A process for producing branched aldehyde intermediates from alpha olefins, and further reacting said branched aldehyde intermediates via hydrogenation reactions, surfactant forming reactions and other chemical derivative forming reactions to produce branched alcohols, branched surfactants and other branched derivatives.

A process for producing isomerized olefins, branched aldehydes, branched alcohols, branched surfactants and other branched derivatives through isomerization, hydroformylation, hydrogenation, surfactant forming reactions and other derivative forming reactions.

A sulfuric acid ester containing a plurality of carbonyl groups or a salt thereof, and a surfactant. The sulfuric acid ester is a compound represented by the following formula:

R.sup.1—C(═O)—R.sup.2—C(═O)—R.sup.3—OSO.sub.3X

wherein R.sup.1, R.sup.2 and R.sup.3 are defined herein; X is H, a metal atom, NR.sup.4.sub.4, imidazolium optionally containing a substituent, pyridinium optionally containing a substituent, or phosphonium optionally containing a substituent, where R.sup.4s are each H or an organic group and are the same as or different from each other; and any two of R.sup.1, R.sup.2, and R.sup.3 optionally bind to each other to form a ring. Also disclosed is a surfactant containing the sulfuric acid ester and an aqueous dispersant containing the sulfuric acid ester.

A sulfuric acid ester containing a plurality of carbonyl groups or a salt thereof, and a surfactant. The sulfuric acid ester is a compound represented by the following formula:

R.sup.1—C(═O)—R.sup.2—C(═O)—R.sup.3—OSO.sub.3X

wherein R.sup.1, R.sup.2 and R.sup.3 are defined herein; X is H, a metal atom, NR.sup.4.sub.4, imidazolium optionally containing a substituent, pyridinium optionally containing a substituent, or phosphonium optionally containing a substituent, where R.sup.4s are each H or an organic group and are the same as or different from each other; and any two of R.sup.1, R.sup.2, and R.sup.3 optionally bind to each other to form a ring. Also disclosed is a surfactant containing the sulfuric acid ester and an aqueous dispersant containing the sulfuric acid ester.

Provided herein are solid forms comprising (a) 4-amino-2-(2,6-dioxopiperidine-3-yl)isoindoline-1,3-dione and (b) a coformer. Pharmaceutical compositions comprising the solid forms (e.g., cocrystals) and methods for treating, preventing and managing various disorders are also disclosed.

Provided herein are solid forms comprising (a) 4-amino-2-(2,6-dioxopiperidine-3-yl)isoindoline-1,3-dione and (b) a coformer. Pharmaceutical compositions comprising the solid forms (e.g., cocrystals) and methods for treating, preventing and managing various disorders are also disclosed.

Ethylbenzyl chloride quats (EB quats) and their related salts. The synthesis of EB quats requires minimal capital requirements, produces products in good yields, without difficult to dispose of waste and in a cost-effective manner. The preferred embodiment of the invention is to perform a condensation reaction of a linear or branched, saturated or unsaturated fatty acid, of between 2 and 22 carbons with an amine that has either a primary amine and tertiary amine or a secondary amine and tertiary amine. An example is dimethylaminopropylamine (DMAPA). The amido amine that results from the condensation reaction described is then reacted with ethyl benzyl chloride (EBC) to produce the desired EB quat. Additional processing, such as ion exchange can be performed to eliminate the chlorine or substitute it for another anionic species, organic or inorganic.

Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.

Provided are a novel water-soluble diacetylene monomer, a composition for photolithography including the novel water-soluble diacetylene monomer and a conductive polymer, and a method of forming micropatterns using the composition. The water-soluble diacetylene monomer may not aggregate even when mixed with a water-soluble conductive polymer. Accordingly, a uniform composition for photolithography can be prepared by mixing a water-soluble conductive polymer with the diacetylene monomer, and micropatterns can be formed using the composition. More particularly, when the composition is formed into a thin film and then is irradiated with light, only light-irradiated portions of the diacetylene monomer are selectively crosslinked due to photopolymerization, thereby resulting in insoluble negative-type micropatterns.

A sulfuric acid ester containing a plurality of carbonyl groups or a salt thereof, and a surfactant. The sulfuric acid ester is a compound represented by the following formula:
R.sup.1—C(═O)—R.sup.2—C(═O)—R.sup.3—OSO.sub.3X wherein R.sup.1, R.sup.2 and R.sup.3 are as defined herein; X is H, a metal atom, NR.sup.4.sub.4, imidazolium optionally containing a substituent, pyridinium optionally containing a substituent, or phosphonium optionally containing a substituent, where R.sup.4s are each H or an organic group and are the same as or different from each other; and any two of R.sup.1, R.sup.2, and R.sup.3 optionally bind to each other to form a ring.

A sulfuric acid ester containing a plurality of carbonyl groups or a salt thereof, and a surfactant. The sulfuric acid ester is a compound represented by the following formula:
R.sup.1—C(═O)—R.sup.2—C(═O)—R.sup.3—OSO.sub.3X wherein R.sup.1, R.sup.2 and R.sup.3 are as defined herein; X is H, a metal atom, NR.sup.4.sub.4, imidazolium optionally containing a substituent, pyridinium optionally containing a substituent, or phosphonium optionally containing a substituent, where R.sup.4s are each H or an organic group and are the same as or different from each other; and any two of R.sup.1, R.sup.2, and R.sup.3 optionally bind to each other to form a ring.