C04B41/91

Ceramic wafer and the manufacturing method thereof

A method of producing ceramic wafer includes a forming step and processing step. The processing step includes forming positioning notch or positioning, flat edge and edge profile, which avoids the ceramic wafers to have processing defect during cutting, grinding, and polishing, for increasing yield. The ceramic particles for producing ceramic wafer include nitride ceramic powder, oxide ceramic powder, and nitride ceramic powder. The ceramic wafer has low dielectric constant, insulation, and excellent heat dissipation, which can be applied for the need of semiconductor process, producing electric product and semiconductor equipment.

SURFACE ROUGHENING OF CMC AND COATED CMC

By surface roughening of CMC component via a pico-laser treatment a good adhering of a plasma sprayed coating is achieved.

SURFACE ROUGHENING OF CMC AND COATED CMC

By surface roughening of CMC component via a pico-laser treatment a good adhering of a plasma sprayed coating is achieved.

YTTRIA-SENSITIZED ZIRCONIA

A housing for a portable electronic device is disclosed. The housing is composed of yttria-sensitized zirconia. Yttria-sensitized zirconia has from about 1.5 to about 2.5 mole percent yttria, and more typically about 2 mole percent yttria, and most typically 2 mole percent yttria, in zirconia. Yttria-sensitized zirconia is both tough and able to limit the formation and propagation of micro-cracks. Methods for manufacturing yttria-sensitized zirconia composed housings are also disclosed.

YTTRIA-SENSITIZED ZIRCONIA

A housing for a portable electronic device is disclosed. The housing is composed of yttria-sensitized zirconia. Yttria-sensitized zirconia has from about 1.5 to about 2.5 mole percent yttria, and more typically about 2 mole percent yttria, and most typically 2 mole percent yttria, in zirconia. Yttria-sensitized zirconia is both tough and able to limit the formation and propagation of micro-cracks. Methods for manufacturing yttria-sensitized zirconia composed housings are also disclosed.

SURFACE TREATMENT METHOD OF MATERIAL, MATERIAL PRODUCT AND COMPOSITE MATERIAL
20190351594 · 2019-11-21 ·

A surface treatment method of a material, comprising: respectively immersing a material to be treated into a first inorganic acid solution and a fluoride acidic solution to perform surface etching, so that nano-sized holes are formed in the surface of the material to be treated. Further disclosed are a material product and a composite material.

SURFACE TREATMENT METHOD OF MATERIAL, MATERIAL PRODUCT AND COMPOSITE MATERIAL
20190351594 · 2019-11-21 ·

A surface treatment method of a material, comprising: respectively immersing a material to be treated into a first inorganic acid solution and a fluoride acidic solution to perform surface etching, so that nano-sized holes are formed in the surface of the material to be treated. Further disclosed are a material product and a composite material.

Method for manufacturing active metal-brazed nitride ceramic substrate with excellent joining strength
11964919 · 2024-04-23 · ·

A method for manufacturing active metal-brazed a nitride ceramics substrate having excellent joining strength, includes: a step of preparing a mixed raw material; a step of forming a green sheet of the mixed raw material by a tape casting method; a step of removing a binder by performing degreasing; a step of performing sintering; a step of forming an aluminum nitride sintered substrate by performing gradual cooling; and a step of printing a conductive wiring pattern with active metal paste on the aluminum nitride sintered substrate.

Method for applying a coating to a surface of a mullite material, mullite material having a coating, and gas turbine component

A method for applying a coating 1 to a surface 2 of a mullite material 3 is specified, which comprises pretreating the surface 2 of the mullite material 3 by means of a plasma-chemical process in which molecular hydrogen is excited in such a way that plasma-activated hydrogen is produced S1, and applying an aluminum oxide-containing layer 4 by means of a PVD process to the pretreated surface 2 of the mullite material 3 S2. Furthermore, a mullite material 3 with a coating and a gas turbine component with such a mullite material 3 are specified.

Method for applying a coating to a surface of a mullite material, mullite material having a coating, and gas turbine component

A method for applying a coating 1 to a surface 2 of a mullite material 3 is specified, which comprises pretreating the surface 2 of the mullite material 3 by means of a plasma-chemical process in which molecular hydrogen is excited in such a way that plasma-activated hydrogen is produced S1, and applying an aluminum oxide-containing layer 4 by means of a PVD process to the pretreated surface 2 of the mullite material 3 S2. Furthermore, a mullite material 3 with a coating and a gas turbine component with such a mullite material 3 are specified.