Patent classifications
C07F7/025
Organosilane precursors for ALD/CVD silicon-containing film applications
Disclosed are Si-containing thin film forming precursors, methods of synthesizing the same, and methods of using the same to deposit silicon-containing films using vapor deposition processes for manufacturing semiconductors, photovoltaics, LCD-TFT, flat panel-type devices, refractory materials, or aeronautics.
PREPARATION OF NOVEL FLUOROCOMPOUNDS, METHODS OF PREPARATION AND COMPOSITIONS MADE THEREFROM
Novel fluorinated compounds, their method of preparation and use are disclosed, as well as the incorporation of new and old fluorinated compounds in controlled radical polymerization processes to efficiently produce polymer compositions with unique and enhanced properties. Various cure mechanisms and types of end-uses are disclosed.
Synthesis of 1,1,1-trichlorodisilane
A method of making a trihalodisilane, the method comprising: combining a reductive effective amount of an alkylaluminum hydride, a halodisilane comprising at least 4 halogen atoms, and a solvent at a temperature <80 C. and reducing the halodisilane to form a reaction product mixture comprising a trihalodisilane and an alkylaluminum halide.
Visibly Transparent, Near-Infrared-Absorbing Photovoltaic Devices
Visibly transparent photovoltaic devices are disclosed, such as those are transparent to visible light but absorb near-infrared light and/or ultraviolet light. The photovoltaic devices make use of transparent electrodes and near-infrared absorbing visibly transparent photoactive compounds, optical materials, and/or buffer materials.
Composition, photoelectric conversion element, and imaging device
A composition contains a naphthalocyanine derivative represented by the following formula: ##STR00001## where R.sub.1 to R.sub.8 are independently an alkyl group and R.sub.9 to R.sub.12 are independently an aryl group, and at least one hydrogen atom in at least one selected from the group consisting of R.sub.9, R.sub.10, R.sub.11, and R.sub.12 is substituted by an electron-withdrawing group.
PRECURSORS FOR SELECTIVE DEPOSITION OF SILICON-CONTAINING FILMS
Precursors for selective deposition of silicon-containing films are provided. A precursor comprises a compound of the formula: R(HO)Si(OR.sup.1)(OR.sup.2), where: R is or comprises an alkyl, an alkenyl, or an alkoxy; and R.sup.1 and R.sup.2 are independently a hydrogen, an alkoxyl, or R.sup.1 and R.sup.2 are bonded to form a heterocycle. Devices comprising silicon-containing films are also provided, wherein the silicon-containing film comprises a reaction product of the precursor and another reactive species. Methods of depositing silicon-containing films are also provided, among other things.
Reducing Aluminosilicate Scale in the Bayer Process
The invention provides a method of inhibiting the accumulation of DSP scale in the liquor circuit of Bayer process equipment. The method includes adding one or more particular silane based small molecules to the liquor fluid circuit. These scale inhibitors reduce DSP scale formation and thereby increase fluid throughput, increase the amount of time Bayer process equipment can be operational and reduce the need for expensive and dangerous acid washes of Bayer process equipment. As a result, the invention provides a significant reduction in the total cost of operating a Bayer process.
METHODS AND COMPOSITIONS FOR PREPARING SILICA AEROGELS
Cross-linked sol-gel like materials and cross-linked aerogels, as well as methods for making such cross-linked sol-gel like materials and cross-linked aerogels are described.
Metabotropic Glutamate Receptor Positive Allosteric Modulators (PAMS) and Uses Thereof
Provided herein are small molecule active metabotropic glutamate subtype-2 and -3 receptor positive allosteric modulators (PAMS), compositions comprising the compounds, and methods of using the compounds and compositions comprising the compounds.
Use of Chlorine-Free Catalyst in the Preparation of Diisopropylaminosilane
The present invention discloses the use of a chlorine-free catalyst in the preparation of diisopropylaminosilane. The chlorine-free catalyst comprises calcium bis(hexamethyldisilazide) and/or strontium bis(hexamethyldisilazide) and diisopropylaminosilane is prepared by a dehydrogenative coupling reaction of monosilane with diisopropylamine catalyzed by a chlorine-free catalyst. The present invention uses a low-cost chlorine-free compound, calcium bis(hexamethyldisilazide) and/or strontium bis(hexamethyldisilazide), as a new catalyst to prepare diisopropylaminosilane, which can effectively catalyze the dehydrogenative coupling reaction of monosilane and diisopropylamine to synthesize diisopropylaminosilane in one step in a yield of 40-65% for diisopropylaminosilane.