Multi-surfactant systems where two or more surfactant molecules are coupled to control the spatial distribution of polar groups of the combined surfactant molecules are disclosed. The system can be implemented by an aqueous medium including an associate charge constant surfactant and charge variable surfactant. The charge variable surfactant has at least one neutral end group at one pH value of the medium and at least one either an anionic polar group or a cationic polar group at a different pH value of the medium. The charge constant surfactant has at least one, and preferably two or more groups that does not change charge at the one or different pH values of the aqueous medium. The multi-surfactant system can be coupled or connected to the surface of a substrate where the arrangement of the two or more coupled surfactant molecules control the polarity of the substrate surface.

The invention discloses synergistic combinations of surfactant blends and cleaning compositions employing the same. In certain embodiments a surfactant system is disclosed which includes an extended anionic surfactant with novel co-surfactants including one or more of an alkyl glycerol ether, an ethoxylated alkyl glycerol ether, an alcohol ethoxylate and/or a gemini surfactant. This system forms emulsions with, and can remove greasy and oily stains, even those comprised of non-trans fats. The compositions may be used alone, as a pre-spotter or other pre-treatment or as a part of a soft surface or hard surface cleaning composition.

It is an object of the present invention to provide a cleaning solution for removing carbon-incorporated silicon oxide (SiOC) from the surface of a wafer in a step of producing a wafer having a material comprising the SiOC, and a cleaning method of using the same. The cleaning solution of the present invention comprises 2% by mass to 30% by mass of a fluorine compound, 0.0001% by mass to 20% by mass of a specific cationic surfactant that is an ammonium salt or an amine, and water, and has a pH value of 0 to 4.

It is an object of the present invention to provide a cleaning solution for removing carbon-incorporated silicon oxide (SiOC) from the surface of a wafer in a step of producing a wafer having a material comprising the SiOC, and a cleaning method of using the same. The cleaning solution of the present invention comprises 2% by mass to 30% by mass of a fluorine compound, 0.0001% by mass to 20% by mass of a specific cationic surfactant that is an ammonium salt or an amine, and water, and has a pH value of 0 to 4.

The present invention comprises a hard surface cleaning composition including an environmentally friendly alkyl amide solvent, derived from renewable bio-based resources that works at least as well as d-limonene. In one embodiment, the present invention is a cleaning composition including an anionic surfactant salt, a saturated C.sub.8 to C.sub.10 alkyl amide solvent, a cosolvent and water. The composition is substantially free of d-limonene and can remove red food soils with up to 20 percent protein, and also functions as an asphalt removal composition.

Home care compositions and films formed therefrom are disclosed herein. In accordance with an aspect of the invention, provided is a home care composition including a polysaccharide comprising a pullulan, an alginate, or a combination thereof; optionally, a cellulose; a polyol; one or more surfactant comprising an anionic surfactant, a betaine surfactant, a nonionic surfactant, or a combination of two or more thereof; optionally a fragrance; and optionally an emollient, wherein the home care composition is in the form of a film.

Home care compositions and films formed therefrom are disclosed herein. In accordance with an aspect of the invention, provided is a home care composition including a polysaccharide comprising a pullulan, an alginate, or a combination thereof; optionally, a cellulose; a polyol; one or more surfactant comprising an anionic surfactant, a betaine surfactant, a nonionic surfactant, or a combination of two or more thereof; optionally a fragrance; and optionally an emollient, wherein the home care composition is in the form of a film.

Sanitizing cleaning/rinse aid compositions for various applications including institutional machine warewash sanitizing are disclosed. In particular, concentrated and use compositions, such as concentrated liquid rinse aid compositions or ware wash detergents, employing an amine-based surfactant and a defoaming agent are disclosed. In particular, the present disclosure provides compositions and methods for providing a sanitizing rinse with desired antimicrobial efficacy against a broad spectrum of gram-negative microbes, suitable foaming profiles, and beneficial applications of use of the same.

Sanitizing cleaning/rinse aid compositions for various applications including institutional machine warewash sanitizing are disclosed. In particular, concentrated and use compositions, such as concentrated liquid rinse aid compositions or ware wash detergents, employing an amine-based surfactant and a defoaming agent are disclosed. In particular, the present disclosure provides compositions and methods for providing a sanitizing rinse with desired antimicrobial efficacy against a broad spectrum of gram-negative microbes, suitable foaming profiles, and beneficial applications of use of the same.

A hard surface cleaning composition comprising: a) from 1% to 60% by weight of the composition of a surfactant system wherein said surfactant system comprises an anionic and amphoteric/zwitterionic system wherein the amphoteric to zwitterionic weight ratio is from about 2:1 to about 1:2; and b) from 0.1% to 10% by weight of the composition of a cleaning amine of formula:

##STR00001##

wherein R.sub.1 and R.sub.4 are independently selected from H, linear, branched or cyclic alkyl or alkenyl having from 1 to 10 carbon atoms; and R.sub.2 is a linear, branched or cyclic alkyl or alkenyl having from 3 to 10 carbon atoms, R.sub.3 is a linear or branched alkyl from 3 to 6 carbon atoms, R.sub.5 is selected from H, linear, branched or cyclic alkyl or alkenyl having from about 3 to about 10 carbons, methyl or ethyl and n=0-1.