The invention relates to a hand dishwashing cleaning article having a hand dishwashing cleaning composition enclosed in a water permeable pouch. The cleaning composition has a first side and a second side and includes: (a) a surfactant system; (b) filaments; and (c) water. The pouch has a first substrate adjacent to the first side of the cleaning composition and a second substrate adjacent to the second side of the cleaning composition. The first substrate preferably includes a film, preferably a multiplanar film preferably having apertures. The second substrate includes a scrim of stretchable thermoplastic material laminated to an elastic polymeric film with openings for releasing the cleaning composition from the cleaning article.

The present invention relates to a process for reducing malodors on fabrics using a detergent composition containing a polyalkyleneamine and use of the polyalkyleneamine in the process.

In a method of cleaning a substrate, a solution including a size-modification material is applied on a substrate, on which particles to be removed are disposed. Size-modified particles having larger size than the particles are generated, from the particles and the size-modification material. The size-modified particles are removed from the substrate.

Described herein, are cleansing bar compositions comprising at least one cleanser chosen from soap and surfactant; taurine, in free or salt form; and at least one polymer. Methods of making using the cleansing bar compositions are also described.

An objective of the present invention is to provide a means for sufficiently removing residues remaining on a surface of a polished object to be polished. A composition for surface treatment containing a polymer compound having at least one ionic functional group selected from the group consisting of a sulfonic acid (salt) group, a phosphoric acid (salt) group, a phosphoric acid (salt) group, and an amino group, and water, in which pH is less than 7, and the polymer compound has a pKa of 3 or less and an ionic functional group density of more than 10%.

Provided are a cleaning agent and a preparation method and the use thereof. The cleaning agent is prepared from the following raw materials comprising the following mass fraction of components: 0.5%-20% of an oxidant containing iodine, 0.5%-20% of an etchant containing boron, 1%-50% of a pyrrolidinone solvent, 1%-20% of a corrosion inhibitor, 0.01%-5% of a metal ion-free surfactant, and water, with the sum of the mass fraction of each component being 100%, the pH of the cleaning agent is 7.5-13.5, and the corrosion inhibitor is one or more of a benzotriazole corrosion inhibitor, a hydrazone corrosion inhibitor, a carbazone corrosion inhibitor and a thiocarbohydrazone corrosion inhibitor. The cleaning agent can efficiently remove nitrides from hard mask residues with little effects on metals and low-K dielectric materials, and has a good selectivity.

A removal composition and process for cleaning post-chemical mechanical polishing (CMP) contaminants and particles from a microelectronic device having said particles and contaminants thereon. The removal compositions include at least one at least one organic additive; at least one metal chelating agent; and at least one polyelectrolyte. The composition achieves highly efficacious removal of the particles and CMP contaminant material from the surface of the microelectronic device without compromising the low-k dielectric, silicon nitride, and metal containing layers such as tungsten-containing layers.

An improved cleaning composition in block form is described. The composition addresses the consumer issues of having a clear product that remains clear through the life of the product and also has favorable handling properties such as a high melting point and increased hardness. The improvements are the result of three essential ingredients of particular block copolymer nonionic surfactants, alkanecarboxylic salts, and particular solvents at restricted proportions in the overall composition that are molded into a cleaning composition in block form that exhibits a high melting point, hardness and high optical transmittance.

To provide a means capable of sufficiently removing organic residues present on the surface of a polishing object after polishing containing silicon oxide or polysilicon.

A surface treatment composition contains a polymer having a constituent unit represented by Formula (1) below and water and is used for treating the surface of a polishing object after polishing,

##STR00001## in which, in Formula (1) above, R.sup.1 is a hydrocarbon group having 1 to 5 carbon atoms and R.sup.2 is a hydrogen atom or a hydrocarbon group having 1 to 3 carbon atoms.

The need for a liquid detergent composition for washing dishes which provides effective removal of both crystalline and polymerised grease, while requiring less time and effort to clean and rinse the dishes, is met when the composition is formulated with a surfactant system having an anionic surfactant, a co-surfactant, and an esteramine.