A resin composition is provided and contains a maleimide compound, a polyphenylene ether compound having an unsaturated double bond in the molecule, a phosphorus-containing compound having a group represented by the following Formula (1) and a group containing a phosphorus atom in the molecule, and a curing agent.

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In Formula (1), R.sub.1 represents a hydrogen atom or an alkyl group.

A thermosetting composition comprising the following component (A) and component (B), and having a viscosity of 0.1 Pa.Math.s or higher and 100 Pa.Math.s or lower at a shear rate of 10 s.sup.−1 at 25° C. measured in accordance with JIS K7117-2. (A) polybutadiene having a structural unit represented by the following formula (1A) and a structural unit represented by the following formula (1B), wherein the terminal group comprises a methacryloyl group or an acryloyl group (B) a thermal polymerization initiator

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A thermosetting composition comprising the following component (A) and component (B), and having a viscosity of 0.1 Pa.Math.s or higher and 100 Pa.Math.s or lower at a shear rate of 10 s.sup.−1 at 25° C. measured in accordance with JIS K7117-2. (A) polybutadiene having a structural unit represented by the following formula (1A) and a structural unit represented by the following formula (1B), wherein the terminal group comprises a methacryloyl group or an acryloyl group (B) a thermal polymerization initiator

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Presently described are energy-curable resins, compositions, thermosets, coatings, and methods thereof. The curable resins described herein are (meth)acrylated resins derived from distilled tall oil rosin acids, distilled tall oil fatty acids, or a combination thereof. The curable resins can also include derivatives from rosin acids and/or fatty acids, such as cycloaddition products. The curable compositions undergo fast curing using UV and/or EB and provide enhanced performance of coatings, films, and printing inks, especially adhesion, stability and flexibility.

Presently described are energy-curable resins, compositions, thermosets, coatings, and methods thereof. The curable resins described herein are (meth)acrylated resins derived from distilled tall oil rosin acids, distilled tall oil fatty acids, or a combination thereof. The curable resins can also include derivatives from rosin acids and/or fatty acids, such as cycloaddition products. The curable compositions undergo fast curing using UV and/or EB and provide enhanced performance of coatings, films, and printing inks, especially adhesion, stability and flexibility.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

The present invention relates to a structure for a quantum dot barrier rib and a process for preparing the same. The structure for a quantum dot barrier rib of the present invention comprises a cured film having a uniform film thickness and an appropriate range of film thickness. Here, the reflectance R.sub.SCI measured by the SCI (specular component included) method and the reflectance R.sub.SCE measured by the SCE (specular component excluded) method are reduced, and the ratio between them (R.sub.SCE/R.sub.SCI) is appropriately adjusted, so that it is possible to satisfy such characteristics as high light-shielding property and low reflectance at the same time while the resolution and pattern characteristics are maintained to be excellent. In addition, when the structure for a quantum dot barrier rib is prepared, it is possible to form a multilayer pattern having a uniform film thickness suitable for the quantum dot barrier ribs in a single development process. Thus, it can be advantageously used for a quantum dot display.

A curable resin composition containing quantum dots (A), a resin (B), a photopolymerizable compound (C), a photopolymerization initiator (D), an antioxidant (E), and a solvent (F), wherein a water content based on a total mass of the curable resin composition is 50 ppm or more and less than 5000 ppm.

A curable resin composition containing quantum dots (A), a resin (B), a photopolymerizable compound (C), a photopolymerization initiator (D), an antioxidant (E), and a solvent (F), wherein a water content based on a total mass of the curable resin composition is 50 ppm or more and less than 5000 ppm.

There is provided a curable resin composition containing quantum dots (A), a resin (B), a photopolymerizable compound (C), and a photopolymerization initiator (D), in which the photopolymerization initiator (D) contains an oxime compound having a first molecular structure represented by the formula (1).