Provided are a novel organostannyl silicate compound, a method for preparing the same, a photoresist composition including the organostannyl silicate compound according to the present disclosure, and a method for forming a photoresist pattern using the composition. The organostannyl silicate compound of the present disclosure is industrially very useful, since the compound may implement a photoresist composition having excellent light sensitivity and etching resistance and a high-quality semiconductor device may be manufactured using the composition.

Provided is a photoresist composition including an organometallic compound including: a central metal; a first ligand compound; and a second ligand compound, wherein the first ligand compound bonds with the central metal, the second ligand compound does not bond with the central metal, and the first or second ligand compound includes a halogen element. The photoresist composition may improve photosensitivity while securing stability.

The invention relates to a new dialkyl tin oxide catalyst composition and its use for the synthesis of amino alkyl (meth)acrylates by transesterification from an alkyl (meth)acrylates and an amino alcohol, and especially 2-dimethylaminoethyl (meth)acrylate. The invention also relates to polymers made with quaternized amino alkyl (meth)acrylates and use of said polymers in water treatment, sludge dewatering, papermaking process, agriculture, cosmetic and detergency composition, textile process, oil and gas recovery process such as enhanced oil recovery, fracturing, mining operation such as tailings treatment.

Methods of forming a metal film having a metal halide with a reducing agent are disclosed. The reducing agent, the reducing agent includes a group IV element containing heterocyclic compound, a radical initiator, an alkly alane, a diborene species and/or a Sn(II) compound.

As described herein, photosensitive composition comprises RSnL.sub.3, where R is a hydrocarbyl ligand with 1-20 carbon atoms and one or more silicon and/or germanium heteroatoms and L is an acetylide ligand (C?CA, where A is a silyl group with 0 to 6 carbon atoms or an organo group with 1 to 10 carbon atoms). Methods are described wherein photosensitive compositions are synthesized by reacting RX, where X is a halide, and MSnL.sub.3, where M is an alkali metal, alkali earth metal or a pseudo-alkali earth metal, L is an acetylide or a dialkylamide. The radiation sensitive compositions are effective for radiation based patterning, such as with EUV light.

The present disclosure relates to a semiconductor photoresist composition including an organometallic compound represented by Chemical Formula 1 and a solvent, and a method of forming patterns by using the semiconductor photoresist composition.

Provided are a paper coating material having environment-friendly, water-proof, and oil-proof properties, and a method of manufacturing the same. The paper coating material includes a copolymer emulsion in which a silicon-based polymer and an acryl-based polymer are copolymerized, the copolymer emulsion having the weight average molecular weight of 100,000 to 200,000, and a colloidal aqueous solution of gelatinized polyvinyl alcohol to be mixed with the copolymer emulsion. The environment-friendly paper coated with the environment-friendly coating material according to the present invention is excellent in water-proof, oil-proof and heat sealing properties, harmless to the human body when used for packaging food, and recyclable as a raw material for making paper. It is also biodegradable and therefore, environment-friendly.

A stannous methanesulfonate solution for tin electroplating applications and a method of forming the same are disclosed. The solution has an elevated pH. The solution also has a sufficient tin concentration for electroplating applications.

Patterning compositions are described based on organo tin dodecamers with hydrocarbyl ligands, oxo ligands, hydroxo ligands and carboxylato ligands. Alternative dodecamer embodiments have organo tin ligands in place of hydrocarbyl ligands. The organo tin ligands can be incorporated into the dodecamers from a monomer with the structure (RCC).sub.3SnQ, where R is a hydrocarbyl group and Q is a alkyl tin moiety with a carbon bonded to the Sn atom of the monomer and with a Sn bonded as a replacement of a quaternary carbon atom with bonds to 4 carbon atoms. Some or all of the carboxylato and hydroxyl ligands can be replaced with fluoride ions. Good EUV patterning results are obtained with the dodecamer based patterning compositions.

Monoorgano tin trialkoxide compounds having chemical formula RSn(OR).sub.3 and containing less than about 5 mol % diorgano tin dialkoxide are described. R is a linear or branched, optionally fluorinated, unsaturated hydrocarbon group having about 2 to about 20 carbon atoms and each R is independently a linear or branched, optionally fluorinated, alkyl group having about 1 to about 10 carbon atoms. Methods for synthesizing and purifying these compounds are also provided. The monoorgano tin compounds may be used for the formation of high-resolution EUV lithography patterning precursors and are attractive due to their high purity and minimal concentration of diorgano tin impurities.