C11D1/40

Cleaning composition

A hard surface cleaning composition comprising: a) from 1% to 60% by weight of the composition of a surfactant system; and b) from 0.1% to 10% by weight of the composition of a cleaning amine of formula: ##STR00001## wherein R.sub.1 and R.sub.4 are independently selected from H, linear, branched or cyclic alkyl or alkenyl having from 1 to 10 carbon atoms; and R.sub.2 is a linear, branched or cyclic alkyl or alkenyl having from 3 to 10 carbon atoms, R.sub.3 is a linear or branched alkyl from 3 to 6 carbon atoms, R.sub.5 is H, methyl or ethyl and n=0-3.

Resist removing liquid, resist removal method using same and method for producing photomask
09588428 · 2017-03-07 · ·

A resist removal method includes removing a resist provided on a photomask substrate by bringing a resist removing liquid into contact with the resist in patterning of a photomask for EUV lithography in which the resist removing liquid contains an alkali compound, a specific nitrogen-containing compound, and water, and a content of the water is more than 50% by mass.

Resist removing liquid, resist removal method using same and method for producing photomask
09588428 · 2017-03-07 · ·

A resist removal method includes removing a resist provided on a photomask substrate by bringing a resist removing liquid into contact with the resist in patterning of a photomask for EUV lithography in which the resist removing liquid contains an alkali compound, a specific nitrogen-containing compound, and water, and a content of the water is more than 50% by mass.

Liquid Chemical for Forming Protecting Film

Disclosed is a liquid chemical for forming a water-repellent protecting film on a wafer. The liquid chemical is a liquid chemical containing a water-repellent-protecting-film-forming agent for forming the water-repellent protecting film, at the time of cleaning the wafer which has a finely uneven pattern at its surface and contains at least at a part of a surface of a recessed portion of the uneven pattern at least one kind of matter selected from the group consisting of titanium, titanium nitride, tungsten, aluminum, copper, tin, tantalum nitride, ruthenium and silicon, at least on the surface of the recessed portion. The liquid chemical is characterized in that the water-repellent-protecting-film-forming agent is a water-insoluble surfactant. The water-repellent protecting film formed with the liquid chemical is capable of preventing a pattern collapse of the wafer, in a cleaning step.

Cleaner for Hard Surfaces
20250154433 · 2025-05-15 ·

The subject invention provides biosurfactants, as well as their use to, for example, efficiently clean contaminating and/or fouling substances such as paint, mold and algae from porous surfaces, and/or to enhance the cleaning of contaminants from non-porous surfaces.

Cleaner for Hard Surfaces
20250154433 · 2025-05-15 ·

The subject invention provides biosurfactants, as well as their use to, for example, efficiently clean contaminating and/or fouling substances such as paint, mold and algae from porous surfaces, and/or to enhance the cleaning of contaminants from non-porous surfaces.

Enzymatic pot and pan detergent

Detergent compositions are disclosed which provide superior cleaning and removal of proteinaceous and starchy soils. Applicants have discovered a surfactant package which acts to enhance and improve the performance of enzymes such as proteases and/or amylases. Compositions for pot and pan warewash detergents and soaks are disclosed, as well as their use in manual or dish machine cleaning.

Enzymatic pot and pan detergent

Detergent compositions are disclosed which provide superior cleaning and removal of proteinaceous and starchy soils. Applicants have discovered a surfactant package which acts to enhance and improve the performance of enzymes such as proteases and/or amylases. Compositions for pot and pan warewash detergents and soaks are disclosed, as well as their use in manual or dish machine cleaning.

COMPOSITIONS, METHODS AND USES
20250270473 · 2025-08-28 ·

A solid detergent composition comprising: (a) a salt of an amine and a fatty acid wherein at least 50% of the fatty acid molecules have at least 16 carbon atoms; (b) at least one nitrogen containing surfactant; (c) at least one anionic surfactant; (d) at least one solvent including at least one hydroxy functional group; and (c) water; wherein water makes up no more than 20 wt % of the total detergent composition.

ENZYMATIC POT AND PAN DETERGENT

Detergent compositions are disclosed which provide superior cleaning and removal of proteinaceous and starchy soils. Applicants have discovered a surfactant package which acts to enhance and improve the performance of enzymes such as proteases and/or amylases. Compositions for pot and pan warewash detergents and soaks are disclosed, as well as their use in manual or dish machine cleaning.