A cleaning composition comprises at least one surfactant and at least one colorant. The cleaning composition can have a pH of about 3 or less. The colorant exhibits one of several specified structures at a pH of about 7. A method for cleaning a surface utilizes the cleaning composition.

The present invention relates generally to cleaning compositions and, more specifically, to cleaning compositions containing a polyetheramine that is suitable for removal of stains from soiled materials.

The present invention relates generally to cleaning compositions and, more specifically, to cleaning compositions containing a polyetheramine that is suitable for removal of stains from soiled materials.

A resist removal method includes removing a resist provided on a photomask substrate by bringing a resist removing liquid into contact with the resist in patterning of a photomask for EUV lithography in which the resist removing liquid contains an alkali compound, a specific nitrogen-containing compound, and water, and a content of the water is more than 50% by mass.

A resist removal method includes removing a resist provided on a photomask substrate by bringing a resist removing liquid into contact with the resist in patterning of a photomask for EUV lithography in which the resist removing liquid contains an alkali compound, a specific nitrogen-containing compound, and water, and a content of the water is more than 50% by mass.

Suggested is a detergent composition, comprising or consisting of: (a) at least one surfactant and (b) at least one 1,2 alkanediol having 5 to 14 carbon atoms.

Suggested is a detergent composition, comprising or consisting of: (a) at least one surfactant and (b) at least one 1,2 alkanediol having 5 to 14 carbon atoms.

A fabric softener composition for liquid carbon dioxide-based cleaning includes: an organic solvent expressed as chemical formula 1, and a cationic surfactant, where the chemical formula 1 is R1-O(CO)OR2, and R1 and R2 are hydrogen (H) or an alkyl group having 1 to 4 carbon atoms.

A fabric softener composition for liquid carbon dioxide-based cleaning includes: an organic solvent expressed as chemical formula 1, and a cationic surfactant, where the chemical formula 1 is R1-O(CO)OR2, and R1 and R2 are hydrogen (H) or an alkyl group having 1 to 4 carbon atoms.

The invention relates to compositions, methods of manufacture, and methods for reducing metal corrosion during alkaline cleaning. In particular, the method employs a hydroxyphosphono carboxylic acid in alkaline cleaning of hard surfaces.