There is provided a stress reducing method comprising: preparing a film forming apparatus configured to form a tungsten film on a substrate in a chamber by supplying a tungsten raw material gas and a reducing gas into the chamber; and making at least a part of a tungsten film deposited on an in-chamber component into a chlorine-containing tungsten film whose film stress is reduced by adjusting a chlorine concentration, when performing precoating in the chamber and/or when forming the tungsten film on the substrate, using the tungsten raw material gas and the reducing gas.

A ruthenium film forming method includes: causing chlorine to be adsorbed to an upper portion of a recess at a higher density than to a lower portion of the recess by supplying a chlorine-containing gas to a substrate including an insulating film and having the recess; and forming a ruthenium film in the recess by supplying a Ru-containing precursor to the recess to which the chlorine is adsorbed.

A metal coated polymer membrane, a method for the production thereof, an electrofiltration device, or an electrosorption device, and a method of electrofiltration and electrosorption using a metal coated polymer membrane. The polymer membrane is coated with metal using Atomic Layer Deposition (ALD).

A metal coated polymer membrane, a method for the production thereof, an electrofiltration device, or an electrosorption device, and a method of electrofiltration and electrosorption using a metal coated polymer membrane. The polymer membrane is coated with metal using Atomic Layer Deposition (ALD).

An article and a method of manufacturing the article is disclosed. The method includes providing the article including a substrate and a coating at least partially disposed on the substrate. The coating includes an outer surface. The coating further includes platinum and chromium. The method further includes applying cold work to the outer surface of the coating to produce a cold-worked layer extending from the outer surface of the coating to a cold work depth. The cold-worked layer includes approximately 45% cold work. The cold work depth is between about 30 microns to about 150 microns from the outer surface of the coating.

A method of forming a ruthenium film on a surface of a substrate in order to embed ruthenium in a recess formed in the surface of the substrate includes depositing ruthenium by supplying a ruthenium raw material gas to the substrate under a preset first pressure, and depositing the ruthenium by supplying the ruthenium raw material gas to the substrate under a preset second pressure, which is lower than the first pressure. The ruthenium film is formed by alternately repeating the depositing the ruthenium under the first pressure and the depositing the ruthenium under the second pressure.

An optical probe for a bio-sensor selectively conjugated to a target analyte and configured to retro-reflect incident light thereto is disclosed. The optical probe for the bio-sensor includes: a transparent core particle; a total-reflection inducing layer covering a portion of a surface of the core particle, the inducing layer is made of a material having a refractive index lower than a refractive index of the core; a modifying layer formed on the total-reflection inducing layer; and an analyte-sensing substance bound to the modifying layer, the sensing substance is selectively conjugated to the target analyte. This optical probe may serve as an excellent optical probe for both a non-spectral light source and a spectral light source.

A manufacturing method is provided. During this method, a preform component is provided for a turbine engine. The preform component includes a substrate. A meter section of a cooling aperture is formed in the substrate. An internal coating is applied onto a surface of the meter section. An external coating is applied over the substrate. A diffuser section of the cooling aperture is formed in the external coating and the substrate to provide the cooling aperture.

A film forming method includes: (a) preparing a substrate having an oxide layer formed on the substrate; (b) supplying a nitrogen-containing gas to the substrate heated by a heater; and (c) forming a molybdenum film on the oxide layer by alternately supplying a raw material gas containing molybdenum and a reducing gas a plurality of times.

The present disclosure relates to coated non-metallic substrates and coated metallic substrates, and methods for producing such coated substrates. A variant of the method is characterized in that a mat or glossy coating is underneath a metallic layer obtained in some cases by way of vapor deposition and/or sputtering. In another variant, the metallic is sufficiently thin so that it remains transparent or translucent to visible light. The coated substrates may include multiple layers such as metallic layers, polysiloxane layers, a color layer, a conversion layer, a primer layer, and/or a transparent or colored layer. An application system for applying a metallic layer to at least one surface of a substrate may include a plasma generator and/or a corona system for treating one or more layers by plasma treatment and/or corona treatment.