Patent classifications
C10M2223/0603
EDUCTORS HAVING HYDROPHOBIC SURFACES AND METHODS OF REDUCING DEPOSITION OF A FRICTION REDUCER ON A SURFACE
The present invention provides eductors comprising: a component having a metal surface: and a hydrophobic surface layer applied thereto, directly or through an intermediate layer. The surface layer comprises a self-assembled monolayer prepared from a fluorinated material having the structure:
##STR00001##
wherein A is an oxygen radical or a chemical bond; n is 1 to 20; Y is H, F, C.sub.nH.sub.2n+1 or C.sub.nF.sub.2n+1; X is H or F; b is at least 1, m is 0 to 50, p is 1 to 20, and Z is an acid group or an acid derivative. Also provided is a method of reducing deposition of a friction reducer on a metal surface of a component of an eductor, comprising: contacting the surface with a fluorinated material in a diluent, wherein the fluorinated material has the structure above; forming a film on the metal surface; and introducing the friction reducer into the apparatus.
METHODS OF REDUCING FRICTION ON A SURFACE OF AN APPARATUS THAT STORES OR TRANSPORTS A GAS
The present invention provides methods of reducing friction on a surface of an apparatus that stores or transports a gas, comprising: (a) contacting the surface either directly or through an intermediate organometallic layer with a fluorinated material in a diluent, wherein the fluorinated material has the following structure:
##STR00001##
wherein A is an oxygen radical or a chemical bond; n is 1 to 20; Y is H, F, C.sub.nH.sub.2n+1 or C.sub.nF.sub.2n+1; X is H or F; b is at least 1, m is 0 to 50, p is 1 to 20, and Z is an acid group or an acid derivative; (b) forming a hydrophobic surface layer on the surface; and (c) introducing the gas into the apparatus.
SURFACE-TREATED GRAVEL PACK SCREENS AND METHODS OF REDUCING DEPOSITION OF A CONTAMINANT ON A SURFACE OF A GRAVEL PACK SCREEN
The present invention provides treated gravel pack screens comprising a metal surface and a hydrophobic surface layer applied thereto, directly or through an intermediate layer. The surface layer comprises a self-assembled monolayer prepared from a fluorinated material having the structure:
##STR00001##
wherein A is an oxygen radical or a chemical bond; n is 1 to 20; Y is H, F, C.sub.nH.sub.2n+1 or C.sub.nF.sub.2n+1; X is H or F; b is at least 1, m is 0 to 50, p is 1 to 20, and Z is an acid group or an acid derivative. Also provided is a method of reducing deposition of a contaminant on a metal surface of a gravel pack screen, comprising: contacting the surface with the above fluorinated material in a diluent, directly or through an intermediate layer; forming a hydrophobic surface layer on the surface; and introducing a fluid through the gravel pack screen.
SURFACE-TREATED, TRANSPORTABLE ISO TANKS AND METHODS OF REDUCING DEPOSITION OF A FRICTION REDUCER ON A SURFACE
The present invention provides treated, transportable ISO tanks comprising an interior metal surface and a hydrophobic surface layer applied thereto, directly or through an intermediate layer. The surface layer comprises a self-assembled monolayer prepared from a fluorinated material having the structure:
##STR00001##
wherein A is an oxygen radical or a chemical bond; n is 1 to 20; Y is H, F, C.sub.nH.sub.2n+1 or C.sub.nF.sub.2n+1; X is H or F; b is at least 1, m is 0 to 50, p is 1 to 20, and Z is an acid group or an acid derivative. Also provided is a method of reducing deposition of a friction reducer on a surface of an apparatus that stores or transports the same, comprising: contacting the surface with the above fluorinated material in a diluent, directly or through an intermediate layer; forming a film on the surface; and introducing the friction reducer therein.
