Polyol esters of fatty acids (PEFAs) and their use as surfactants, methods of preparing, and compositions thereof are disclosed herein.

A photoresist stripper and a method for using the same are provided. The photoresist stripper includes a first stripper and a second stripper. An organic base is absent from the photoresist stripper. The first stripper includes an inorganic base, 1 wt % to 15 wt % of a first azole compound, 2 wt % to 10 wt % of a surfactant, and water. The inorganic base includes potassium hydroxide and sodium hydroxide. The second stripper includes 30 wt % to 80 wt % of an ether alcohol solvent, 1 wt % to 15 wt % of a second azole compound, and water. A concentration of the inorganic base in the first stripper ranges from 30 g/L to 45 g/L.

There are provided a post-CMP cleaning composition and a post-CMP cleaning method, which can more effectively reduce impurities remaining on a surface of polished objects to be polished. The post-CMP cleaning composition is used for cleaning polished objects to be polished as objects to be polished, which has been subjected to a chemical mechanical polishing (CMP), the post-CMP cleaning composition containing water, a water-soluble polymer, and a surfactant, in which, when a surface of the polished objects to be polished is covered with the post-CMP cleaning composition, in a case where the surface is observed with an atomic force microscope, a restoring adhesion force which is a force acting between a probe of the atomic force microscope, which has a tip radius of curvature of 2 nm or more and 12 nm or less, and the surfactant is more than 0 N/m and 0.07 N/m or less, and a surface roughness of an adsorption layer which is formed by adsorption of the surfactant over the surface of the polished objects to be polished is more than 0 nm and 0.4 nm or less.

The invention relates to an aqueous alkaline cleaner solution for glass filler removal comprising: (a) at least one non-ionic surfactant selected from the group consisting of saturated branched or unbranched C5 to C12 carboxylic acid or salt thereof, wherein the concentration of the (a) at least one surfactant is from 0.9 to 1.7 g/L; (b) at least one surfactant selected from the group consisting of saturated branched or unbranched C5 to C12 alkyl having a negatively charged group selected from sulfate, sulfite, sulfonate, phosphate, phosphite and carbonate, and saturated C3-C8 alkyl amino carboxylate; (c) at least one compound having at least one hydroxyl group and at least one COC group selected from the group consisting of alkoxylated C5-C12 alkanol and glycosidic C5-C12 alkanol; and (d) alkali metal hydroxide, wherein the concentration of the (d) alkali metal hydroxide is from 65 to 200 g/L; and a method for use.