The invention provides a composition for forming an organic film, which generates no by-product even under such a film formation condition in an inert gas to prevent substrate corrosion, which is capable of forming an organic film not only excellent in properties of filling and planarizing a pattern formed on a substrate but also favorable for dry etching resistance during substrate processing, and further which causes no fluctuation in film thickness of the film due to thermal decomposition even when a CVD hard mask is formed on the organic film. The composition for forming an organic film includes (A) a polymer having a repeating unit shown by the following general formula (1) and (B) an organic solvent.

##STR00001##

The present embodiment provides a material for forming an underlayer film for lithography, containing at least any of a compound represented by following formula (1) or a resin including a structural unit derived from a compound represented by the following formula (1),

##STR00001##

wherein R.sup.1 represents a 2n-valent group having 1 to 60 carbon atoms, or a single bond, each R.sup.2 independently represents a halogen atom, a straight, branched or cyclic alkyl group having 1 to 10 carbon atoms, an aryl group having 6 to 10 carbon atoms, an alkenyl group having 2 to 10 carbon atoms, an alkoxy group having 1 to 30 carbon atoms, a thiol group, a hydroxyl group, or a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, and may be the same or different in the same naphthalene ring or benzene ring, in which at least one R.sup.2 represents a group where a hydrogen atom of a hydroxyl group is substituted with an acid-dissociable group, n is an integer of 1 to 4, and structural formulae of n structural units in square brackets [ ] may be the same or different when n is an integer of 2 or more, X represents an oxygen atom, a sulfur atom, or an uncrosslinked state, each m.sup.2 is independently an integer of 0 to 7, provided that at least one m.sup.2 is an integer of 1 to 7, and each q is independently 0 or 1.

Provided is a liquid phenolic resol resin containing a partial structure represented by General Formula (P-1) [in the formula, R.sup.1, R.sup.2 and R.sup.3 each independently represent a hydrogen atom or CH.sub.2OH, R.sup.4 represents a linear unsaturated hydrocarbon group having 10 or more carbon atoms, and * represents a bond].

##STR00001##

Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2):

##STR00001## (in the formula, Ar represents an arylene group, R.sup.1's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

Provided are a novolac resin having developability, heat resistance, and dry etching resistance, and a photosensitive composition, a curable composition, and a resist film. A novolac resin including, as a repeating unit, a structural moiety represented by Structural Formula (1) or (2):

##STR00001## (in the formula, Ar represents an arylene group, R.sup.1's each independently represent any one of a hydrogen atom, an alkyl group, an alkoxy group, and a halogen atom, m's each independently represent an integer of 1 to 3, and X is any one of a hydrogen atom, a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group) in which at least one of X's present in the resin is any one of a tertiary alkyl group, an alkoxyalkyl group, an acyl group, an alkoxycarbonyl group, a hetero atom-containing cyclic hydrocarbon group, and a trialkylsilyl group.

A novolac-type phenolic hydroxyl group-containing resin with formula (1) as a structural site repeating unit, R.sup.1 represents one of a hydrogen atom, an alkyl group, and an aryl group, and X represents a structural site () represented by formula (2), R.sup.2 and R.sup.3 each represent one of a hydrogen atom, an alkyl group, an aryl group, and an aralkyl group; n and m are each an integer of 1 to 3; when n or m is 2 or 3, a plurality of each of R.sup.2 and R.sup.3 present in a molecule may be the same or different; and Ar represents one of a phenyl group, a naphthyl group, an anthryl group, and a structural site in which one or a plurality of hydrogen atoms in an aromatic nucleus of any one of these groups is substituted by one of an alkyl group, an aryl group, and an aralkyl group). ##STR00001##

A novolac-type phenolic hydroxyl group-containing resin with formula (1) as a structural site repeating unit, R.sup.1 represents one of a hydrogen atom, an alkyl group, and an aryl group, and X represents a structural site () represented by formula (2), R.sup.2 and R.sup.3 each represent one of a hydrogen atom, an alkyl group, an aryl group, and an aralkyl group; n and m are each an integer of 1 to 3; when n or m is 2 or 3, a plurality of each of R.sup.2 and R.sup.3 present in a molecule may be the same or different; and Ar represents one of a phenyl group, a naphthyl group, an anthryl group, and a structural site in which one or a plurality of hydrogen atoms in an aromatic nucleus of any one of these groups is substituted by one of an alkyl group, an aryl group, and an aralkyl group). ##STR00001##

A polycondensation product containing a phenolic copolymer useful for a hydraulic-composition dispersant that has stable dispersability and can obtain a prescribed fluidity, including a copolymer obtained by polycondensing a monomeric mixture including compounds A-D of formulas (A)-(D). A hydraulic-composition dispersant containing the product or copolymer. In the formulas, A1O, A2O, A3O, and A4O represent a C2-4 alkylene oxide group; m, n represent a number from 0 to 300 and m+n1; p, q represent a number from 1 to 300; X represents a hydrogen atom, alkyl group, or C1-24 acyl group; R0, R1 represent a hydrogen atom, alkyl group or alkenyl group; Y1, Y2 represent a hydrogen atom, phosphoester group, or sulfate ester group; Y3 represents a phosphoester or a sulfate ester group; R2 represents a hydrogen atom, carboxyl group, C1-10 alkyl group, C2-10 alkenyl group, phenyl group, napthyl group, or heterocyclic group; r represents a number from 1-100.

The present invention relates to a cleaning implement that includes a melamine-formaldehyde foam. The melamine-formaldehyde foam cleaning implement has a d90/d10 ratio above 1.65 and a compression deflection force above 3.25 psi. Additionally the present invention encompasses processes for making and methods for cleaning hard surfaces with a cleaning implement according to the present invention.

Disclosed are a phenolic hydroxyl group-containing resin which has excellent alkali developing properties and makes it possible to exhibit high heat resistance in a cured product obtained therefrom, a production method therefor, a photosensitive composition, a resist material, a coating film, a curable composition and a cured product thereof, and a resist underlayer film. A phenolic hydroxyl group-containing resin, including a compound (A) having a molecular structure represented by the following Structural Formula (1). ##STR00001##
(In the formula, R.sup.1 represents an alkyl group, an alkoxy group, or an aryl group, R.sup.2 represents a hydrogen atom, an alkyl group, or an aryl group, m is an integer of 1 to 3, and n is an integer of 2 to 15. In the case where m is 2 or more, plural R.sup.1's may be the same as or different from each other.)