallest line-space dimensions below 200 nm, a surfactant composition A is used, wherein A contains at least three short-chain perfluorinated groups Rf selected from the group consisting of trifluoromethyl, pentafluoroethyl, 1-heptafluoropropyl, 2-heptafluoropropyl, and pentafluorosulfanyl and wherein A exhibits, at a 1% by weight aqueous solution, a static surface tension below 25 mN/m.

Anionic surfactants have a formula:
R.sub.fSO.sub.2N(H)CH.sub.2CH(CH.sub.3)OH; or
R.sub.fSO.sub.2N(H)(CH.sub.2CH.sub.2O).sub.xH, where x is an integer from 2-6. R.sub.f is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula:
R.sub.fSO.sub.2N[CH.sub.2CH(CH.sub.3)OH].sub.2;(a)
R.sub.fSO.sub.2N[CH.sub.2CH(CH.sub.3)OH][(CH.sub.2CH.sub.2O).sub.nH], where n is an integer from 1-6;(b)
R.sub.fSO.sub.2N(R)[(CH.sub.2CH.sub.2O).sub.pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or(c)
R.sub.fSO.sub.2N[(CH.sub.2CH.sub.2O).sub.qH][(CH.sub.2CH.sub.2O).sub.mH], where q is an integer from 1-6 and m is an integer from 3-6. R.sub.f is a fluoroalkyl group having 3 to 8 carbon atoms.(d)

Provided is a cleaning solution used for cleaning an ink containing a resin in an amount of 5 percent by mass or greater, the cleaning solution including a mixture solvent containing water and a solvent, wherein a hydrogen bond term of a Hansen solubility parameter of the mixture solvent is 7.0 (cal/cm.sup.3).sup.1/2 or less.

Anionic surfactants have a formula:

R.sub.fSO.sub.2N(H)CH.sub.2CH(CH.sub.3)OH; or

R.sub.fSO.sub.2N(H)(CH.sub.2CH.sub.2O).sub.xH, where x is an integer from 2-6. R.sub.f is a fluoroalkyl group having 3 to 8 carbon atoms. Neutral surfactants having a formula:

R.sub.fSO.sub.2N[CH.sub.2CH(CH.sub.3)OH].sub.2;(a)

R.sub.fSO.sub.2N[CH.sub.2CH(CH.sub.3)OH][(CH.sub.2CH.sub.2O).sub.nH], where n is an integer from 1-6;(b)

R.sub.fSO.sub.2N(R)[(CH.sub.2CH.sub.2O).sub.pH], where p is an integer from 2-6, and R is an alkyl group having 1 to 4 carbon atoms; or(c)

R.sub.fSO.sub.2N[(CH.sub.2CH.sub.2O).sub.qH][(CH.sub.2CH.sub.2O).sub.mH], where q is an integer from 1-6 and m is an integer from 3-6. R.sub.f is a fluoroalkyl group having 3 to 8 carbon atoms.(d)

Compositions and methods useful for the removal of organic substances from substrates, for example, electronic device substrates, are provided. A method is presented which uses a minimum amount of solid form concentrate that is diluted into water, introduced into a manufacturing tool and heated, applied to said substrate for a sufficient time to allow penetration and removal of an organic substance, and immediately rinsed with water to achieve complete removal. These compositions and methods are particularly suitable for removing and completely dissolving photoresists of the positive variety most commonly used in the manufacture of a flat panel display (FPD) and other electronic substrates.