A disinfecting detergent comprising 0.1-6% (w/w %) of hydrogen peroxide, 0.01-0.6% (w/w %) of peracetic acid, 0.01-2% (w/w %) of an ion-pair reagent and/or a phase transfer catalyst, 0.01-1% (w/w %) of a surfactant, 0.1-3% (w/w %) of a base, 0-1% (w/w %) of a stabilizer, and 90-96% (w/w %) of water, where the pH value of the disinfecting detergent is 7.1-9.9. The disinfecting detergent has the advantages of low toxicity, low corrosivity, no pungent smell and fast, broad-spectrum and high-efficiency sterilization, virus killing effect and spore killing effect.

Disclosed are latexes, suspensions, and colloids having a cationic antimicrobial compound complexed with an anionic surfactant. The surfactant may have greater affinity for the antimicrobial compound than other anionic surfactants and other anions in the latex, suspension, or colloid that contribute to disperse phase stability to prevent disrupting the dispersions. Dispersions containing the antimicrobial compound may therefore have a shelf life comparable to dispersions that are otherwise identical but lack the cationic antimicrobial compound and its complexed anionic surfactant. Coatings made with the complexes can exhibit essentially undiminished antimicrobial activity.

A surface treatment was conducted by using a liquid chemical containing a water-repellent protective film forming agent represented by the following general formula [1], subsequent to a step of cleaning a metal-based wafer and prior to a step of drying the wafer. ##STR00001## (R.sup.1 represents a C.sub.1-C.sub.18 monovalent hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). R.sup.2 mutually independently represents a monovalent organic group having a C.sub.1-C.sub.18 hydrocarbon group the hydrogen elements of which may partially or entirely be replaced with a fluorine element(s). a is an integer of from 0 to 2.)

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desirable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desirable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

A liquid chemical for forming a water repellent protecting film on a wafer having at its surface an uneven pattern and containing at least one kind of element selected from the group consisting of titanium, tungsten, aluminum, copper, tin, tantalum and ruthenium at surfaces of recessed portions of the uneven pattern, the water repellent protecting film being formed at least on the surfaces of the recessed portions. The liquid chemical is characterized by including: a water repellent protecting film forming agent; and water, and characterized in that the water repellent protecting film forming agent is at least one selected from compounds represented by the following general formula [1] and salt compounds thereof and that the concentration of the water relative to the total quantity of a solvent contained in the liquid chemical is not smaller than 50 mass %. ##STR00001##

Solid rinsing, cleaning and/or sanitizing compositions for various applications are provided. In particular, solid compositions include a complex of urea and an acid having desireable storage stability previously unavailable in solid urea/acid compositions. Stable solid compositions are disclosed and methods of making the same to overcome conventional limitations associated with with forming kinetically and thermodynamically stable solids that utilize urea/acid compositions.

Provided is a treatment composition for chemical mechanical polishing, for treating an object to be treated including a wiring layer containing a metal, the treatment composition for chemical mechanical polishing containing: (A) a nitrogen-containing compound; (B) at least one kind of compound selected from the group consisting of a surfactant and polyacrylic acid; and (D) a pH adjusting agent, in which in terms of electrode charge transfer resistance value obtained by AC impedance measurement using the metal for an electrode, a sum of electrode charge transfer resistance values RA+RB in aqueous solutions each containing the component (A) or (B) and the component (D), and an electrode charge transfer resistance value RC in an aqueous solution containing the components (A), (B), and (D) have a relationship of RC/(RA+RB)>1.

A solution having improved stain removing properties on hard surfaces, carpets and fabrics, that is easier to handle (stored or transported at lower temperatures and less corrosive) and that is environmentally friendly. The stain removing solution includes the following components: a surfactant selected from the group consisting of alcohol ethoxylates, alkyl sulfates, alkyl ether sulfates, alpha olefin sulfonates, alkyl phosphates, alkyl amidopropyl betaines, alkyl betaines, amphoacetates, amphoproprionates, amphosulfonates, amine oxides, alkanolamides, sulfosuccinates, and sultaines, a hydrotrope, and a solvent. The surfactant is preferably an alcohol ethoxylate. The hydrotrope is preferably lauramine oxide. The solvent is preferably a dibasic ester or a glycol ether. The solution may further comprise a diluent, a mild acid, and/or a preservative. A mild acid can be added to lower the pH of the solution.

An aqueous solution contains a nonionic surfactant, a alkyl phenoxy polyethoxy phosphate and an alkyl glucoside selected from a group consisting of alkyl glucosides characterized by the alkyl group having eight or fewer carbons and when the alkyl group has eight carbons it is a branched alkyl having a linear six carbon chain with a two carbon branch, where the aqueous solution is further characterized by containing less than 0.3 weight-percent cumene sulfonic acid or its alkali salt based on total aqueous solution weight and the alkyl glucoside is present at a concentration greater than alkyl glucosides having an alkyl group with more than eight carbons, as well as its uses for increasing the cloud point and decreasing the foaming properties.