PHOSPHONO PARAFFINS
Aspects described herein generally relate to methods of making a phosphono paraffin comprising forming a reaction mixture by mixing a haloparaffin, a phosphite, and sodium iodide. Methods comprise heating the reaction mixture to form the phosphono paraffin. Aspects described herein further relate to a phosphono paraffin represented by formula (I):
##STR00001##
wherein each instance of R.sup.1 is independently H or
##STR00002##
wherein each instance of R.sup.2 and R.sup.3 is independently linear or branched C.sub.1-20 alkyl, C.sub.1-20 cycloalkyl, or aryl; the number of instances where R.sup.1 is
##STR00003##
of formula (I) is between about 2 and about 8; and n is an integer between 4 and 22.
Surface treatment of metal substrates
A process for surface treatment of metal substrates, including the steps of: providing a metal substrate including hydroxyl groups at its surface; bringing the metal substrate into contact with a solution of at least one organophosphorus compound to enable the reaction of the hydroxyl groups at the surface of the metal substrate with the organophosphorus compound to form a monomolecular layer over the surface and a second layer of physisorbed organophosphorus molecules at least preponderantly crystallized, the obtained treated substrate being coated with the organophosphorus compound in the form of a first monomolecular layer coating at least 15% of the surface of the substrate and in the form of a physisorbed second layer at least preponderantly crystallized. A treated metal substrate which may be obtained by the process thereof, corresponding solution and its use for treating metallic substrates to improve their tribological properties during their shaping, in particular their stamping.
Phosphono paraffins
Aspects described herein generally relate to methods of making a phosphono paraffin comprising forming a reaction mixture by mixing a haloparaffin, a phosphite, and sodium iodide. Methods comprise heating the reaction mixture to form the phosphono paraffin. Aspects described herein further relate to a phosphono paraffin represented by formula (I): ##STR00001##
wherein each instance of R.sup.1 is independently H or ##STR00002##
wherein each instance of R.sup.2 and R.sup.3 is independently linear or branched C.sub.1-20 alkyl, C.sub.1-20 cycloalkyl, or aryl; the number of instances where R.sup.1 is ##STR00003##
of formula (I) is between about 2 and about 8; and n is an integer between 4 and 22.
LOW TRANSITION TEMPERATURE MIXTURES OR DEEP EUTECTIC SOLVENTS AND PROCESSES FOR PREPARATION THEREOF
A low transition temperature mixture (LTTM) or deep eutectic solvent (DES) useful as a lubricating oil base stock and lubricating oil including a eutectic mixture of at least a first component and at least a second component. The at least first component comprises a hydrogen bond acceptor and the at least second component comprises a hydrogen bond donor. The eutectic mixture includes an equilibrium phase between the at least first component and the at least second component. The equilibrium phase does not exhibit physical characteristics of the at least first component in an unmixed state and the at least second component in an unmixed state. The at least first component and the at least second component form an intermolecular interaction between each other sufficient to prevent crystallization of the at least first component and the at least second component in the eutectic mixture. The eutectic mixture is a liquid at 20 C.
PHOSPHONO PARAFFINS
Aspects described herein generally relate to methods of making a phosphono paraffin comprising forming a reaction mixture by mixing a haloparaffin, a phosphite, and sodium iodide. Methods comprise heating the reaction mixture to form the phosphono paraffin. Aspects described herein further relate to a phosphono paraffin represented by formula (I):
##STR00001##
wherein each instance of R.sup.1 is independently H
##STR00002##
wherein each instance of R.sup.2 and R.sup.3 is independently linear or branched C.sub.1-20 alkyl, C.sub.1-20 cycloalkyl, or aryl; the number of instances where R.sup.1 is
##STR00003##
of formula (I) is between about 2 and about 8; and n is an integer between 4 and 22.
LUBRICANT INCLUDING SILICON-CONTAINING IONIC LIQUID
Provided is a lubricant including a silicon-containing ionic liquid represented by formula (1).
##STR00001##
(In the formula, R.sup.1 represents an alkyl group having 1 to 10 carbon atoms, R.sup.2 represents an alkyl group having 8 to 20 carbon atoms, and R.sup.3 represents an alkyl group having 1 to 8 carbon atoms. Herein, it is provided that the number of carbon atoms in R.sup.2 is greater than the number of carbon atoms in R.sup.1.)