According to one embodiment, an electroplating method includes, arranging an anode having passages through which a plating solution flows and a cathode to face each other via a resist mask, in a reaction section storing the plating solution, and setting a potential of the cathode to a negative potential to the anode, to form a metal plated film on the surface of the cathode.

According to the invention an electrochemical deposition or polishing clamber including: a support for a substrate, the support having an in-use position; a housing having an interior surface and a fluid outlet pathway for removing an electrolyte from the chamber, wherein the fluid outlet pathway includes one or more slots which extend into the housing from at least one slotted opening formed in the interior surface; a seal for sealing the housing to a peripheral portion of a surface of a substrate position on the support in its in-use position; and a tilting mechanism for tilting the chamber in order to assist in removing electrolyte from the housing through the fluid outlet pathway.

According to the invention an electrochemical deposition or polishing clamber including: a support for a substrate, the support having an in-use position; a housing having an interior surface and a fluid outlet pathway for removing an electrolyte from the chamber, wherein the fluid outlet pathway includes one or more slots which extend into the housing from at least one slotted opening formed in the interior surface; a seal for sealing the housing to a peripheral portion of a surface of a substrate position on the support in its in-use position; and a tilting mechanism for tilting the chamber in order to assist in removing electrolyte from the housing through the fluid outlet pathway.

A method of controlling chemical concentration in electrolyte includes measuring the chemical concentration in the electrolyte in a tank, wherein an end of an exhaust pipe is connected to a top of the tank; determining, by a valve moved along a top surface of the tank, a vapor flux through the exhaust pipe based on the measured chemical concentration; rotating, by using a motor connected to a ball screw connected to the valve, the ball screw to move a gate of the valve based on the determined vapor flux; electroplating, using the electrolyte provided by the tank, wafers respectively in a plurality of electroplating cells that are connected to the tank; and recycling the electrolyte to the tank.

A method of controlling chemical concentration in electrolyte includes measuring the chemical concentration in the electrolyte in a tank, wherein an end of an exhaust pipe is connected to a top of the tank; determining, by a valve moved along a top surface of the tank, a vapor flux through the exhaust pipe based on the measured chemical concentration; rotating, by using a motor connected to a ball screw connected to the valve, the ball screw to move a gate of the valve based on the determined vapor flux; electroplating, using the electrolyte provided by the tank, wafers respectively in a plurality of electroplating cells that are connected to the tank; and recycling the electrolyte to the tank.

An electrochemical cell that allows for in-situ structural characterization of amorphous thin film materials during the course of electrolysis using high-energy X-ray scattering (>50 keV). The compact and versatile cell, fabricated using a 3D printer, employs a three-electrode configuration and minimizes X-ray scattering contributions from the cell, reference and counter electrodes, as well as the working electrode support. A large surface area working electrode has a physically robust support and is largely transparent to X-rays. This design, which utilizes a three-dimensional working electrode, also greatly improves the intensity and quality of the scattered signal compared to a two-dimensional working electrode. The in-situ cell can be used not only to investigate structural evolution during electrolysis using X-ray scattering (e.g. pair distribution function), but also to perform electrochemical potential-dependent structural analysis by extended X-ray absorption fine structure. The in-situ electrochemical cell opens new opportunity to characterize amorphous thin films thinner than 70 nm.

The invention relates to a combined electrolytic system for precipitating different types of metals (copper, zinc, nickel, cadmium, cobalt, silver, gold) and regenerating reagents for the leaching of metal sulphurs from solutions from leaching in a sulphuric-oxidising or hydrochloric-oxidising environment, including a process that permits the combining of the current reduction processes followed by oxidising processes which are complex and potentially dangerous from an environmental point of view, thereby preventing the risky transportation of dangerous substances, loading and unloading operations, storage and manipulation of toxic materials, and reducing the environmentally contaminating waste, producing a commercial-quality cathodic product and a solution that is re-used in the leaching process. The system comprises a membrane cell device (3) that is connected via ducts and valves to one or more oxidising agent tanks (7), to one or more anodic solution tanks (6) and to one or more cathodic solution tanks (2), wherein said membrane device (3) is formed by one or more cathodic compartments (4) and by one or more anode compartments (5), wherein each of the cathodic compartment(s) (4) is/are separated from each of the anode compartment(s) (5) by a membrane for selective and uni-directional ion exchange.

Method and plant for continuous chrome plating of metal bars, tubular elements and similar, wherein the bar to be chromed is made move forward fastly in a device of chrome plating without of tank of chrome plating including a plurality of anodic cells of chrome plating with tubular-torx shape, into which an electrolytic solution flows with high density of current, for forming on the bar a multi-layer chromium plating while the bar moves forward through the anodes-cells themselves, and wherein the device is characterized in feeding the electrolytic solution with a flow axially distributed and with a circulation of the electrolyte in a turbulent flow, controlled through the anode of chrome plating, said plant including furthermore many cooling stations of the bar by a jet of liquid with cryoscopic thermal step, the sealing of the bath is guaranteed by gaskets in plastic material which are reinforced by armonic steel springs.

Method and plant for continuous chrome plating of metal bars, tubular elements and similar, wherein the bar to be chromed is made move forward fastly in a device of chrome plating without of tank of chrome plating including a plurality of anodic cells of chrome plating with tubular-torx shape, into which an electrolytic solution flows with high density of current, for forming on the bar a multi-layer chromium plating while the bar moves forward through the anodes-cells themselves, and wherein the device is characterized in feeding the electrolytic solution with a flow axially distributed and with a circulation of the electrolyte in a turbulent flow, controlled through the anode of chrome plating, said plant including furthermore many cooling stations of the bar by a jet of liquid with cryoscopic thermal step, the sealing of the bath is guaranteed by gaskets in plastic material which are reinforced by armonic steel springs.

The disclosure provides a method comprising inducing a first current between a source of a countercharge and a first electrode, the first current being through an electrolyte. In some instances, the first current is not present. A second current, in the form of waveform, is induced across the first electrode, the second current being transverse to the first current, and the second current inducing a relativistic charge across the first electrode. Metal from the electrolyte is deposited on the substrate or corroded from the substrate, among other things. The methods, as well as associated apparatus, improve deposition, bonding, corrosion, and other effects.